公开(公告)号：CA2322778A1

公开(公告)日：2000-07-13

申请号：CA2322778

申请日：1999-09-22

Applicant: ETEC SYSTEMS INC

Inventor： BOEGLI VOLKER ,  RISHTON STEPHEN A ,  VENEKLASEN LEE H

IPC: G03F7/20 ,  H01J37/09 ,  H01J37/147 ,  H01J37/302 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

Abstract: A converter for lithography which generates signals that control a shaping of an electron (or other energy) beam and which includes a translator that translates shape data into shape and position signals, and translates duration information into a duration signal. The converter also includes a retrograde scan circuit coupled to the translator that provides a retrograde signal that adjusts the position signal to offset a raster scan movement of the beam. The shape signals control the shaping of the beam, the position signal specifies a position of the beam for writing the shape on a substrate, and the duration signal specifies a duration of exposure of the beam on the substrate.

公开(公告)号：CA2322972A1

公开(公告)日：2000-07-13

申请号：CA2322972

申请日：2000-01-04

Applicant: ETEC SYSTEMS INC

Inventor： HOFMANN ULRICH ,  WANG WEIDONG ,  RISHTON STEPHEN A ,  BOEGLI VOLKER

IPC: G03F7/20 ,  H01J37/302 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

Abstract: A lithography method and apparatus which represent a substrate surface as gray level values and determine a shape data that specifies a shape and position of a flash field. The apparatus receives a pattern in a vector format, represents the substrate surface as a grid of pixels, and then represents each pixel as a gray level value specifying a proportion of the pixel that includes the pattern. Subsequently the apparatus constructs a matrix of a quadrant of four pixels and surrounding pixels, modifies the matrix so that three intermediate shapes corresponding to an exposed region of the quadrant may be provided, determines an intermediate shape data of the quadrant; and performs a reverse modification on the shape to determine the shape data that specifies a flash field.