1.
    发明专利
    未知

    公开(公告)号:ES2058979T3

    公开(公告)日:1994-11-01

    申请号:ES91106662

    申请日:1991-04-25

    Applicant: HOECHST AG

    Abstract: Method of making optical materials from silicon nitride by pyrolysis of polymeric silazanes by pressing, before the pyrolysis, the pulverulent polymeric silazanes to give mouldings or first dissolving the polymeric silazanes in an organic solvent, drawing fibres from this solution and pyrolysing said fibres after evaporation of the solvent or by melting of polymeric silazanes, casting, injection-moulding or extruding this melt to give mouldings and subsequent pyrolysis. During or after the pyrolysis, an oxidic layer is produced in an oxygen-containing atmosphere on the silicon nitride moulding. The pyrolysis can be carried out at 800-1000 DEG C in an atmosphere containing ammonia or containing ammonia/inert gas mixtures.

    POLYSUBSTITUTED CHLORINE-CONTAINING SILAZANE, POLYMERS, PROCESS FOR THEIR PREPARATION, CERAMIC MATERIALS CONTAINING SILICON NITRIDE WHICH CAN BE MANUFACTURED THEREFROM, AND THEIR MANUFACTURE

    公开(公告)号:CA2004401A1

    公开(公告)日:1990-06-03

    申请号:CA2004401

    申请日:1989-12-01

    Applicant: HOECHST AG

    Abstract: HOE 88/ F 345 Polysubstituted chlorine-containing silazane polymers, process for their preparation, ceramic materials containing silicon nitride which can be manufactured therefrom, and their manufacture The invention relates to novel polysubstituted chlorinecontaining silazane polymers, to their preparation, to their processing to form ceramic material containing silicon nitride, and to said material itself. The chlorine-containing silazane polymers are prepared by reacting oligosilazanes of formula (I) in which at least one of the indices a or b and at least one of the indices c or d are not equal to 0 and n is about 2 to about 12, with at least one of the chlorosilanes Cl2R6Si-CH2CH2-SiR6Cl2, Cl3Si-CH2CH2-SiR7Cl2, R8SiCl3 or R9SiHCl2 at 30.degree.C to 300.degree.C, where the radicals independently of one another have the following meanings: R1, R2, R4 = H, C1-C6 alkyl or C2-C6 alkenyl and R3, R5, R6, R7, R8, R9 = C1-C6 alkyl or C2-C6 alkenyl. The polysubstituted chlorine-containing silazane polymers according to the invention can be converted into polysilazanes by reaction with ammonia, and these in turn can be pyrolyzed to form ceramic materials containing silicon nitride.

    POLYMERIC CHLOROSILAZANES, PROCESS FOR THEIR PREPARATION, CERAMIC MATERIALS CONTAINING SILICON NITRIDE WHICH CAN BE MANUFACTURED THEREFROM, AND THEIR MANUFACTURE

    公开(公告)号:CA2004405A1

    公开(公告)日:1990-06-03

    申请号:CA2004405

    申请日:1989-12-01

    Applicant: HOECHST AG

    Abstract: HOE 88/F 341 Polymeric chlorosilazanes, process for their preparation, ceramic materials containing silicon nitride which can be manufactured therefrom, and their manufacture The invention relates to novel polymeric chlorosilazanes, to their preparation, to their processing to form ceramic material containing silicon nitride, and to said material itself. The polymeric chlorosilazanes are prepared by reacting a mixture of oligosilazanes of formula (I) (I) in which n is about 2 to about 12, and oligosilazanes of formula (II), (RSiHNH)m, in which m is about 3 to about 12, with at least one of the chlorosilanes Cl2R2Si-CH2-CH2-SiR2Cl2, Cl3Si-CH2-CH2-SiR3Cl2, R4SiCl3 or R5SiHCl2 at 30.degree.C to 300.degree.C, where R and R1 to R5 are C1-C6 alkyl or C2-C6 alkenyl groups which can be identical or different. The polymeric chlorosilazanes according to the invention can be converted into polysilazanes by reaction with ammonia, and these in turn can be pyrolyzed to form ceramic materials containing silicon nitride.

    CHLORINE-CONTAINING SILAZANE POLYMERS, PROCESS FOR THEIR PREPARATION, CERAMIC MATERIALS CONTAINING SILICON NITRIDE WHICH CAN BE PREPARED FROM THEM, AND THEIR PREPARATION

    公开(公告)号:CA2004404A1

    公开(公告)日:1990-06-03

    申请号:CA2004404

    申请日:1989-12-01

    Applicant: HOECHST AG

    Abstract: HOE 88/F 343 Chlorine-containing silazane polymers, process for their preparation, ceramic materials containing silicon nitride which can be prepared from them, and their preparation The invention relates to novel chlorine-containing silazane polymers, to their preparation, their further processing to ceramic material containing silicon nitride, and this material itself. In order to prepare the chlorine-containing silazane polymers, oligosilazanes of the formula (I) in which a > 0, b 2 0 and n is about 2 to about 12, are reacted with at least one of the chlorosilanes Cl2R4Si-CH2-CH2-SiR4Cl2, Cl3Si-CH2-CH2-SiR5Cl2, R5SiCl3 or R7SiHCl2 at 30.degree.C to 300.degree.C, where, independently of one another, R1 and R2 = H, C1-C6-alkyl or C2-C6-alkenyl, R3, R4, R5, R6 and R7 = C1-C6-alkyl or C2-C6-alkenyl and where if b = 0 the reaction with R7SiHCl2, if R7 = C1-C6-alkyl and none of the other chlorosilanes is present, is to be excluded. The chlorine-containing silazane polymers according to the invention can be converted by reaction with ammonia into polysilazanes, which in their turn can be pyrolysed to form ceramic materials containing silicon nitride.

    POLYMERIC HYDRIDOCHLOROSILAZANES, PROCESS FOR THEIR PREPARATION, CERAMIC MATERIALS CONTAINING SILICON NITRIDE WHICH CAN BE MANUFACTURED THEREFROM, AND THEIR MANUFACTURE

    公开(公告)号:CA2004399A1

    公开(公告)日:1990-06-03

    申请号:CA2004399

    申请日:1989-12-01

    Applicant: HOECHST AG

    Abstract: HOE 88/F 340 Polymeric hydridochlorosilazanes, process for their preparation, ceramic materials containing silicon nitride which can be manufactured therefrom, and their manufacture The invention relates to novel polymeric hydridochlorosilazanes, to their preparation, to their processing to form ceramic materials containing silicon nitride, and to said materials themselves. The polymeric hydridochlorosilazanes are prepared by reacting oligohydridoorganosilazanes of the general formula (R1SiHNH)n, in which n is about 3 to about 12, with at least one of the chlorosilanes R2SiHCl2, R3SiCl3, Cl2R4Si-CH2CH2-SiR4Cl2 or Cl3Si-CH2CH2-SiR5Cl2 at 30.degree.C to 300.degree.C, where the radicals independently of one another have the following meanings: R1 = a C1-C6 alkyl or C2-C6 alkenyl group, R2 = a C2-C6 alkenyl group if R2SiHCl2 is reacted with the oligosilazanes by itself, or R2 = a C1-C6 alkyl or C2-C6 alkenyl group if R2SiHCl2 is reacted with the oligosilazanes as a mixture with other chlorosilanes, and R3, R4, R5 = a C1-C6 alkyl or C2-C6 alkenyl group, and where R3SiCl3 is used only as a mixture with at least one of the other chorosilanes (containing R2, R4 or R5). The polymeric hydridochlorosilazanes according to the invention can be converted into polysilazanes by reaction with ammonia, and these in turn can be pyrolyzed to form ceramic materials containing silicon nitride.

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