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公开(公告)号：WO2014150465A2
公开(公告)日：2014-09-25
申请号：PCT/US2014023331
申请日：2014-03-11
Applicant: GEN ELECTRIC
Inventor： WAN JULIN , BRUN MILIVOJ KONSTANTIN , MESCHTER PETER JOEL , SARRAFI-NOUR REZA , LIPKIN DON MARK
IPC: C04B41/87
CPC classification number: C09D5/084 , B05D7/52 , C04B41/009 , C04B41/5066 , C04B41/52 , C04B41/87 , C04B41/89 , C23C28/044 , C23C28/048 , C23C28/42 , F01D5/288 , F05D2230/90 , F05D2300/177 , Y10T428/2495 , C04B35/565 , C04B35/806 , C04B35/584 , C04B35/58085 , C04B41/4529 , C04B41/5071
Abstract: An article includes a substrate and a coating provided on a surface of the substrate. The coating includes at least one metal silicide layer consisting essentially of MoSi2 or WSi2 or (Mo, W)Si2 or a platinum group metal silicide and at least one layer consisting essentially of Si3N4.
Abstract translation: 一种制品包括基材和设置在基材表面上的涂层。 涂层包括至少一个金属硅化物层，其基本上由MoSi 2或WSi 2或（Mo，W）Si 2或铂族金属硅化物和至少一个由Si 3 N 4组成的层组成。
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2.发明申请HYBRID AIR PLASMA SPRAY AND SLURRY METHOD OF ENVIRONMENTAL BARRIER DEPOSITION 审中-公开混合空气等离子体喷雾和浆液沉积方法
公开(公告)号：WO2014022191A3
公开(公告)日：2014-04-24
申请号：PCT/US2013052022
申请日：2013-07-25
Applicant: GEN ELECTRIC
Inventor： MARGOLIES JOSHUA LEE , ROBERTS HERBERT CHIDSEY , LIPKIN DON MARK , KIRBY GLEN HAROLD , ANTOLINO NICHOLAS EDWARD
CPC classification number: C23C4/12 , C04B41/009 , C04B41/52 , C04B41/89 , C23C4/02 , C23C4/18 , C23C28/00 , F01D5/282 , F01D5/288 , F05D2220/32 , F05D2230/312 , F05D2240/30 , F05D2300/15 , F05D2300/6033 , Y02T50/672 , C04B35/565 , C04B35/806 , C04B35/58092 , C04B35/584 , C04B35/52 , C04B35/83 , C04B41/4531 , C04B41/5096 , C04B41/4527 , C04B41/5071 , C04B41/522 , C04B41/5024 , C04B41/4539 , C04B41/526
Abstract: A bond layer may be applied to the substrate of an article and a first layer may be applied to the bond layer by thermal spray. A second layer may be applied above the first layer by slurry coating.
Abstract translation: 可以将粘合层施加到制品的基底上，并且可以通过热喷涂将第一层施加到接合层。 可以通过浆料涂覆在第一层上方施加第二层。
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公开(公告)号：WO0048751A9
公开(公告)日：2001-11-29
申请号：PCT/US0003873
申请日：2000-02-15
Applicant: GEN ELECTRIC
Inventor： LIPKIN DON MARK , RASCH LYLE TRIMOTHY , MESCHTER PETER JOEL
CPC classification number: C23G5/00 , B08B7/0035
Abstract: A method and system for cleaning a metal article. The system is used to employ a method that comprises placing the article in a means defining a chamber; subjecting the article to a gaseous atmosphere in the means defining a chamber, where the gaseous atmosphere consists essentially of carbon, hydrogen, and fluorine; and subjecting the article to the gaseous atmosphere at a temperature in a range from about 815 DEG C to about 1100 DEG C to clean the article.
Abstract translation: 一种用于清洁金属制品的方法和系统。 该系统用于采用一种方法，该方法包括将物品放置在限定腔室的装置中; 在限定室的装置中使制品经受气态气氛，其中气体气氛基本上由碳，氢和氟组成; 并将物品在约815℃至约1100℃的温度下进行气态气氛的清洁。
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4.发明申请SILICA-FORMING ARTICLES HAVING ENGINEERED SURFACES TO ENHANCE RESISTANCE TO CREEP SLIDING UNDER HIGH-TEMPERATURE LOADING 审中-公开具有工程化表面的二氧化硅制品，以提高耐高温加载下的爬行能力
公开(公告)号：WO2015073082A3
公开(公告)日：2015-07-02
申请号：PCT/US2014051574
申请日：2014-08-19
Applicant: GEN ELECTRIC
Inventor： LIPKIN DON MARK , JOHNSON CURTIS ALAN , MESCHTER PETER JOEL , SUNDARAM SAIRAM , WAN JULIN
CPC classification number: C04B41/009 , C04B41/52 , C04B41/89 , F01D5/288 , F05D2250/181 , Y10T428/24537 , C04B35/565 , C04B35/806 , C04B41/5096 , C04B41/5059 , C04B41/522 , C04B41/0072 , C04B41/4556 , C04B41/5035 , C04B41/4558 , C04B41/5024 , C04B41/5037 , C04B41/5029
Abstract: An article includes a silicon-containing region; at least one outer layer overlying a surface of the silicon-containing region; and a constituent layer on the surface of the silicon-containing region and between and contacting the silicon-containing region and the at least one outer layer, the constituent layer being formed by constituents of the silicon-containing region and being susceptible to creep within an operating environment of the article, wherein the silicon-containing region defines a pluarality of channels and a plurality of ridges that interlock within a plurality of channels formed in the silicon-containing region to physically interlock the at least one outer layer with the silicon-containing region through the constituent layer.
Abstract translation: 一种制品包括含硅区域; 覆盖所述含硅区域的表面的至少一个外层; 以及所述含硅区域的表面上并且在与所述含硅区域和所述至少一个外层接触的构成层之间，所述构成层由所述含硅区域的成分形成，并且易于在所述含硅区域内形成蠕变 所述制品的操作环境，其中所述含硅区域限定通道的多重性，以及在形成于所述含硅区域内的多个通道内互锁的多个脊，以使所述至少一个外层与所述含硅区域物理地互锁 区域通过构成层。
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公开(公告)号：JP2002042641A
公开(公告)日：2002-02-08
申请号：JP2001148557
申请日：2001-05-18
Applicant: GEN ELECTRIC
Inventor： DENNIS JOSEPH DALPE , GEARING ELENA ROZIER , LIPKIN DON MARK
Abstract: PROBLEM TO BE SOLVED: To provide a method and a device for adjusting filament height in a cathode of an X-ray tube. SOLUTION: A cathode cup 52 of an X-ray tube through which at least one hole is passed is installed, leads 58A-58D of a filament are inserted into the hole up to the height lower than desirable filament height, actual filament height made by insertion is measured, the actual height made by actual insertion is compared with the desirable filament height, the filament height adjustment is decided to be almost equal to the difference between the actual filament height and the desirable filament height, each one end of the leads of the filament is brought into contact with each of adjusting tools 100, 102, 106, and the adjusting tools are moved by the distance almost equal to the filament height adjustment. Therefore, the filament is positioned in the specified filament height.
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Patent Agency Ranking
公开(公告)号：JP2001172799A
公开(公告)日：2001-06-26
申请号：JP2000315995
申请日：2000-10-17
Applicant: GEN ELECTRIC
Inventor： WEI BIN , LIPKIN DON MARK , MACDONALD LEO SPITZ
Abstract: PROBLEM TO BE SOLVED: To provide a method for electrochemically releasing >=1 metallic film from a substrate. SOLUTION: Since the method of this invention has electrochemical selectivity, an influence of the electrochemical releasing method on a mother alloy is minimized. This method consists of a stage for preparing an electrolyte, a stage for arranging a coated article and >=1 electrode in the electrolyte, a stage for applying a current between the electrode and coated article and a stage for removing >=1 film from the coated article without changing the mother alloy in quality. The system for performing the electrochemical releasing method is composed of an electrode, a DC power source and plural electrodes for applying a DC current to the article to be treated. The DC power source can be connected to the coated article and plural electrodes. One or more films are removed from the mother alloy by this system.
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公开(公告)号：CA2958134C
公开(公告)日：2020-02-04
申请号：CA2958134
申请日：2017-02-16
Applicant: GEN ELECTRIC
Inventor： SAHA ATANU , ANTOLINO NICHOLAS EDWARD , LIPKIN DON MARK
Abstract: Methods of forming an environmental barrier coating (20) are disclosed. A method includes disposing a powder-based coating on a substrate (12), heat- treating the powder-based coating at a temperature greater than 800°C and less than 1200°C to form a porous coating that includes surface-connected pores, infiltrating at least some of the surface-connected pores of the porous coating with an infiltrant material to form an infiltrated coating, and sintering the infiltrated coating at a temperature greater than 1200°C and less than 1500°C to form the environmental barrier coating (20) on the substrate (12).
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公开(公告)号：CA2958134A1
公开(公告)日：2017-08-29
申请号：CA2958134
申请日：2017-02-16
Applicant: GEN ELECTRIC
Inventor： SAHA ATANU , ANTOLINO NICHOLAS EDWARD , LIPKIN DON MARK
Abstract: Methods of forming an environmental barrier coating (20) are disclosed. A method includes disposing a powder-based coating on a substrate (12), heat-treating the powder-based coating at a temperature greater than 800°C and less than 1200°C to form a porous coating that includes surface-connected pores, infiltrating at least some of the surface-connected pores of the porous coating with an infiltrant material to form an infiltrated coating, and sintering the infiltrated coating at a temperature greater than 1200°C and less than 1500°C to form the environmental barrier coating (20) on the substrate (12).
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公开(公告)号：BR102016000008A2
公开(公告)日：2016-09-13
申请号：BR102016000008
申请日：2016-01-04
Applicant: GEN ELECTRIC
Inventor： POERSCHKE DAVID , LIPKIN DON MARK , MCEVOY KEVIN PAUL , ANTOLINO NICHOLAS EDWARD
IPC: B29C73/02 , C09D183/04
Abstract: formulação de remendo com base em silício, remendo ambientalmente resistente com base em silício e método. no presente documento, é estabelecida uma formulação de remendo com base em silício que compreende cerca de 25 a 66 por cento em volume de um solvente; cerca de 4 a 10 por cento em volume de um material aglutinante que compreende silício; e cerca de 30 a 65 por cento em volume de um material de remendo, sendo que o material de remendo compreende partículas que têm um ou mais elementos do grupo iiia não actinídeos, em que uma razão molar entre os um ou mais elementos do grupo iiia não actinídeos e o silício na formulação de remendo é de cerca de 0,95 a 1,25.
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10.发明专利
公开(公告)号：CA2933377A1
公开(公告)日：2015-06-25
申请号：CA2933377
申请日：2014-12-17
Applicant: GEN ELECTRIC
Inventor： MANEPALLI SATYA KISHORE , GROSSMAN THEODORE ROBERT , LIPKIN DON MARK , GOURISHANKAR KARTHICK VILAPAKKAM , LYONS ROBERT JOSEPH
IPC: C22B59/00
Abstract: Systems and methods for recovery of rare-earth constituents from environmental barrier coatings are provided. One method includes extracting rare-earth (RE) oxide constituents from a feedstock containing RE silicates and non-RE contaminants. The method includes leaching the REs from the feedstock into an acid to form an acid solution, performing an oxalate precipitation on the acid solution to form an RE oxalate hydrate, and separating the RE oxalate hydrate from the acid solution. The method also includes heat treating the RE oxalate hydrate to form an RE oxide containing the RE elements extracted from the feedstock.
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