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公开(公告)号：GB2233449B
公开(公告)日：1993-06-30
申请号：GB9011562
申请日：1990-05-23
Applicant: ESSILOR INT
Inventor： BERTRAND PATRICK
IPC: G01M11/00 , G01B11/255 , G01M11/02 , G02B27/44 , G02B27/52
Abstract: A beam radiator (13) provides the light source (14). A receiving sation (15) accepts the optical system (10) to be tested. A receiver (17) intercepts the observed image upstream of the grating (16). - A separator (26) between the light source and receiving station forms a semi-reflective surface (27) on the axis (A) of the optical beam path. The receiver (17) is at the side of the separator. A data processor (18) and calibrator use a beam tracking program and take into account both the theoretical and practical abberations arising from the separator.
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公开(公告)号：DE4018005A1
公开(公告)日：1990-12-13
申请号：DE4018005
申请日：1990-06-05
Applicant: ESSILOR INT
Inventor： BERTRAND PATRICK
Abstract: The optics detect the phase along an optical beam path. A beam radiator (13) provides the light source (14). A working station (15) accepts the optical system (10) to be tested. A receiver (17) intercepts the observed image upstream of a grating (16). A data processor (18) evaluates this image by detecting the phase. A matching element (13) is placed between the working station and the grating. The processor and a calibrator use a beam tracking program and take into account both the theoretical and practical abberations appearing at the convergent matching element (13) for correction.
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公开(公告)号：DE69611832T2
公开(公告)日：2001-09-13
申请号：DE69611832
申请日：1996-07-12
Applicant: ESSILOR INT
Inventor： MAZUET DENIS , BERTRAND PATRICK , PHAN QUYEN , MOHR WERNER
IPC: G01M11/02
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公开(公告)号：DE69402281T2
公开(公告)日：1997-09-04
申请号：DE69402281
申请日：1994-09-02
Applicant: ESSILOR INT
Inventor： LE SAUX GILLES , BERTRAND PATRICK , LIPPENS XAVIER , LAFAY CHRISTOPHE
IPC: G01B11/255 , G01B11/24 , G01M11/00 , G01M11/02
Abstract: The invention relates to a method for absolute measurement of the geometrical or optical structure of an optical component (4), comprising steps consisting in: - illuminating the said optical component with incident light, the wavefront of which is known, - measuring, in a given plane, the maps of the slopes of the wavefront of the said light after reflection from the said optical component or transmission by the said optical component, which furthermore comprises at least one calculation procedure consisting in deducing the geometrical or optical structure of the optical component from the said measurement of the slope maps. A further subject of the invention is a device for implementing this method. The invention is applied in particular in the field of ophthalmology for checking or measuring ophthalmic lenses or moulds for fabricating ophthalmic lenses.
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公开(公告)号：ES2101465T3
公开(公告)日：1997-07-01
申请号：ES94401959
申请日：1994-09-02
Applicant: ESSILOR INT
Inventor： LE SAUX GILLES , BERTRAND PATRICK , LIPPENS XAVIER , LAFAY CHRISTOPHE
IPC: G01B11/255 , G01M11/00 , G01B11/24 , G01M11/02
Abstract: The invention relates to a method for absolute measurement of the geometrical or optical structure of an optical component (4), comprising steps consisting in: - illuminating the said optical component with incident light, the wavefront of which is known, - measuring, in a given plane, the maps of the slopes of the wavefront of the said light after reflection from the said optical component or transmission by the said optical component, which furthermore comprises at least one calculation procedure consisting in deducing the geometrical or optical structure of the optical component from the said measurement of the slope maps. A further subject of the invention is a device for implementing this method. The invention is applied in particular in the field of ophthalmology for checking or measuring ophthalmic lenses or moulds for fabricating ophthalmic lenses.
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Patent Agency Ranking
公开(公告)号：FR2710162B1
公开(公告)日：1995-11-17
申请号：FR9311136
申请日：1993-09-17
Applicant: ESSILOR INT
Inventor： LE SAUX GILLES , BERTRAND PATRICK , LIPPENS XAVIER , LAFAY CHRISTOPHE
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公开(公告)号：GB2233448B
公开(公告)日：1993-06-30
申请号：GB9011543
申请日：1990-05-23
Applicant: ESSILOR INT
Inventor： BERTRAND PATRICK
Abstract: The optics detect the phase along an optical beam path. A beam radiator (13) provides the light source (14). A working station (15) accepts the optical system (10) to be tested. A receiver (17) intercepts the observed image upstream of a grating (16). A data processor (18) evaluates this image by detecting the phase. A matching element (13) is placed between the working station and the grating. The processor and a calibrator use a beam tracking program and take into account both the theoretical and practical abberations appearing at the convergent matching element (13) for correction.
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公开(公告)号：FR2647912B1
公开(公告)日：1991-09-13
申请号：FR8907386
申请日：1989-06-05
Applicant: ESSILOR INT
Inventor： BERTRAND PATRICK
Abstract: The optics detect the phase along an optical beam path. A beam radiator (13) provides the light source (14). A working station (15) accepts the optical system (10) to be tested. A receiver (17) intercepts the observed image upstream of a grating (16). A data processor (18) evaluates this image by detecting the phase. A matching element (13) is placed between the working station and the grating. The processor and a calibrator use a beam tracking program and take into account both the theoretical and practical abberations appearing at the convergent matching element (13) for correction.
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公开(公告)号：DE69402281D1
公开(公告)日：1997-04-30
申请号：DE69402281
申请日：1994-09-02
Applicant: ESSILOR INT
Inventor： LE SAUX GILLES , BERTRAND PATRICK , LIPPENS XAVIER , LAFAY CHRISTOPHE
IPC: G01B11/255 , G01B11/24 , G01M11/00 , G01M11/02
Abstract: The invention relates to a method for absolute measurement of the geometrical or optical structure of an optical component (4), comprising steps consisting in: - illuminating the said optical component with incident light, the wavefront of which is known, - measuring, in a given plane, the maps of the slopes of the wavefront of the said light after reflection from the said optical component or transmission by the said optical component, which furthermore comprises at least one calculation procedure consisting in deducing the geometrical or optical structure of the optical component from the said measurement of the slope maps. A further subject of the invention is a device for implementing this method. The invention is applied in particular in the field of ophthalmology for checking or measuring ophthalmic lenses or moulds for fabricating ophthalmic lenses.
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公开(公告)号：FR2737568A1
公开(公告)日：1997-02-07
申请号：FR9509411
申请日：1995-08-02
Applicant: ESSILOR INT
Inventor： MAZUET DENIS , BERTRAND PATRICK , PHAN DO QUYEN , MOHR WERNER
Abstract: A fringe deflectometry apparatus including lighting means (1, 2, 3, 4, 5, 6, 7, 8) for illuminating an optical component to be measured using radiation having a known wavefront; deflectometric means (14) for measuring the deflection of the radiation after it has been reflected or transmitted by said optical component to be measured; and means (25, 26) for materialising a reference beam. The apparatus further includes means (27) for measuring the transverse aberration of the reference beam after it has been reflected or transmitted by said optical component to be measured. A deflectometry method using such an apparatus enables an absolute phase reference to be provided.
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