Abstract:
The present disclosure discloses a method for transferring micro-light emitting diodes, a micro-light emitting diode device and an electronic device. The method for transferring micro-light emitting diodes comprises: providing bumps of bonding agent on electrode bonding pads of a receiving substrate and/or on micro-light emitting diodes of an original substrate; aligning and contacting the electrode bonding pads of the receiving substrate and the micro-light emitting diodes of the original substrate, to position the bumps of bonding agent between the micro-light emitting diodes and the electrode bonding pads; irradiating locally by using a first laser from the original substrate side, to melt the bumps of bonding agent to bond the micro-light emitting diodes and the electrode bonding pads; and stripping off the micro-light emitting diodes from the original substrate, to transfer the micro-light emitting diodes to the receiving substrate. The present disclosure, by heating quickly and locally by laser irradiation, avoids the overall warming-up of the receiving substrate and the original substrate, reduces the heat mismatch phenomenon, optimizes the flow of the bonding of the micro-light emitting diodes, and facilitates the controlling.
Abstract:
A laser projection device and a laser projection system. The laser projection device comprises a light source scanner (1) and a MEMS scanning mirror (2), the light source scanner (1) comprising micro laser diodes (11); and the micro laser diodes (11) are used to provide laser beams needed for image projection, and the laser beams are projected to the MEMS scanning mirror (2), and then reflected by the MEMS scanning mirror (2) to a predetermined area (3) to form a projection image. By providing the micro laser diodes (11) in the laser projection device and initiatively emitting laser by exciting the micro laser diodes (11), the laser projection device does not need an external laser source and facilitates the reduction of the size of the laser projection device, as compared with the prior art.
Abstract:
A silicon microphone (10) with a high-aspect-ratio corrugated diaphragm (200). The microphone (10) comprises a compliant diaphragm (200) on which at least one ring-shaped corrugation (210) is formed in the vicinity of the edge of the diaphragm (200) which is fixed to the substrate (100), wherein the depth of the corrugation (210) to the thickness of the diaphragm (200) is larger than 5:1, preferably 20:1, and the walls of the corrugation (210) are inclined to the surface of the diaphragm (200) at an angle in the range of 80º to 100º. The microphone (10) with a high-aspect-ratio corrugated diaphragm (200) can achieve a consistent and optimal sensitivity and reduce impact applied thereto in a drop test so that the performances, the reproducibility, the reliability and the yield can be improved.
Abstract:
An image display device comprises: a thin film transistor backplane (1), and a first resolution display panel (2), a second resolution display panel (4), a display driving chip (3) and an integrated display driver (5), which are fixed on the thin film transistor backplane (1); the display driving chip (3) is electrically connected to bonding pads (111) on the thin film transistor backplane (1), and is provided under the second resolution display panel (4); and the display driving chip (3) is used for driving the second resolution display panel (4); the integrated display driver (5) is used for driving the first resolution display panel (2); and a resolution of the first resolution display panel (2) is lower than a resolution of the second resolution display panel (4). The first resolution display panel (2) is driven by the standard drive manner of thin film transistor display panels, to realize low resolution displaying, and the second resolution display panel (4) is driven by the display driving chip (3), to improve the displaying quality of the display device.
Abstract:
A MEMS microphone, comprising a packaging structure that is enveloped by a PCB substrate (1) and a housing (2), wherein the packaging structure is provided with a MEMS acoustoelectric chip (3) therein, and the PCB substrate (1) is provided with a sound port (11) at a position that is corresponding to the MEMS acoustoelectric chip (3), wherein, the MEMS microphone further comprises a filter (5), wherein the filter (5) is embedded into a back cavity of the MEMS acoustoelectric chip (3), the filter (5) and the PCB substrate (1) have a lateral hole therebetween, and the lateral hole serves as a sound channel that is used by the MEMS acoustoelectric chip (3)to gather sound. The MEMS microphone can prevent gas shock, block the interfering to the MEMS microphone by kinetic particles, keep the acoustic performance of the MEMS microphone, and reduce the packaging size of the MEMS microphone.
Abstract:
A laser projection device and a laser projection system are provided. The laser projection device comprises an optical fiber scanner (1) and a MEMS scanning mirror (2). An optical fiber (11) is disposed on the optical fiber scanner (1) and the optical fiber (11) is used to deliver laser beams needed by projection. The optical fiber scanner (1) drives the optical fiber (11) to scan in a first plane and enables the laser beam to project to the MEMS scanning mirror (2), and the MEMS scanning mirror (2) makes scanning movement about a first axis and reflects the laser beam to a predetermined area (3) to form a projection image, wherein the first axis is located in the first plane, or the first axis is parallel to the first plane. Different from the manner in the prior art that the optical fiber scanner or the MEMS scanning mirror makes dual-axis movement individually to implement projection, this laser projection device achieves laser projection by enabling the optical fiber scanner and the MEMS scanning mirror to scan simultaneously in different directions.
Abstract:
Providing a method for manufacturing a thermal bimorph diaphragm and a MEMS speaker with thermal bimorphs, wherein the method comprises the steps of: thermally oxidizing a substrate (1) to obtain an insulating layer (2) thereon and providing a metal layer (3) on the insulating layer (2); providing a sacrificial layer (4) on the metal layer (3); providing a first thermal bimorph layer (5) on the sacrificial layer (4); providing a second thermal bimorph layer (6) on the first thermal bimorph layer (5); providing a metal connecting layer (7) at the positions on the metal layer (3) where the sacrificial layer (4) is not provided; forming corresponding back holes (16) on the substrate (1) and the insulating layer (2) and releasing the sacrificial layer (4); forming a warped thermal bimorph diaphragm with the first thermal bimorph layer (5) and the second thermal bimorph layer (6) after the sacrificial layer (4) is released. With the MEMS speaker with thermal bimorphs, the problems of high production cost, complicated wafer process and limitations on sound performance improvements are solved.
Abstract:
A method for manufacturing a fully wafer-level-packaged MEMS microphone and a microphone manufactured with the same are provided, the method comprises: separately manufacturing a first packaging wafer, an MEMS microphone wafer and a second packaging wafer; performing wafer-to-wafer bonding for the three wafers to form a plurality of fully wafer-level-packaged MEMS microphone units; singulating the fully wafer-level-packaged MEMS microphone units to form a plurality of fully wafer-level-packaged MEMS microphones, which are fully packaged at wafer level and do not need any further process after die singulation. The method can improve cost-effectiveness, performance consistency, manufacturability, quality, scaling capability of the packaged MEMS microphone.
Abstract:
A PCB speaker and a method for micromachining the speaker diaphragm on PCB substrate, the method for micromachining the speaker diaphragm on PCB substrate comprises: providing metal paths and at least one through hole on the PCB substrate (S110); providing a patterned sacrificial layer on the PCB substrate, the sacrificial layer covering all the through holes on the PCB substrate (S120); providing a diaphragm layer on the sacrificial layer through depositing, mounting or laminating, the diaphragm layer covering the sacrificial layer and electrically connected with the metal paths on the PCB substrate, thereby forming a diaphragm layer (S130); and releasing the sacrificial layer and the diaphragm layer remains (S140).
Abstract:
A silicon speaker comprising an MEMS acoustoelectric chip and a PCB substrate (3), wherein the MEMS acoustoelectric chip comprises a corrugated diaphragm (1) on a silicon substrate (2); and one side surface of the MEMS acoustoelectric chip is metalized, and the metalized side surface (6) of the MEMS acoustoelectric chip is connected with the PCB substrate. The corrugated diaphragm is electrically conductive and interconnected with metal paths (5) on MEMS acoustoelectric chip, which is led out to a first PCB metal path as one electrode. A second PCB metal path below the MEMS chip forms another electrode of the electrostatic actuator.