公开(公告)号：AU2003236112A1

公开(公告)日：2003-10-27

申请号：AU2003236112

申请日：2003-04-11

Applicant: HAMAMATSU PHOTONICS KK

Inventor： NOMOTO YOSHIRO ,  ICHIKAWA NORIO ,  KITAHARA TADASHI

IPC: G01J1/42 ,  H01J40/04 ,  G01J1/02

Abstract: A substrate 18, a cathode 20 and an anode 22 are stored in a space demarcated by a casing 10, and the space is evacuated. The cathode 20 and the anode 22 are provided on the same surface of a substrate 18 having electric insulation, and have a comb-tooth shape so as to be mutually engaged. Therefore, the area of the part in which the cathode 20 and the anode 22 approach each other becomes larger, and thereby photoelectrons discharged from the cathode 20 through the incidence of ultraviolet rays are transmitted in the vacuum, and are favorably collected in the anode 22.

公开(公告)号：EP1498706A4

公开(公告)日：2009-04-29

申请号：EP03746462

申请日：2003-04-11

Applicant: HAMAMATSU PHOTONICS KK

Inventor： KITAHARA TADASHI ,  NOMOTO YOSHIRO ,  ICHIKAWA NORIO

IPC: G01J1/42 ,  H01J40/04 ,  G01J1/02

CPC classification number: G01J1/02 ,  G01J1/0204 ,  G01J1/0271 ,  G01J1/429 ,  H01J40/04

Abstract: A substrate (18), a cathode (20), and an anode (22) are housed in a space defined by a casing (10), and the space is evacuated. The cathode (20) and the anode (22) are provided on the same face of the electrically insulating substrate (18) and show comb-tooth interdigital shapes. Thus, the area of a section where the cathode (20) is near the anode (22) is large, so that photoelectrons emitted from the cathode (20) by incidence of ultraviolet rays is propagated through the vacuum and are favorably trapped collected by the anode (22).

Abstract translation: 基板（18），阴极（20）和阳极（22）容纳在由壳体（10）限定的空间中，并且该空间被抽空。 阴极（20）和阳极（22）设置在电绝缘基板（18）的同一面上，并显示出梳齿叉指形状。 因此，阴极（20）靠近阳极（22）的部分的面积很大，使得通过紫外线入射从阴极（20）发射的光电子在真空中传播并且有利地被 阳极（22）。

公开(公告)号：JP2011222322A

公开(公告)日：2011-11-04

申请号：JP2010090738

申请日：2010-04-09

Applicant: Hamamatsu Photonics Kk ,  浜松ホトニクス株式会社

Inventor： KITAHARA TADASHI ,  ICHIKAWA NORIO

IPC: H01J9/12 ,  H01J1/35 ,  H01J9/02 ,  H01J11/02 ,  H01J11/22 ,  H01J11/34 ,  H01J11/40

Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing an electrode for generating secondary electrons, which can increase the efficiency of secondary electron generation and reduce the aged deterioration of the efficiency of secondary electron generation in comparison to a conventional method.SOLUTION: A method of manufacturing an electrode for generating secondary electrons, which has a secondary electron generating layer on a surface thereof, includes: a diffusion-prevention layer forming step for forming, on a substrate 10, a diffusion-prevention layer 20 to prevent a catalyst metal for forming the secondary electron generating layer 40 from diffusing into the substrate 10; a first catalyst layer forming step for forming a catalyst layer 30 made of the catalyst metal on the diffusion-prevention layer 20; a second catalyst layer forming step for raising the temperature of the substrate 10 to cause the catalyst metal to distribute in island shapes over the diffusion-prevention layer 20; and a secondary electron generating layer forming step for forming the secondary electron generating layer 40 made of magnesium oxide on the diffusion-prevention layer 20 using the catalyst metal as a catalyst.

Abstract translation: 要解决的问题：与常规方法相比，提供一种制造二次电子的电极的制造方法，其可以提高二次电子发生的效率并减少二次电子产生的效率的老化劣化。 解决方案：一种在其表面具有二次电子发生层的制造用于产生二次电子的电极的方法包括：扩散防止层形成步骤，用于在衬底10上形成防扩散层 20，以防止用于形成二次电子发生层40的催化剂金属扩散到基板10中; 用于在扩散防止层20上形成由催化剂金属制成的催化剂层30的第一催化剂层形成步骤; 第二催化剂层形成步骤，用于升高基板10的温度，以使催化剂金属以岛状分布在扩散防止层20上; 以及二次电子发生层形成步骤，用于使用催化剂金属作为催化剂，在扩散防止层20上形成由氧化镁制成的二次电子发生层40。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2000234165A

公开(公告)日：2000-08-29

申请号：JP3166199

申请日：1999-02-09

Applicant: HAMAMATSU PHOTONICS KK

Inventor： KITAHARA TADASHI ,  ICHIKAWA NORIO ,  SUZUKI TAKASHI

IPC: H01L21/203 ,  C01B31/02 ,  C23C14/06 ,  C23C14/28

Abstract: PROBLEM TO BE SOLVED: To provide a device for forming an amorphous diamond film capable of forming an amorphous diamond film of high quality large in film thickness by reducing the content of moisture and to provide a method for forming it. SOLUTION: This invention is a device 2 for forming an amorphous diamond film by irradiating a target 14 contg. a carbon component with laser beams to emit an emission and depositing the emission on the surface of a substrate 16, which is provided with a chamber 4 stored with the target 14 and the substrate 16 at the inside, two-luminous flux generating means 12 and 24 generating two laser beams, a 1st optical system 26 of irradiating the target 14 with either laser beam L1, a 2nd optical system 28 of irradiating the deposition film of the emmision deposited on the substrate 16 with the other laser beam L2 and a cooling member 30 located around the substrate 16, and moisture in the chamber 4 is condensed on the surface of the cooling member 30.

公开(公告)号：JPH01265131A

公开(公告)日：1989-10-23

申请号：JP9487788

申请日：1988-04-18

Applicant: HAMAMATSU PHOTONICS KK

Inventor： KITAHARA TADASHI ,  ICHIE KOJI

IPC: G01J3/12 ,  G01J3/28 ,  G01J3/32 ,  G02F1/11

Abstract: PURPOSE:To prevent the shading, and also, to raise the purity of a color by constituting the title system so that a real image is not formed in an acousto- optical element in a cross section being vertical to the propagation direction of an ultrasonic wave, and the real image is formed only in a cross section being parallel to said propagation direction. CONSTITUTION:In a cross section being vertical to the propagation direction of an ultrasonic wave, the luminous flux which is emitted from one point of an object to be measured 101 goes to parallel rays by a collimator lens 103 consisting of a spherical lens and made incident on an acoustic filter 105, and by a Bragg diffracted light, a final real image 111 of specific wavelength is formed. Subsequently, in a cross section being parallel to the propagation direction of the ultrasonic wave, power of a cylindrical lens 104 is added, and the luminous flux from one point of the object 101 forms an intermediate real image 110 in the acousto-optical element 105 through a first slit diaphragm 102, the spherical lens 103 and a lens 104. Next, the luminous flux which is separated into spectral components by an ultrasonic wave forms a final real image 111 by a cylindrical lens 107 and a spherical lens 108.

公开(公告)号：JP2006291328A

公开(公告)日：2006-10-26

申请号：JP2005116814

申请日：2005-04-14

Applicant: Hamamatsu Photonics Kk ,  浜松ホトニクス株式会社

Inventor： KITAHARA TADASHI ,  ICHIKAWA NORIO ,  NOMOTO YOSHIAKI

IPC: C23C14/22 ,  C23C14/28

Abstract: PROBLEM TO BE SOLVED: To provide a laser ablation film deposition apparatus capable of forming a thin film with a good film quality, by suppressing evaporation of a liquefied material when using an arbitrary solid material and suppressing production of particulates in solid target ablation.
SOLUTION: The electron beam auxiliary irradiation laser ablation film deposition apparatus is equipped with a target holder 10 which holds the target 11, a substrate holder 20 which holds a substrate 21 for film deposition, an electron beam generator 30 which generates an electron beam, an electron beam-converging device 40 and a laser irradiation device 50. The electron beam-converging device 40 forms an electron lens to converge the electron beam generated by the electron beam generator 30 on a part of the surface of the target 11 and locally liquefies the part of the surface. The laser irradiation device 50 irradiates a laser beam onto the part of the surface of the target 11 liquefied by the electron beam-converging device 40 to perform ablation.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够形成具有良好膜质量的薄膜的激光烧蚀膜沉积设备，通过在使用任意的固体材料时抑制液化材料的蒸发并抑制固体靶烧蚀中的微粒的产生 。 解决方案：电子束辅助照射激光烧蚀膜沉积设备装备有保持靶11的靶保持器10，保持用于膜沉积的衬底21的衬底保持器20，产生电子的电子束发生器30 电子束会聚装置40和激光照射装置50.电子束会聚装置40形成电子透镜以将由电子束发生器30产生的电子束会聚在目标11的表面的一部分上， 局部液化表面的一部分。 激光照射装置50将激光束照射到由电子束会聚装置40液化的目标物11的表面的一部分上，进行烧蚀。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2002241930A

公开(公告)日：2002-08-28

申请号：JP2001041984

申请日：2001-02-19

Applicant: HAMAMATSU PHOTONICS KK

Inventor： KITAHARA TADASHI ,  ICHIKAWA NORIO ,  SUZUKI TAKASHI

IPC: C23C14/28 ,  C23C14/06 ,  C23C14/24

Abstract: PROBLEM TO BE SOLVED: To provide a high-precision nitride thin film deposition method by laser ablation. SOLUTION: In the nitride thin film deposition method where a target material 14 is filled into a crucible 12 and evapotranspirated by laser ablation to deposit a thin film of nitride on a substrate 17, the surface of the crucible 12 is nitrided prior to the filling of the target material 14, that is, the surface of the crucible 12 is nitrided and changed into a nitride layer. As the result, the affinity of the surface of the crucible 12 for the target material 14 can be improved and the wettability of the target material 14 in a molten state which is filled into the crucible 12 can be improved, and the surface becomes leveled. In this state ablation is carried out using the laser beam and the direction of emission of metal particles in the target material 14 can be stabilized.

公开(公告)号：JPH11189472A

公开(公告)日：1999-07-13

申请号：JP35742997

申请日：1997-12-25

Applicant: HAMAMATSU PHOTONICS KK

Inventor： KITAHARA TADASHI ,  SUZUKI TAKASHI ,  ICHIKAWA NORIO ,  MATSUMOTO OSAMU

IPC: C04B35/56 ,  C01B31/30

Abstract: PROBLEM TO BE SOLVED: To provide a method for synthesizing carbon nitride capable of efficiently forming carbon nitride. SOLUTION: This method for synthesizing carbon nitride comprises irradiating a target 11 with a laser beam to perform laser ablation and to synthesize carbon nitride. A solid substance containing an ammonium compound and a carbonaceous material is used as the target 11. Molecules of formed impurities are reduced by the laser ablation of the solid substance containing the ammonium compound and the carbonaceous material.

公开(公告)号：JPH0750145A

公开(公告)日：1995-02-21

申请号：JP19452993

申请日：1993-08-05

Applicant: HAMAMATSU PHOTONICS KK

Inventor： NAKANO TOMOYASU ,  KITAHARA TADASHI ,  OYA TOMONORI

IPC: H01J35/22

Abstract: PURPOSE:To provide a small and safe X-ray generator which generates X-ray highly efficiently. CONSTITUTION:Electric energy is fed to a capacitor 210 through a charge resistor 190 by a charger 100 while an electric discharge switch 300 is opened, and the electric energy is accumulated in the form of electric charge. A high speed gas valve 430 is actuated to introduce gas block into a first almost airtight region, while the electric discharge switch 300 is closed synchronizing with the gas reaching the region between an electrode 415 and an electrode 460, to release the electric charge accumulated in the capacitor 210. The released electric charge flows into a capacitor 22 through the electric discharge switch 300. After the electric charge is accumulated in the capacitor 220, when electric discharge voltage is reached, electric discharging is started at an X-ray generating part 400. Electric discharging current is generated with the capacitor 220 serving as an electric charge feeding source, and X-ray is generated and is output to the outside through a beryllium window 459.

公开(公告)号：JPH0677566A

公开(公告)日：1994-03-18

申请号：JP22864792

申请日：1992-08-27

Applicant: HAMAMATSU PHOTONICS KK

Inventor： KITAHARA TADASHI ,  KANBE KAZUYUKI ,  KUNO KOJI

IPC: H01S3/097

Abstract: PURPOSE:To provide a discharge excitation gas laser of a structure, wherein a rise of a voltage, which is applied to peaking capacitors, is quickened by making small the inductance of an exciting circuit to increase a breakdown voltage and laser gas can be excited in a high density. CONSTITUTION:Charging capacitors C1 of an exciting circuit, a switching element S.W. and peaking capacitors C2 are arranged in a gas laser tube 1. Thereby, a reduction in a wiring length becomes possible and an inductance L1 of the circuit becomes small. Moreover, by forming the switching element S.W. into a discharging gap switch due to multi-arc discharge, an inductance of the switching element itself can be also made small.