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    METHOD OF MANUFACTURING AN OPTICAL SYSTEM
    1.
    发明申请
    METHOD OF MANUFACTURING AN OPTICAL SYSTEM 审中-公开
    制造光学系统的方法

    公开(公告)号：WO2007017766A2

    公开(公告)日：2007-02-15

    申请号：PCT/IB2006003220

    申请日：2006-08-01

    Applicant: ESSILOR INT ,  ALLIONE PASCAL ,  LE SAUX GILLES ,  CHAUVEAU JEAN-PIERRE ,  MAZUET DENIS

    Inventor： ALLIONE PASCAL ,  LE SAUX GILLES ,  CHAUVEAU JEAN-PIERRE ,  MAZUET DENIS

    CPC classification number: G06F17/50 ,  B29D11/00009 ,  B29D11/00971 ,  G02B3/0081 ,  G02B3/10 ,  G02C7/028 ,  G02C7/061

    Abstract: The invention relates to a method of calculating an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) comprising a first part (Fl) defined by a first equation (EFl) and a second part (F2) defined by a second equation (EF2), the method comprising: - a generating step (GEN), in which a virtual optical system (VOS) is used to generate a virtual function (VOF); - a modification step (MOD), in which the virtual function (VOF) is modified so as obtain the function (OF); - a calculation step (CAL), in which the second equation (EF2) is calculated from the function (OF), and the first equation (EFl). The invention relates also to a method of manufacturing an optical system (OS).

    Abstract translation: 本发明涉及一种计算光学系统（OS）的方法，所述光学系统（OS）由函数（OF）标识，所述光学系统（OS）包括由第一方程（EF1）定义的第一部分（F1） ）和由第二方程（EF2）定义的第二部分（F2），所述方法包括： - 生成步骤（GEN），其中使用虚拟光学系统（VOS）来生成虚拟功能（VOF）; - 修改步骤（MOD），其中修改虚拟函数（VOF）以获得函数（OF）; - 计算步骤（CAL），其中从函数（OF）和第一方程（EF1）计算第二方程（EF2）。 本发明还涉及制造光学系统（OS）的方法。

    2.
    发明专利
    未知

    公开(公告)号：FR2737568A1

    公开(公告)日：1997-02-07

    申请号：FR9509411

    申请日：1995-08-02

    Applicant: ESSILOR INT

    Inventor： MAZUET DENIS ,  BERTRAND PATRICK ,  PHAN DO QUYEN ,  MOHR WERNER

    IPC: G01M11/02 ,  G01B11/00 ,  G02B27/44 ,  G02B27/50

    Abstract: A fringe deflectometry apparatus including lighting means (1, 2, 3, 4, 5, 6, 7, 8) for illuminating an optical component to be measured using radiation having a known wavefront; deflectometric means (14) for measuring the deflection of the radiation after it has been reflected or transmitted by said optical component to be measured; and means (25, 26) for materialising a reference beam. The apparatus further includes means (27) for measuring the transverse aberration of the reference beam after it has been reflected or transmitted by said optical component to be measured. A deflectometry method using such an apparatus enables an absolute phase reference to be provided.

    METHOD OF MANUFACTURING AN OPTICAL SYSTEM
    3.
    发明专利
    METHOD OF MANUFACTURING AN OPTICAL SYSTEM 未知

    公开(公告)号：CA2618336C

    公开(公告)日：2015-11-17

    申请号：CA2618336

    申请日：2006-08-01

    Applicant: ESSILOR INT

    Inventor： ALLIONE PASCAL ,  LE SAUX GILLES ,  CHAUVEAU JEAN-PIERRE ,  MAZUET DENIS

    IPC: G02C7/02 ,  G02B3/00 ,  G02B3/10

    Abstract: The invention relates to a method of calculating an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) comprising a first part (Fl) defined by a first equation (EFl) and a second part (F2) defined by a second equation (EF2), the method comprising: -a generating step (GEN), in which a virtual optical system (VOS) is used to generate a virtual function (VOF); - a modification step (MOD), in which the virtual function (VOF) is modified so as obtain the function (OF); - a calculation step (CAL), in which the second equation (EF2) is calculated from the function (OF), and the first equation (EFl). The invention relates also to a method of manufacturing an optical system (OS).

    Method of manufacturing an optical system
    5.
    发明专利
    Method of manufacturing an optical system 未知

    公开(公告)号：AU2006277686B2

    公开(公告)日：2012-03-15

    申请号：AU2006277686

    申请日：2006-08-01

    Applicant: ESSILOR INT

    Inventor： ALLIONE PASCAL ,  LE SAUX GILLES ,  CHAUVEAU JEAN-PIERRE ,  MAZUET DENIS

    IPC: G02C7/02 ,  G02B3/00 ,  G02B3/10

    Abstract: The invention relates to a method of calculating an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) comprising a first part (Fl) defined by a first equation (EFl) and a second part (F2) defined by a second equation (EF2), the method comprising: - a generating step (GEN), in which a virtual optical system (VOS) is used to generate a virtual function (VOF); - a modification step (MOD), in which the virtual function (VOF) is modified so as obtain the function (OF); - a calculation step (CAL), in which the second equation (EF2) is calculated from the function (OF), and the first equation (EFl). The invention relates also to a method of manufacturing an optical system (OS).

    6.
    发明专利
    未知

    公开(公告)号：BRPI0614811A2

    公开(公告)日：2009-08-04

    申请号：BRPI0614811

    申请日：2006-08-01

    Applicant: ESSILOR INT

    Inventor： ALLIONE PASCAL ,  SAUX GILLES LE ,  MAZUET DENIS ,  CHAUVEAU JEAN-PIERRE

    IPC: G02C7/02 ,  G02B3/00 ,  G02B3/10

    Abstract: The invention relates to a method of manufacturing an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) comprising a first part (F1) defined by a first equation (EF1) and a second part (F2) defined by a second equation (EF2), the method comprising: - a calculation step (CAL), in which the second equation EF2 is calculated from the function OF, and the first equation EF1; - a first manufacturing step (M1), in which a semi-finished optical system (SFOS) comprising the first part (F1) is manufactured so as to obtain a manufactured semi-finished optical system (MSFOS); and - a second manufacturing step (M2), in which the manufactured semi-finished optical system (MSFOS) is manufactured so as to be further provided with a second part (F2) defined by the second equation (EF2) and to obtain the optical system (OS).

    Method of manufacturing an optical system
    7.
    发明专利
    Method of manufacturing an optical system 未知

    公开(公告)号：AU2006277686A1

    公开(公告)日：2007-02-15

    申请号：AU2006277686

    申请日：2006-08-01

    Applicant: ESSILOR INT

    Inventor： ALLIONE PASCAL ,  SAUX GILLES LE ,  CHAUVEAU JEAN-PIERRE ,  MAZUET DENIS

    IPC: G02C7/02 ,  G02B3/00 ,  G02B3/10

    Abstract: The invention relates to a method of manufacturing an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) comprising a first part (F1) defined by a first equation (EF1) and a second part (F2) defined by a second equation (EF2), the method comprising: - a calculation step (CAL), in which the second equation EF2 is calculated from the function OF, and the first equation EF1; - a first manufacturing step (M1), in which a semi-finished optical system (SFOS) comprising the first part (F1) is manufactured so as to obtain a manufactured semi-finished optical system (MSFOS); and - a second manufacturing step (M2), in which the manufactured semi-finished optical system (MSFOS) is manufactured so as to be further provided with a second part (F2) defined by the second equation (EF2) and to obtain the optical system (OS).

    METHOD OF MANUFACTURING AN OPTICAL SYSTEM
    8.
    发明专利
    METHOD OF MANUFACTURING AN OPTICAL SYSTEM 未知

    公开(公告)号：CA2618336A1

    公开(公告)日：2007-02-15

    申请号：CA2618336

    申请日：2006-08-01

    Applicant: ESSILOR INT

    Inventor： CHAUVEAU JEAN-PIERRE ,  LE SAUX GILLES ,  ALLIONE PASCAL ,  MAZUET DENIS

    IPC: G02C7/02 ,  G02B3/00 ,  G02B3/10

    Abstract: The invention relates to a method of calculating an optical system (OS), the optical system (OS) being identified by a function (OF), the optical system (OS) comprising a first part (Fl) defined by a first equation (EFl) and a second part (F2) defined by a second equation (EF2), the method comprising: - a generating step (GEN), in which a virtual optical system (VOS) is used to generate a virtual function (VOF); - a modification step (MOD), in which the virtual function (VOF) is modified so as obtain the function (OF); - a calculation step (CAL), in which the second equation (EF2) is calculated fro m the function (OF), and the first equation (EFl). The invention relates also to a method of manufacturing an optical system (OS).

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