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公开(公告)号：DE69133256T2
公开(公告)日：2004-03-18
申请号：DE69133256
申请日：1991-10-10
Applicant: HITACHI LTD
Inventor： TODOKORO HIDEO , TAKAMOTO KENJI , OTAKA TADASHI
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公开(公告)号：DE69332785D1
公开(公告)日：2003-04-24
申请号：DE69332785
申请日：1993-10-01
Applicant: HITACHI LTD
Inventor： SATO MITSUGU , TODOKORO HIDEO , OTAKA TADASHI
IPC: G01T1/28 , H01J37/244 , H01J37/28
Abstract: Provided between an optical axis of a primary electron beam 4 directed to a specimen 7 and a secondary electron detector 50 for detecting secondary electrons 9 emitted from the specimen 7 is a shielding electrode 12 which has a transparency for the secondary electrons 9 and has a shielding effect for an attracting electric field 54 produced by the secondary electron detector 50. An opposed electrode 11 is provided at a position facing the shielding electrode 12 to put the optical path of the electron beam 4 therebetween. Applied across the shielding electrode 12 and the opposed electrode 11 is a voltage which produces a deflecting electric field E in the electron beam path. The deflecting electric field E deflects the secondary electrons 9 to the shielding electrode 12 side to pass the secondary electrons therethrough before they are captured by the secondary electron detector 50. Optical axis correction coils 19 and 20 are provided for generating a magnetic field B to correct an orbit of the primary electron beam bent by the deflecting electric field E.
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公开(公告)号：DE69412676T2
公开(公告)日：1999-05-06
申请号：DE69412676
申请日：1994-03-18
Applicant: HITACHI LTD
Inventor： OTAKA TADASHI , MORI HIROYOSHI , TODOKORO HIDEO
Abstract: When an image display unit (70) displays a magnified image of an object being examined, a measuring unit (20) automatically computes the dimensions of the image at the preset position. A tolerance range setting unit (30) has been supplied with an upper and a lower limit value according to which it can judge the dimensions of the object at the preset position to be normal, whereas a comparison-decision unit (40) decides that the dimensions thus computed are held between the upper and lower limit values. When the measured result is found outside the range of upper to lower limit values, the right-or-wrong decision data is stored in a memory (50) and is redisplayed in the form of an image by the image display unit (70) at proper timing.
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公开(公告)号：DE69219227D1
公开(公告)日：1997-05-28
申请号：DE69219227
申请日：1992-07-16
Applicant: HITACHI LTD
Inventor： OTAKA TADASHI , ICHIHASHI MIKIO
IPC: G01Q60/00 , H01J37/073 , H01J37/18 , H01J41/12
Abstract: Improvements in a charged particle beam apparatus are contemplated and especially a column structure incorporating a superhigh vacuum evacuation system (100) is provided which is reduced in size and weight and has high performance. In order to evacuate surrounding space of a charged particle source (1) to superhigh vacuum, ion pumps (200, 202) are built in a vacuum enclosure of a column (13). Each ion pump includes a magnet unit 15, a yoke (14) and an electrode (16), and the magnet unit (15) per se is built in the vacuum enclosure. A charged particle beam focusing optics (100) for focusing and deflecting a charged particle beam (2) from the charged particle beam source (1) is arranged in a space which is defined interiorly of the yoke (14). The column structure can be reduced in size and weight and a charged particle beam apparatus having high performance can be obtained.
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公开(公告)号：GB2235087A
公开(公告)日：1991-02-20
申请号：GB9013216
申请日：1990-06-13
Applicant: HITACHI LTD
Inventor： HAZAKI EIICHI , OTAKA TADASHI , SHIMIZU MINORU
Abstract: In a particle beam surface analyzer, having a partition wall separation a vacuum space, an opening that is provided in a partition wall through which the particle beam is taken out, a seal member which is moved along a seal surface of the seal member and seals the opening, a condenser lens which converges the particle beam onto the sample, and detector for detecting a physical quantity from the sample when the particle beam is irradiated on the sample, the surface analyzer further has a movable shift member that pushes one side surface of the seal member along the seal surface of the seal member and a stopping member which the other side surface of the seal member having a predetermined angle being larger than 55 DEG and smaller than 75 DEG to the seal surface is abutted so as to move the seal member along the other side surface till the seal member reaches the openings, whereby resultant forces between the seal member and the seal surface in the side of the one side surface is equal to that in the side of the other side surface. As the predetermined angle is larger than 55 DEG and smaller than 75 DEG to the seal surface, the abrasion and seizure of the seal member are prevented and the contamination of the sample is lessened.
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Patent Agency Ranking
公开(公告)号：DE4019385A1
公开(公告)日：1990-12-20
申请号：DE4019385
申请日：1990-06-18
Applicant: HITACHI LTD
Inventor： HAZAKI EIICHI , OTAKA TADASHI , SHIMIZU MINORU
Abstract: In a particle beam surface analyzer, having a partition wall separation a vacuum space, an opening that is provided in a partition wall through which the particle beam is taken out, a seal member which is moved along a seal surface of the seal member and seals the opening, a condenser lens which converges the particle beam onto the sample, and detector for detecting a physical quantity from the sample when the particle beam is irradiated on the sample, the surface analyzer further has a movable shift member that pushes one side surface of the seal member along the seal surface of the seal member and a stopping member which the other side surface of the seal member having a predetermined angle being larger than 55 DEG and smaller than 75 DEG to the seal surface is abutted so as to move the seal member along the other side surface till the seal member reaches the openings, whereby resultant forces between the seal member and the seal surface in the side of the one side surface is equal to that in the side of the other side surface. As the predetermined angle is larger than 55 DEG and smaller than 75 DEG to the seal surface, the abrasion and seizure of the seal member are prevented and the contamination of the sample is lessened.
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公开(公告)号：GB2168839B
公开(公告)日：1988-06-08
申请号：GB8529033
申请日：1985-04-05
Applicant: HITACHI LTD
Inventor： OTAKA TADASHI , NAKAIZUMI YASUSHI , KURODA KATSUHIRO
IPC: G01N23/225 , H01J37/244 , G01T1/28
Abstract: PCT No. PCT/JP85/00170 Sec. 371 Date Dec. 6, 1985 Sec. 102(e) Date Dec. 6, 1985 PCT Filed Apr. 5, 1985 PCT Pub. No. WO85/04757 PCT Pub. Date Oct. 24, 1985.The present invention relates to an apparatus for detecting the secondary electrons which are obtained from a sample (4) when the sample is irradiated with an electron beam (2). When this electron beam (2) is subjected to a low acceleration voltage, it is desirable to detect the secondary electrons efficiently without interfering with the deflection of the electron beam (2). In order to solve this subject matter, there is used a means (7) for generating an electric field and a magnetic field which are so perpendicular to each other that they apply deflecting forces in the direction common to the secondary electrons while applying no deflecting force to the electron beam as a whole.
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公开(公告)号：NL1030253A1
公开(公告)日：2006-04-10
申请号：NL1030253
申请日：2005-10-24
Applicant: HITACHI LTD
Inventor： KAJI KAZUTOSHI , TERADA SHOHEI , OTAKA TADASHI
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公开(公告)号：DE69623841D1
公开(公告)日：2002-10-31
申请号：DE69623841
申请日：1996-03-29
Applicant: HITACHI LTD
Inventor： KOBARU ATSUSHI , OTAKA TADASHI , MAEDA TATSUYA , SASADA KATSUHIRO
IPC: H01J37/21 , H01J37/22 , H01J37/20 , H01J37/244
Abstract: An electron beam 2 is focused on a specimen 6 by a focusing lens 5. A light beam 26 is incident on the position of irradiation of the specimen 6 with the electron beam 2 and the reflected light beam 28 is detected by a linear light detector 30. The output of the detector 30 is used to measure height of the specimen at the position of irradiation of the electron beam 2. The specimen 6 is moved in a plane perpendicular to an optical axis 36 of the focusing lens 5. A specimen height measuring device (31 to 34) carries out the height measurement of the specimen at a position to be observed on the specimen and at positions thereon which are in the vicinity of the position to be observed, when those positions are located at the position of irradiation of the electron beam. The specimen height measuring device 31 to 34 averages the measured values so as to produce a focusing correction signal on the basis thereof and controls the focusing lens 5 on the basis of the focusing correction signal.
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公开(公告)号：DE69230414D1
公开(公告)日：2000-01-13
申请号：DE69230414
申请日：1992-08-03
Applicant: HITACHI LTD
Inventor： TODOKORO HIDEO , YAMADA OSAMU , OTAKA TADASHI
IPC: H01J37/147 , G02B21/00 , H01J37/22 , H01J37/26 , H01J37/28
Abstract: A scanning microscope, such as a scanning electron microscope, has an energy beam (1) which is caused to scan on a sample (4). A detector (6) detects the interaction of the beam (1) with the sample (4) and generates sample image signals which are used to generate a display image (20) of the scanned part of the sample (4). The sample image signals may be stored in an image memory (14) and a part of those sample image signals read to generate the display image. This permits an effective magnification to be achieved without scanning the sample with scanning lines which are too close. Alternatively, or in addition, the beam (1) may be cut intermittently during the scanning, at least for magnifications above a predetermined limit. Where scanning is in a series of frames, each of a series of scanning lines, such cutting may change the interval between frames, the interval between lines, or may cause intermittent cutting within a line. All these reduce the duration of the beam (1) on the sample (4), so reducing the risk of excessive charge build-up.
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