2.
    发明专利
    未知

    公开(公告)号:DE112005001765T5

    公开(公告)日:2007-07-19

    申请号:DE112005001765

    申请日:2005-07-06

    Abstract: An antireflection surface formed using a plurality of nanostructures of a first material on a surface of a second material. The first material is different from the second material. The distribution of spatial periods of the nanostructures is set by a self-assembly operation. The surface of the second material is converted to operate as a graded index surface that is substantially antireflective for the wavelength of interest.

    Nanostructure antireflection surfaces

    公开(公告)号:GB2430048B

    公开(公告)日:2009-01-28

    申请号:GB0700474

    申请日:2007-01-10

    Abstract: An antireflection surface formed using a plurality of nanostructures of a first material on a surface of a second material. The first material is different from the second material. The distribution of spatial periods of the nanostructures is set by a self-assembly operation. The surface of the second material is converted to operate as a graded index surface that is substantially antireflective for the wavelength of interest.

    Nanostructure antireflection surfaces

    公开(公告)号:GB2430048A

    公开(公告)日:2007-03-14

    申请号:GB0700474

    申请日:2007-01-10

    Abstract: An antireflection surface formed using a plurality of nanostructures of a first material on a surface of a second material. The first material is different from the second material. The distribution of special periods of the nanostructures is set by a self-assembly operation. The surface of the second material is converted to operate as a graded index surface that is substantially antireflective for the wavelength of interest.

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