SENSOR DEVICE, PRODUCTION METHOD, AND DETECTION DEVICE
    1.
    发明申请
    SENSOR DEVICE, PRODUCTION METHOD, AND DETECTION DEVICE 审中-公开
    传感器设备,方法和检测装置

    公开(公告)号:WO2013110475A8

    公开(公告)日:2014-02-06

    申请号:PCT/EP2013000589

    申请日:2013-02-28

    CPC classification number: G01S17/36 G01S7/4863 G01S17/89

    Abstract: The invention relates to a sensor device (1), in particular a TOF and/or CCD sensor device for a 3-D camera sensor, which device comprises at least one analogue and one digital circuit component and one A-D converter (8) for converting analogue signals of the analogue circuit component into digital signals for the digital circuit component (2) and vice versa, wherein the analogue circuit component and the digital circuit component each comprise at least one module for electronically carrying out one function, and wherein one of the modules of the analogue circuit component is designed as a sensor unit (3) for detecting optical radiation and one of the modules of the digital circuit component is designed as a signal processing unit for processing digital signals. In order to facilitate an improved integration in application-based sensor units, the circuit components including the A-D converter are integrated as an integrated circuit in a chip and the chip is manufactured as a semiconductor structure in 1-poly technology.

    Abstract translation: 提供了一种传感器装置(1),特别是TOF或CCD传感器装置的3-D相机传感器,所述至少一个模拟和数字电路部件,以及用于在将所述的模拟电路部件的模拟信号的A / D转换器(8) 用于数字电路组件(2),反之亦然,其特征在于,所述模拟电路组件和数字电路组件中的每个包括至少一个电子装置用于执行功能,且其中数字信号的模拟电路元件作为传感器装置(3)的用于检测光辐射的模块中的一个,和 数字电路部件的模块中的一个被设计成用于处理数字信号的信号处理装置。 以使在基于应用程序的传感器装置更好地整合,电路组件,包括A / D转换器被集成为芯片的集成电路和1 - 聚技术制成的半导体结构的芯片。

    Dispositivo sensorial, procedimiento de producción y dispositivo de detección

    公开(公告)号:ES2465599T3

    公开(公告)日:2014-06-06

    申请号:ES12000403

    申请日:2012-01-23

    Abstract: Dispositivo sensorial (1, 11), en especial dispositivo sensorial Time-of-flight (TOF) y/o CCD para un sensor de cámara 3-D, que presenta al menos un componente de circuito de conmutación analógico y uno digital así como un convertidor analógico/digital (8) para convertir señales analógicas del componente de circuito de conmutación analógico en señales digitales para el componente de circuito de conmutación digital (2), en donde el componente de circuito de conmutación analógico así como el componente de circuito de conmutación digital comprenden en cada caso al menos un módulo para la ejecución electrónica de una función, y en donde uno del al menos un módulo del componente de circuito de conmutación analógico está configurado como instalación sensorial (3) para la detección de radiación electromagnética y uno del al menos un módulo del componente de circuito de conmutación digital como instalación de tratamiento de señales para el tratamiento de señales digitales, caracterizado porque los componentes de circuito de conmutación, incluyendo el convertidor analógico/digital, están integrados como circuito de conmutación integrado en un chip y el chip está fabricado como estructura semiconductora en tecnología 1-Poly

    SEMICONDUCTOR STRUCTURE FOR PHOTON DETECTION

    公开(公告)号:SG187357A1

    公开(公告)日:2013-02-28

    申请号:SG2012053526

    申请日:2012-07-19

    Abstract: - 24 -AbstractSemiconductor structure for photon detectionWhat is proposed is a semiconductor structure (1, 101, 201) for photon detection, comprising: a substrate (2, 102, 202) composed of a semiconductor material having a first doping, a contact region (3, 103, 203) fitted at the frontside of the substrate, a bias layer (4, 104, 204) composed of a semiconductor material having a second doping, which is arranged on the backside of the substrate at a distance from the contact region, wherein the contact region at least partly lies opposite the bias layer, such that an overlap region is present in a lateral direction, a guard ring (5, 105, 205), which is arranged at the frontside of the substrate and surrounds the contact region, wherein a reverse voltage can be applied between the contact region and the guard ring. In order to enable more cost-effective production, the overlap region has a lateral extent amounting to at least one quarter of the distance between contact region and bias layer.Figure 1

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