公开(公告)号：WO0135440A9

公开(公告)日：2002-09-12

申请号：PCT/US0023500

申请日：2000-08-25

Applicant: ETEC SYSTEMS INC

Inventor： SPALLAS JAMES P ,  MURAY LAWRENCE P

IPC: G03F7/20 ,  H01J9/18 ,  H01J37/04 ,  H01L21/027

CPC classification number: H01J9/18 ,  H01J37/04 ,  H01J2237/1501

Abstract: For electron beam columns, an off-axis alignment assembly for aligning an electron beam emitter tip to an aperture and a method of aligning the two. One embodiment of the alignment assembly is made of an electrically conductive material, such as doped silicon, which is formed integrally with an electron beam microcolumn assembly. The alignment assembly has several areas etched down to thin membranes ranging in thickness from about 2 mu m to 10 mu m. A target (e.g., a hole or raised area) is formed in each membrane and an aperture is formed during the same operation to maintain precise distances between each of the targeting positions and between each targeting position and aperture. Each membrane is transparent to a light illuminating one, or both, of its surfaces, thus allowing direct alignment of an emitting tip of an electron beam emitter with the target. Once this positioning is performed for, e.g., three targets, the precise location of the emitting tip is known relative to the aperture on the alignemt assembly, thus enabling tip alignment to the aperture without directly viewing either the tip or aperture together.

Abstract translation: 对于电子束柱，用于将电子束发射器尖端对准孔的离轴对准组件和对准两者的方法。 对准组件的一个实施例由诸如掺杂硅的导电材料制成，其与电子束微柱组件一体地形成。 对准组件有几个区域被蚀刻到厚度从约2微米到10微米之间的薄膜。 在每个膜中形成靶（例如，孔或凸起区域），并且在相同的操作期间形成孔以保持每个瞄准位置之间以及每个瞄准位置和孔之间的精确距离。 每个膜对照射其表面的一个或两者的光是透明的，因此允许电子束发射器的发射尖端与靶物直接对准。 一旦对于例如三个目标进行了定位，发射尖端的精确位置相对于对准组件组件上的孔是已知的，因此能够使尖端对准孔径而不直接观察尖端或孔。

公开(公告)号：AU5762100A

公开(公告)日：2001-01-09

申请号：AU5762100

申请日：2000-06-22

Applicant: ETEC SYSTEMS INC

Inventor： FERNANDEZ ANDRES ,  MURAY LAWRENCE P ,  SPALLAS JAMES P ,  CHANG TAI-HON PHILIP

IPC: H01J37/304

公开(公告)号：AU7078600A

公开(公告)日：2001-06-06

申请号：AU7078600

申请日：2000-08-25

Applicant: ETEC SYSTEMS INC

Inventor： SPALLAS JAMES P ,  MURAY LAWRENCE P

IPC: G03F7/20 ,  H01J9/18 ,  H01J37/04 ,  H01L21/027

Abstract: For electron beam columns, an off-axis alignment assembly for aligning an electron beam emitter tip to an aperture and a method of aligning the two. One embodiment of the alignment assembly is made of an electrically conductive material, such as doped silicon, which is formed integrally with an electron beam microcolumn assembly. The alignment assembly has several areas etched down to thin membranes ranging in thickness from about 2 mu m to 10 mu m. A target (e.g., a hole or raised area) is formed in each membrane and an aperture is formed during the same operation to maintain precise distances between each of the targeting positions and between each targeting position and aperture. Each membrane is transparent to a light illuminating one, or both, of its surfaces, thus allowing direct alignment of an emitting tip of an electron beam emitter with the target. Once this positioning is performed for, e.g., three targets, the precise location of the emitting tip is known relative to the aperture on the alignemt assembly, thus enabling tip alignment to the aperture without directly viewing either the tip or aperture together.

公开(公告)号：WO0135440A8

公开(公告)日：2003-11-13

申请号：PCT/US0023500

申请日：2000-08-25

Applicant: ETEC SYSTEMS INC

Inventor： SPALLAS JAMES P ,  MURAY LAWRENCE P

IPC: G03F7/20 ,  H01J9/18 ,  H01J37/04 ,  H01L21/027

CPC classification number: H01J9/18 ,  H01J37/04 ,  H01J2237/1501

Abstract: For electron beam columns, an off-axis alignment assembly for aligning an electron beam emitter tip to an aperture and a method of aligning the two. One embodiment of the alignment assembly is made of an electrically conductive material, such as doped silicon, which is formed integrally with an electron beam microcolumn assembly. The alignment assembly has several areas etched down to thin membranes ranging in thickness from about 2 mu m to 10 mu m. A target (e.g., a hole or raised area) is formed in each membrane and an aperture is formed during the same operation to maintain precise distances between each of the targeting positions and between each targeting position and aperture. Each membrane is transparent to a light illuminating one, or both, of its surfaces, thus allowing direct alignment of an emitting tip of an electron beam emitter with the target. Once this positioning is performed for, e.g., three targets, the precise location of the emitting tip is known relative to the aperture on the alignemt assembly, thus enabling tip alignment to the aperture without directly viewing either the tip or aperture together.

Abstract translation: 对于电子束柱，用于将电子束发射器尖端对准孔的离轴对准组件和对准两者的方法。 对准组件的一个实施例由诸如掺杂硅的导电材料制成，其与电子束微柱组件一体地形成。 对准组件有几个区域被蚀刻到厚度从约2微米到10微米之间的薄膜。 在每个膜中形成靶（例如，孔或凸起区域），并且在相同的操作期间形成孔以保持每个瞄准位置之间以及每个瞄准位置和孔之间的精确距离。 每个膜对照射其表面的一个或两者的光是透明的，因此允许电子束发射器的发射尖端与靶物直接对准。 一旦对于例如三个目标进行了定位，相对于对准组件上的孔，发射尖端的精确位置是已知的，因此能够使尖端对准孔径而不直接观察尖端或孔。