Mems structure with surface potential control

    公开(公告)号:AU2002361551A1

    公开(公告)日:2003-04-22

    申请号:AU2002361551

    申请日:2002-07-22

    Abstract: In an electrostatically controlled apparatus, such as a MEMS array having cavities formed around electrodes and which is mounted directly on a dielectric substrate in which are embedded electrostatic actuation electrodes disposed in alignment with the individual MEMS elements, a mechanism is provided to controllably neutralize excess charge and establish a controlled potential between the MEMS elements and the electrostatic actuation electrodes.

    MEMS STRUCTURE WITH SURFACE POTENTIAL CONTROL
    4.
    发明申请
    MEMS STRUCTURE WITH SURFACE POTENTIAL CONTROL 审中-公开
    具有表面电位控制的MEMS结构

    公开(公告)号:WO03031316A2

    公开(公告)日:2003-04-17

    申请号:PCT/US0223418

    申请日:2002-07-22

    CPC classification number: G02B26/0841 B81B3/0086 B81B2201/042

    Abstract: In an electrostatically controlled apparatus, such as a MEMS array having cavities formed around electrodes and which is mounted directly on a dielectric substrate in which are embedded electrostatic actuation electrodes disposed in alignment with the individual MEMS elements, a mechanism is provided to controllably neutralize excess charge and establish a controlled potential between the MEMS elements and the electrostatic actuation electrodes.

    Abstract translation: 在静电控制装置中,例如具有围绕电极形成的空腔的MEMS阵列,其直接安装在电介质基底上,其中嵌入的静电致动电极与各个MEMS元件对准设置,提供了可控地中和多余电荷的机构 并且在MEMS元件和静电致动电极之间建立受控电位。

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