公开(公告)号：WO0055690A3

公开(公告)日：2001-02-01

申请号：PCT/US0007060

申请日：2000-03-15

Applicant: ETEC SYSTEMS INC

Inventor： MANKOS MARIAN ,  VENEKLASEN LEE H

IPC: G03F7/20 ,  H01J37/073 ,  H01J37/12 ,  H01J37/145 ,  H01J37/305 ,  H01L21/027 ,  H01J37/317 ,  H01J37/153 ,  H01J37/30

CPC classification number: G03F7/2037 ,  H01J37/3175 ,  H01J2237/31779

Abstract: An improved compact tandem photon and electron beam lithography system includes a field lens adjacent the photoemission source which is utilized in combination with an objective lens to minimize field aberrations in the usable emission pattern and minimize the interaction between electrons to improve the throughput of the system. If desired, a demagnifying lens can be utilized between the field lens and the objective lens to increase the demagnification ratio of the system.

Abstract translation: 改进的紧凑型串联光子和电子束光刻系统包括与光电子发射源相邻的场透镜，其与物镜组合使用以最小化可用发射图案中的场像差并最小化电子之间的相互作用以提高系统的吞吐量。 如果需要，可以在场透镜和物镜之间使用减光透镜来增加系统的缩小比例。

公开(公告)号：CA2291697A1

公开(公告)日：1999-10-21

申请号：CA2291697

申请日：1999-04-05

Applicant: ETEC SYSTEMS INC

Inventor： MANKOS MARIAN ,  CHANG TAI-HON P ,  VENEKLASEN LEE H

IPC: G03F1/08 ,  G03F7/20 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

Abstract: A shaped electron beam column focuses electrons from an electron source (102) to produce a shadow image (114) of a shaped aperture (104) on a writing plane (108). The shadow image of the shaped aperture is the defocused image of a shape aperture. This defocused shadow image is in the object plane (112) of the shaped electron beam column. The shadow image in the writing plane is defocused because an electron beam lens (106) produces a focused image (110) of the electron source off the writing plane. The size of the shadow image on the writing plane may be altered by adjusting the electron beam lens to change the distance between the electron source image and the writing plane, i.e., defocus. Thus, a relatively large shaped aperture may be used in comparison to shaped apertures used in conventional electron beam columns. Further, only a small total linear demagnification may be used, which permits the length of the shaped electron beam column to be decreased. Consequently, the electronelectron interactions are reduced resulting in increased edge resolution of the image on the writing plane and increased current in the shaped electron beam column thereby increasing throughput.

公开(公告)号：CA2336557A1

公开(公告)日：2000-11-09

申请号：CA2336557

申请日：2000-05-03

Applicant: ETEC SYSTEMS INC

Inventor： LEE KIM Y ,  KIM HO-SEOB ,  CHANG T H P ,  MURAY LAWRENCE ,  MANKOS MARIAN

IPC: G03F1/16 ,  G03F7/20 ,  G03F9/00 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

Abstract: A method, an associated structure, and an apparatus for multiple charged particle beam calibration and shielded charged particle lithography. A template defining an array of membranes is positioned above a target (e.g., a semiconductor wafer of the electron beams). Each membrane defines a through slot (opening) and a set of registration marks which are located with respec t to registration marks of the other membranes. Patterns are written onto the target by scanning each electron beam through its associated through slot. Intra- and inter-charged particle beam calibrations for each charged particl e beam are carried out using its associated set of registration marks. The template also suppresses undesirable electrical charging of any resist prese nt on the target during the exposure process.

公开(公告)号：CA2336369A1

公开(公告)日：2000-11-09

申请号：CA2336369

申请日：2000-05-03

Applicant: ETEC SYSTEMS INC

Inventor： CHANG TAI-HON P ,  MANKOS MARIAN

IPC: G21K5/04 ,  H01J37/02 ,  H01J37/073 ,  H01J37/12 ,  H01J37/20 ,  H01L21/027 ,  H01J1/30

Abstract: A system for reducing surface charge on a target surface in charged particle beam lithography or microscopy, using an apparatus including: a beam column that outputs a charged particle beam towards the surface; and a charge reducing device positioned between the surface and the beam column, where th e charge reducing device emits charged particles to neutralize charge on the surface. The charge reducing device can include a MOS device and a voltage source, where the voltage source is coupled to provide a voltage across the MOS device to cause the MOS device to emit the charged particles. The charge reducing device can include multiple MOS devices mounted on a mechanical mou nt and a voltage source, where the voltage source is coupled to provide a volta ge across the MOS devices to cause the MOS devices to emit the charged particle s. The associated method for reducing surface charge on a surface includes outputting the charged particle beam towards the target surface and emitting charged particles to neutralize the resulting charge on the surface.

公开(公告)号：WO9950874A3

公开(公告)日：2000-02-17

申请号：PCT/US9905584

申请日：1999-03-16

Applicant: ETEC SYSTEMS INC

Inventor： LEE KIM Y ,  CHANG TAI-HON PHILIP ,  MANKOS MARIAN ,  BERGLUND C NEIL

IPC: H01J9/12 ,  G03F7/20 ,  H01J1/34 ,  H01J37/063 ,  H01J37/073 ,  H01J3/02

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J1/34 ,  H01J37/073 ,  H01J2237/31779

Abstract: A photocathode (300) having a gate electrode (307) so that modulation of the resulting electron beam is accomplished independently of the light beam (303). The photocathode includes a transparent substrate (301), a photoemitter (302), and an electrically separate gate electrode (307) surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.

Abstract translation: 具有栅电极（307）的光电阴极（300），使得所得电子束的调制独立于光束（303）来实现。 光电阴极包括透明基板（301），光发射器（302）和围绕发光体的发射区域的电分离的栅电极（307）。 来自发射区域的电子束发射由供给栅电极的电压调制。 此外，栅电极可以具有多个段，其能够响应于单独提供给多个段中的每一个的电压而使电子束成形。

公开(公告)号：WO0109913A3

公开(公告)日：2001-10-04

申请号：PCT/US0020260

申请日：2000-07-21

Applicant: ETEC SYSTEMS INC

Inventor： FERNANDEZ ANDRES ,  MANKOS MARIAN ,  CHANG TAI-HON PHILIP ,  LEE KIM ,  COYLE STEVEN T

IPC: H01J9/12 ,  H01J1/34 ,  H01J37/073 ,  H01L21/027

CPC classification number: B82Y10/00 ,  H01J1/34 ,  H01J37/073 ,  H01J2201/02 ,  H01J2237/31779

Abstract: A photocathode emitter (500) as a source of electron beams (504), having an optically transmissive substrate (501) patterned to define a protrusion, heat conducting material (506) occupying the space surrounding the protrusion, and a photoemitter layer (502) over the protrusion. The photoemitter is positioned on the side of the substrate opposite the surface on which the illumination is incident, and has an irradiation region (505) at the contact with the top of the protrusion patterned on the substrate, and an emission region (508) opposite the irradiation region, these regions being defined by the path of the illumination. The heat conducting material around the protrusion conducts heat away from this focused region of illumination on the photocathode. The thermal conductivity of heat-conducting materials such as gold, copper, and platinum is at least 200 times greater than that of fused silica, which is a substrate material typically used in photocathodes. This efficiently conducts heat away from the irradiation region/emission region interface, and therefore allows higher currents to be achieved from the photocathode. This in turn, permits higher throughput rates in applications including electron beam lithography.

Abstract translation: 一种作为电子束源（504）的光电阴极发射器（500），具有图案化以限定突起的光学透射衬底（501），占据突起周围的空间的导热材料（506）以及光电发射器层（502） 在突起上方。 发光体位于基板的与照明入射的面相反的一侧，具有与在基板上被图案化的凸部的顶部接触的照射区域（505）和与发光区域 照射区域，这些区域由照明路径限定。 突起周围的导热材料将热量从光电阴极上的这个聚焦照明区域传导走。 诸如金，铜和铂之类的导热材料的导热率比作为光电阴极中通常使用的衬底材料的熔融二氧化硅的导热率高至少200倍。 这有效地将热量从照射区域/发射区域界面传导走，并因此允许从光阴极获得更高的电流。 这反过来又允许在包括电子束光刻的应用中获得更高的吞吐速率。

公开(公告)号：WO0067291A3

公开(公告)日：2001-07-05

申请号：PCT/US0040082

申请日：2000-05-03

Applicant: ETEC SYSTEMS INC

Inventor： LEE KIM Y ,  KIM HO-SEOB ,  MANKOS MARIAN ,  MURAY LAWRENCE ,  CHANG T H P

IPC: G03F1/16 ,  G03F7/20 ,  G03F9/00 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/1205

Abstract: A method, an associated structure, and an apparatus for multiple charged particle beam calibration and shielded charged particle lithography. A template defining an array of membranes is positioned above a target (e.g., a semiconductor wafer of the electron beams). Each membrane defines a through slot (opening) and a set of registration marks which are located with respect to registration marks of the other membranes. Patterns are written onto the target by scanning each electron beam through its associated through slot. Intra- and inter-charged particle beam calibrations for each charged particle beam are carried out using its associated set of registration marks. The template also suppresses undesirable electrical charging of any resist present on the target during the exposure process.

Abstract translation: 一种用于多次带电粒子束校准和屏蔽带电粒子光刻的方法，相关结构和装置。 限定膜阵列的模板位于靶（例如，电子束的半导体晶片）上方。 每个隔膜限定通孔（开口）和一组相对于其他隔膜的配准标记定位的配准标记。 通过扫描每个电子束通过相关联的通孔将图案写入目标。 使用其相关联的一组注册标记来执行每个带电粒子束的内部和带电粒子束校准。 该模板还抑制曝光过程中目标物上存在的任何抗蚀剂的不期望的电荷。

公开(公告)号：AU1960601A

公开(公告)日：2001-05-10

申请号：AU1960601

申请日：2000-08-31

Applicant: ETEC SYSTEMS INC

Inventor： MANKOS MARIAN ,  CHANG TAI-HON P ,  LEE KIM Y ,  BERGLUND C NEIL

IPC: G03F7/20 ,  H01J37/073 ,  H01J37/28 ,  H01J37/30 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

Abstract: A lithographic apparatus using an array of charged particle (electron) beam columns, where the array includes a plurality of charged particle beam columns that each selectively expose a target to a plurality of charged particle beams. Each charged particle beam column includes a beam source that selectively generates a plurality of charged particle beams; an anode coaxial with the charged particle beams and that accelerates the plurality of charged particle beams from the beam source; and a lens coaxial with the charged particle beams and that demagnifies the charged particle beams. The beam source is a photocathode array that selectively supplies multiple electron beams when illuminated.

公开(公告)号：CA2329539A1

公开(公告)日：2000-09-21

申请号：CA2329539

申请日：2000-03-15

Applicant: ETEC SYSTEMS INC

Inventor： VENEKLASEN LEE H ,  MANKOS MARIAN

IPC: G03F7/20 ,  H01J37/073 ,  H01J37/12 ,  H01J37/145 ,  H01J37/305 ,  H01L21/027 ,  G03F7/00

Abstract: An improved compact tandem photon and electron beam lithography system includes a field lens adjacent the photoemission source which is utilized in combination with an objective lens to minimize field aberrations in the usable emission pattern and minimize the interaction between electrons to improve the throughput of the system. If desired, a demagnifying lens can be utilized between the field lens and the objective lens to increase the demagnification ratio of the system.

公开(公告)号：CA2289131A1

公开(公告)日：1999-10-07

申请号：CA2289131

申请日：1999-03-16

Applicant: ETEC SYSTEMS INC

Inventor： MANKOS MARIAN ,  CHANG TAI-HON PHILIP ,  LEE KIM Y ,  BERGLUND C NEIL

IPC: H01J9/12 ,  G03F7/20 ,  H01J1/34 ,  H01J37/063 ,  H01J37/073 ,  H01J29/04

Abstract: A photocathode having a gate electrode so that modulation of the resulting electron beam is accomplished independently of the laser beam. The photocathode includes a transparent substrate, a photoemitter, and an electrically separate gate electrode surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.