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公开(公告)号：AT528690T
公开(公告)日：2011-10-15
申请号：AT08006042
申请日：2008-03-28
Applicant: FUJIFILM CORP
Inventor： SHIRAKAWA KOJI , YATSUO TADATERU
IPC: G03F7/038
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Patent Agency Ranking
公开(公告)号：SG192024A1
公开(公告)日：2013-08-30
申请号：SG2013054861
申请日：2011-12-22
Applicant: FUJIFILM CORP
Inventor： TSUCHIMURA TOMOTAKA , YATSUO TADATERU
Abstract: A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
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3.发明公开ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权光化辐射敏感性树脂组合物及结构形成方法使用该组合物
公开(公告)号：EP2406686A4
公开(公告)日：2012-08-08
申请号：EP10750956
申请日：2010-03-12
Applicant: FUJIFILM CORP
Inventor： TSUBAKI HIDEAKI , SHIRAKAWA KOJI , YATSUO TADATERU , TSUCHIHASHI TORU , TSUCHIMURA TOMOTAKA
IPC: G03F7/039 , C08F12/22 , G03F7/004 , H01L21/027
CPC classification number: G03F7/0392 , G03F7/0045 , G03F7/0046
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4.发明公开NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN 审中-公开用于形成负极方法抗蚀剂结构，开发商和抗蚀负化学强化THEREOF组成和抗蚀剂结构
公开(公告)号：EP2384458A4
公开(公告)日：2012-11-28
申请号：EP10735970
申请日：2010-01-29
Applicant: FUJIFILM CORP
Inventor： TSUCHIHASHI TORU , YATSUO TADATERU , SHIRAKAWA KOJI , TSUBAKI HIDEAKI , ASANO AKIRA
CPC classification number: G03F7/0382 , G03F7/0045 , G03F7/325
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5.发明公开RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, RESIST FILM AND RESIST-COATED MASK BLANKS 审中-公开形成PAINT结构，PAINT结构的方法，联网化学增强负涂料组合物用于有机溶剂中，漆膜涂层进行涂覆掩膜空白发展
公开(公告)号：EP2689292A4
公开(公告)日：2014-11-12
申请号：EP12764533
申请日：2012-02-17
Applicant: FUJIFILM CORP
Inventor： TSUCHIHASHI TORU , YATSUO TADATERU , TAKAHASHI KOUTAROU , TSUCHIMURA TOMOTAKA
IPC: G03F7/038 , C08F12/14 , G03F7/32 , H01L21/027
CPC classification number: G03F7/20 , C08F8/14 , C08F12/24 , C08F212/14 , C08J3/24 , C08J2325/18 , G03F1/50 , G03F7/004 , G03F7/0382 , G03F7/325 , Y10S430/143 , C08F212/32
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6.发明公开CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND 审中-公开化学增强的涂料组合物，用该组合物漆膜涂油漆掩模坯料，形成了PAINT结构，光掩膜和高分子化合物的方法
公开(公告)号：EP2666057A4
公开(公告)日：2014-07-30
申请号：EP11856421
申请日：2011-12-22
Applicant: FUJIFILM CORP
Inventor： TSUCHIMURA TOMOTAKA , YATSUO TADATERU
CPC classification number: G03F7/0382 , C08F12/24 , C08F212/14 , C08F257/00 , C08K5/19 , C09D125/18 , G03F1/20 , G03F1/22 , G03F1/56 , G03F1/76 , G03F7/0397 , G03F7/20 , G03F7/2037 , G03F7/2039 , C08F212/32 , C08L25/18 , C08F2220/185 , C08F220/42
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