公开(公告)号：WO0046831A9

公开(公告)日：2001-09-07

申请号：PCT/US0003174

申请日：2000-02-07

Applicant: ETEC SYSTEMS INC

Inventor： LEE KIM Y ,  KIM HO-SEOB ,  RISHTON STEPHEN A ,  CHANG TAI-HON PHILIP

IPC: H01J9/14 ,  H01J9/18 ,  H01J37/04 ,  H01J37/12

CPC classification number: B82Y15/00 ,  H01J9/18 ,  H01J37/12 ,  H01J2237/1205

Abstract: A method and the associated apparatus for alignment and assembly of microlenses and microcolumns in which aligning structures such as rigid fibers are used to precisely align multiple microlens components. Alignment openings are formed in the microlens components and standard optical fibers are threaded through the openings in each microlens component as they are stacked. The fibers provide sufficient stiffness and stability to the structure to precisely align the apertures of the microlens components and thereby allow for increased assembly efficiency over traditional microlens and microcolumn bonding techniques.

Abstract translation: 用于对准和组装微透镜和微柱的方法和相关联的装置，其中使用诸如刚性纤维的对准结构来精确地对准多个微透镜组件。 在微透镜部件中形成对准开口，并且标准光纤在堆叠时穿过每个微透镜部件中的开口。 纤维为结构提供足够的刚度和稳定性，以精确地对准微透镜部件的孔，从而相对于传统的微透镜和微柱接合技术允许提高组装效率。

公开(公告)号：CA2324243A1

公开(公告)日：2000-08-10

申请号：CA2324243

申请日：2000-02-07

Applicant: ETEC SYSTEMS INC

Inventor： CHANG TAI-HON PHILIP ,  KIM HO-SEOB ,  RISHTON STEPHEN A ,  LEE KIM Y

IPC: H01J9/14 ,  H01J9/18 ,  H01J37/04 ,  H01J37/12

Abstract: A method and the associated apparatus for alignment and assembly of microlenses and microcolumns in which aligning structures such as rigid fibers are used to precisely align multiple microlens components. Alignment openings are formed in the microlens components and standard optical fibers are threaded through the openings in each microlens component as they are stacked. The fibers provide sufficient stiffness and stability to the structure to precisely align the apertures of the microlens components and thereby allow for increased assembly efficiency over traditional microlens and microcolumn bonding techniques.

公开(公告)号：CA2322972A1

公开(公告)日：2000-07-13

申请号：CA2322972

申请日：2000-01-04

Applicant: ETEC SYSTEMS INC

Inventor： HOFMANN ULRICH ,  WANG WEIDONG ,  RISHTON STEPHEN A ,  BOEGLI VOLKER

IPC: G03F7/20 ,  H01J37/302 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

Abstract: A lithography method and apparatus which represent a substrate surface as gray level values and determine a shape data that specifies a shape and position of a flash field. The apparatus receives a pattern in a vector format, represents the substrate surface as a grid of pixels, and then represents each pixel as a gray level value specifying a proportion of the pixel that includes the pattern. Subsequently the apparatus constructs a matrix of a quadrant of four pixels and surrounding pixels, modifies the matrix so that three intermediate shapes corresponding to an exposed region of the quadrant may be provided, determines an intermediate shape data of the quadrant; and performs a reverse modification on the shape to determine the shape data that specifies a flash field.

公开(公告)号：AU2805601A

公开(公告)日：2001-02-19

申请号：AU2805601

申请日：2000-07-28

Applicant: ETEC SYSTEMS INC

Inventor： MURAY LAWRENCE PETER ,  LEE KIM Y ,  RISHTON STEPHEN A ,  KIM HO-SEOB ,  CHANG TAI-HON PHILIP

IPC: H01J9/14 ,  G01Q70/00 ,  H01J9/18 ,  H01J37/12

Abstract: A method for forming microcolumns in which laser spot welding bonds the multiple layers of an electron beam microcolumn. A silicon microlens is laser spot welded to a glass insulation layer by focusing a laser through the insulation layer onto the silicon microlens. The glass layer is transparent to the laser, allowing all of the energy to be absorbed by the silicon. This causes the silicon to heat, which, in turn, heats the adjacent surface of the glass insulation layer creating a micro-weld between the silicon and glass. The insulation layer includes a portion which protrudes beyond the edge of the first microlens so that when a second microlens is attached to the opposite side of the insulation layer, the second microlens can be laser spot welded to the protruding portion of the insulation layer by focusing a laser through the protruding portion of the insulation layer to heat the second microlens.

公开(公告)号：CA2322966A1

公开(公告)日：2000-07-13

申请号：CA2322966

申请日：1999-09-21

Applicant: ETEC SYSTEMS INC

Inventor： RISHTON STEPHEN A ,  VARNER JEFFREY K ,  VENEKLASEN LEE H ,  WANG WEIDONG ,  SAGLE ALLAN L

IPC: G03F7/20 ,  H01J37/302 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

Abstract: An electron beam column (or other charged particle beam column) for lithography which exposes a surface to variable shapes in a raster scan. The beam column includes an electron (or ion) source (1204) that generates a charged particle beam, a transfer lens (1206), an upper aperture (1210), an upper deflector (1212), a lower aperture (1214), a lower deflector (1216), magnetic deflection coils (1218), and a beam objective lens (1220). The beam is first shaped as a square in cross section by the upper aperture. The upper deflector changes the direction of the square shaped beam to pass through a specific portion of an opening defined in the lower aperture to shape the beam as desired. The lower aperture defines either a cross shaped opening or four Lshaped openings arranged as corners of a square. The combination of upper and lower apertures enable definition of exterior and interior corners as well as horizontal and vertical edges of a pattern, so that only one flash need be exposed in any one location on the surface. The lower deflector reverses any change in direction imposed by the upper deflector and further applies a retrograde scan to counteract a movement of the beam by the magnetic coils in a raster scan. The retrograde scan ensures that an exposure exposes an intended target area.

公开(公告)号：CA2322778A1

公开(公告)日：2000-07-13

申请号：CA2322778

申请日：1999-09-22

Applicant: ETEC SYSTEMS INC

Inventor： BOEGLI VOLKER ,  RISHTON STEPHEN A ,  VENEKLASEN LEE H

IPC: G03F7/20 ,  H01J37/09 ,  H01J37/147 ,  H01J37/302 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

Abstract: A converter for lithography which generates signals that control a shaping of an electron (or other energy) beam and which includes a translator that translates shape data into shape and position signals, and translates duration information into a duration signal. The converter also includes a retrograde scan circuit coupled to the translator that provides a retrograde signal that adjusts the position signal to offset a raster scan movement of the beam. The shape signals control the shaping of the beam, the position signal specifies a position of the beam for writing the shape on a substrate, and the duration signal specifies a duration of exposure of the beam on the substrate.