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    PATTERNED HEAT CONDUCTING PHOTOCATHODE FOR ELECTRON BEAM SOURCE
    1.
    发明申请
    PATTERNED HEAT CONDUCTING PHOTOCATHODE FOR ELECTRON BEAM SOURCE 审中-公开
    用于电子束源的图形化导热光电阴极

    公开(公告)号：WO0109913A3

    公开(公告)日：2001-10-04

    申请号：PCT/US0020260

    申请日：2000-07-21

    Applicant: ETEC SYSTEMS INC

    Inventor： FERNANDEZ ANDRES ,  MANKOS MARIAN ,  CHANG TAI-HON PHILIP ,  LEE KIM ,  COYLE STEVEN T

    IPC: H01J9/12 ,  H01J1/34 ,  H01J37/073 ,  H01L21/027

    CPC classification number: B82Y10/00 ,  H01J1/34 ,  H01J37/073 ,  H01J2201/02 ,  H01J2237/31779

    Abstract: A photocathode emitter (500) as a source of electron beams (504), having an optically transmissive substrate (501) patterned to define a protrusion, heat conducting material (506) occupying the space surrounding the protrusion, and a photoemitter layer (502) over the protrusion. The photoemitter is positioned on the side of the substrate opposite the surface on which the illumination is incident, and has an irradiation region (505) at the contact with the top of the protrusion patterned on the substrate, and an emission region (508) opposite the irradiation region, these regions being defined by the path of the illumination. The heat conducting material around the protrusion conducts heat away from this focused region of illumination on the photocathode. The thermal conductivity of heat-conducting materials such as gold, copper, and platinum is at least 200 times greater than that of fused silica, which is a substrate material typically used in photocathodes. This efficiently conducts heat away from the irradiation region/emission region interface, and therefore allows higher currents to be achieved from the photocathode. This in turn, permits higher throughput rates in applications including electron beam lithography.

    Abstract translation: 一种作为电子束源（504）的光电阴极发射器（500），具有图案化以限定突起的光学透射衬底（501），占据突起周围的空间的导热材料（506）以及光电发射器层（502） 在突起上方。 发光体位于基板的与照明入射的面相反的一侧，具有与在基板上被图案化的凸部的顶部接触的照射区域（505）和与发光区域 照射区域，这些区域由照明路径限定。 突起周围的导热材料将热量从光电阴极上的这个聚焦照明区域传导走。 诸如金，铜和铂之类的导热材料的导热率比作为光电阴极中通常使用的衬底材料的熔融二氧化硅的导热率高至少200倍。 这有效地将热量从照射区域/发射区域界面传导走，并因此允许从光阴极获得更高的电流。 这反过来又允许在包括电子束光刻的应用中获得更高的吞吐速率。

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