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    METHOD FOR PREPARING SAMPLES FOR IMAGING
    1.
    发明申请
    METHOD FOR PREPARING SAMPLES FOR IMAGING 审中-公开
    制备图像样本的方法

    公开(公告)号：WO2014106200A2

    公开(公告)日：2014-07-03

    申请号：PCT/US2013/078345

    申请日：2013-12-30

    Applicant: FEI COMPANY

    Inventor： SCHMIDT, Michael ,  BLACKWOOD, Jeffrey ,  STONE, Stacey ,  LEE, Sang, Hoon ,  KELLEY, Ronald ,  LANDIN, Trevan

    CPC classification number: G01N1/32 ,  G01N1/28 ,  H01L21/30655

    Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 离子束研磨机使用大量研磨工艺暴露工件的横截面。 沉积前体气体被引导到样品表面，同时少量的材料从暴露的横截面去除，沉积前体产生更均匀的横截面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

    MULTIDIMENSIONAL STRUCTURAL ACCESS
    3.
    发明申请
    MULTIDIMENSIONAL STRUCTURAL ACCESS 审中-公开
    多维结构访问

    公开(公告)号：WO2014055935A1

    公开(公告)日：2014-04-10

    申请号：PCT/US2013/063556

    申请日：2013-10-04

    Applicant: FEI COMPANY

    Inventor： BLACKWOOD, Jeffrey ,  LEE, Sang Hoon ,  SCHMIDT, Michael ,  STONE, Stacey ,  HOLLAND, Karey

    IPC: H01L21/66

    CPC classification number: G01R31/2653 ,  G01N1/286 ,  G01N1/32 ,  G01R31/2808 ,  G01R31/2898 ,  G01R31/307 ,  G01R31/312 ,  H01J37/153 ,  H01J37/3005 ,  H01J2237/208 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01J2237/31749 ,  H01L22/14 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Multiple planes within the sample are exposed from a single perspective for contact by an electrical probe. The sample can be milled at a non-orthogonal angle to expose different layers as sloped surfaces. The sloped edges of multiple, parallel conductor planes provide access to the multiple levels from above. The planes can be accessed, for example, for contacting with an electrical probe for applying or sensing a voltage. The level of an exposed layer to be contacted can be identified, for example, by counting down the exposed layers from the sample surface, since the non-orthogonal mill makes all layers visible from above. Alternatively, the sample can be milled orthogonally to the surface, and then tilted and/or rotated to provide access to multiple levels of the device. The milling is preferably performed away from the region of interest, to provide electrical access to the region while minimizing damage to the region.

    Abstract translation: 样品中的多个平面从单个视角暴露，用于通过电探针进行接触。 可以以非正交角度研磨样品以将不同层暴露为倾斜表面。 多个平行导体平面的倾斜边缘可以从上方访问多个层面。 例如，可以接触平面用于与用于施加或感测电压的电探针接触。 例如，通过从样品表面中倒下暴露的层，可以识别要接触的暴露层的水平，因为非正交研磨机使得所有层从上方可见。 或者，样品可以与表面正交碾磨，然后倾斜和/或旋转以提供对多层装置的访问。 研磨优选远离感兴趣区域进行，以提供对该区域的电接入，同时使对该区域的损害最小化。

    METHOD AND SYSTEM FOR REDUCING CURTAINING IN CHARGED PARTICLE BEAM SAMPLE PREPARATION
    4.
    发明申请
    METHOD AND SYSTEM FOR REDUCING CURTAINING IN CHARGED PARTICLE BEAM SAMPLE PREPARATION 审中-公开
    用于减少充电颗粒光束样品制备中的遮蔽的方法和系统

    公开(公告)号：WO2014055974A1

    公开(公告)日：2014-04-10

    申请号：PCT/US2013/063640

    申请日：2013-10-07

    Applicant: FEI COMPANY

    Inventor： SCHMIDT, Michael ,  KIM, Hyun Hwa ,  LEE, Sang Hoon ,  STONE, Stacey ,  BLACKWOOD, Jeffrey

    IPC: H01L21/66

    CPC classification number: G01N1/32 ,  G01N1/286 ,  H01J37/20 ,  H01J37/3053 ,  H01J2237/31745

    Abstract: A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure.

    Abstract translation: 一种方法和系统，用于暴露用于在带电粒子束系统中观察的样品中的结构的一部分，包括从大量样品中提取样品; 确定减少绘制的样品的取向; 将样品安装到带电粒子束系统中的保持器上，使得保持器以样品取向使得当样品被研磨以暴露结构时减少绘制的取向; 通过在减少绘制的方向上研磨样品来暴露结构; 并对结构进行成像。

    HIGH ASPECT RATIO STRUCTURE ANALYSIS
    5.
    发明申请
    HIGH ASPECT RATIO STRUCTURE ANALYSIS 审中-公开
    高比例结构分析

    公开(公告)号：WO2014055876A1

    公开(公告)日：2014-04-10

    申请号：PCT/US2013/063479

    申请日：2013-10-04

    Applicant: FEI COMPANY

    Inventor： LEE, Sang Hoon ,  STONE, Stacey ,  BLACKWOOD, Jeffrey ,  SCHMIDT, Michael

    IPC: G01N23/00 ,  B23K15/08 ,  G01B15/00

    CPC classification number: H01J37/3053 ,  C23C14/46 ,  G01N1/32 ,  H01J37/28 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/3174 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion beam can mill at an angle to the work piece surface to create a sloped surface. A protective layer is deposited onto the sloped surface, and the ion beam mills through the protective layer to expose the feature of interest for analysis. The sloped mill positions the protective layer close to the feature of interest to reduce curtaining.

    Abstract translation: 通过减小保护层和感兴趣的特征之间的距离来减少高纵横比特征上的赝像。 例如，离子束可以与工件表面成一定角度磨，以产生倾斜的表面。 保护层沉积在倾斜表面上，并且离子束通过保护层研磨以暴露感兴趣的特征以进行分析。 倾斜的磨机使保护层位于感兴趣的特征附近以减少绘制。

    GLANCING ANGLE MILL
    7.
    发明申请
    GLANCING ANGLE MILL 审中-公开
    磨光角磨机

    公开(公告)号：WO2013039891A1

    公开(公告)日：2013-03-21

    申请号：PCT/US2012/054626

    申请日：2012-09-11

    Applicant: FEI COMPANY ,  SCHMIDT, Michael ,  BUGGE, Cliff

    Inventor： SCHMIDT, Michael ,  BUGGE, Cliff

    IPC: G01N1/28 ,  H01J37/26

    CPC classification number: H01J37/3053 ,  G01N1/286 ,  G01N2001/2873 ,  H01J37/3005 ,  H01J2237/31745

    Abstract: A method and system for forming a planar cross-section view for an electron microscope. The method comprises directing an ion beam from an ion source toward a first surface of a sample to mill at least a portion of the sample; milling the first surface, using the ion beam, to expose a second surface in which the end of the second surface distal to the ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to the ion source; directing an electron beam from an electron source to the second surface; and forming an image of the second surface by detecting the interaction of the electron beam with the second surface. Embodiments also include planarzing the first surface of the sample prior to forming a cross-section.

    Abstract translation: 用于形成电子显微镜的平面横截面图的方法和系统。 该方法包括将来自离子源的离子束引向样品的第一表面以研磨至少一部分样品; 使用离子束铣削第一表面以暴露第二表面，在该第二表面中，远离离子源的第二表面的端部相对于参考深度被研磨至比第一表面的靠近离子的端部更大的深度 资源; 将电子束从电子源引导至第二表面; 以及通过检测电子束与第二表面的相互作用来形成第二表面的图像。 实施例还包括在形成横截面之前对样品的第一表面进行平面化。

    FIDUCIAL DESIGN FOR TILTED OR GLANCING MILL OPERATIONS WITH A CHARGED PARTICLE BEAM
    8.
    发明申请
    FIDUCIAL DESIGN FOR TILTED OR GLANCING MILL OPERATIONS WITH A CHARGED PARTICLE BEAM 审中-公开
    具有充电颗粒光束的倾斜或移动铣刀操作的设计

    公开(公告)号：WO2014106182A1

    公开(公告)日：2014-07-03

    申请号：PCT/US2013/078315

    申请日：2013-12-30

    Applicant: FEI COMPANY

    Inventor： STONE, Stacey ,  LEE, Sang Hoon ,  BLACKWOOD, Jeffrey ,  SCHMIDT, Michael ,  KIM, Hyun Hwa

    IPC: H01J37/317

    CPC classification number: H01J37/317 ,  H01J37/3056 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2814 ,  H01J2237/31745

    Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

    Abstract translation: 一种用于分析具有带电粒子束的样品的方法，包括将束朝向样品表面引导; 铣削表面以暴露样品中的第二表面，其中远离离子源的第二表面的端部相对于参考深度比距离离子源的第一表面的端部更深的深度; 将带电粒子束引向第二表面以形成第二表面的一个或多个图像; 通过检测电子束与第二表面的相互作用形成感兴趣的多个相邻特征的横截面的图像; 将横截面的图像组装成感兴趣的一个或多个特征的三维模型。 提出了一种用于形成改进的基准并确定纳米尺度三维结构中暴露特征的深度的方法。

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