公开(公告)号：WO2014106200A2

公开(公告)日：2014-07-03

申请号：PCT/US2013/078345

申请日：2013-12-30

Applicant: FEI COMPANY

Inventor： SCHMIDT, Michael ,  BLACKWOOD, Jeffrey ,  STONE, Stacey ,  LEE, Sang, Hoon ,  KELLEY, Ronald ,  LANDIN, Trevan

CPC classification number: G01N1/32 ,  G01N1/28 ,  H01L21/30655

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 离子束研磨机使用大量研磨工艺暴露工件的横截面。 沉积前体气体被引导到样品表面，同时少量的材料从暴露的横截面去除，沉积前体产生更均匀的横截面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

公开(公告)号：EP4207243A1

公开(公告)日：2023-07-05

申请号：EP22217126.6

申请日：2022-12-29

Applicant: FEI Company

Inventor： THOMPSON, Christopher ,  ELLIS, Dustin ,  STOKES, Adam ,  KELLEY, Ronald ,  BOUCHET-MARQUIS, Cedric

IPC: H01J37/305

Abstract: Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.

公开(公告)号：EP2939260A2

公开(公告)日：2015-11-04

申请号：EP13867351.2

申请日：2013-12-30

Applicant: FEI Company

Inventor： SCHMIDT, Michael ,  BLACKWOOD, Jeffrey ,  STONE, Stacey ,  LEE, Sang, Hoon ,  KELLEY, Ronald ,  LANDIN, Trevan

IPC: H01L21/205

CPC classification number: G01N1/32 ,  G01N1/28 ,  H01L21/30655

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.