7.
    发明专利
    未知

    公开(公告)号:AT544094T

    公开(公告)日:2012-02-15

    申请号:AT08020170

    申请日:2006-05-22

    Applicant: FUJIFILM CORP

    Inventor: WADA KENJI

    Abstract: A photosensitive composition comprising: (A) a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation, a pattern forming method using the photosensitive composition, and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.

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