公开(公告)号：DE3311249A1

公开(公告)日：1983-10-06

申请号：DE3311249

申请日：1983-03-28

Applicant: FUSION SYSTEMS CORP

Inventor： MATTHEWS JOHN C ,  URY MICHAEL G ,  WOOD CHARLES H ,  GREENBLATT MARSHAL

IPC: F21S2/00 ,  G03F7/20 ,  H01J65/04 ,  H01L21/027 ,  H01L21/31

Abstract: A method and apparatus for performing deep UV photolithography which utilizes a microwave generated electrodeless light source for producing deep UV radiation. This results in faster semiconductor exposure times and less system downtime for changing failed bulbs as well as other advantages which are detailed herein.