6.
    发明专利
    未知

    公开(公告)号:DE60326959D1

    公开(公告)日:2009-05-14

    申请号:DE60326959

    申请日:2003-08-07

    Applicant: ESSILOR INT

    Abstract: The method according to the invention comprises forming on a SiO x F y layer a silica SiO 2 and/or metal oxide protective layer obtained through ion beam-assisted vapor phase deposition, comprising bombarding the layer being formed with a beam of positive ions formed from a rare gas, oxygen or a mixture of two or more of such gases, or through cathodic sputtering of a silicon or metal layer followed by an oxidation step of the silicon or the metal layer. Application to the production of antireflection coatings.

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