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    1.
    发明专利
    未知

    公开(公告)号：DE58909025D1

    公开(公告)日：1995-03-30

    申请号：DE58909025

    申请日：1989-09-06

    Applicant: HOECHST AG

    Inventor： CHERDRON HARALD PROF DR ,  PRASS WERNER DR ,  SCHEUNEMANN UDE DR ,  LUPO DONALD DR

    IPC: B05D1/20 ,  B32B27/34 ,  C08G69/26 ,  C08J5/18

    Abstract: Polyamides of the general formula [N(A)-X-N(B)-CO-Y-CO-]n are described, in which Y denotes a divalent group, X a divalent radical whose chain contains at least two carbon atoms, A and B independently of one another denote H or a C1 to C26 alkyl group and n denotes an integer greater than 4. The said polyamides contain at least one alkyl group of C6 to C26 per repeating unit. The groups X and/or Y contain at leat one CH2 group in the chain. The polyamides are prepared by reaction of a diamine of the formula NHA-X-NHB with an about equimolar amount of a reactive derivative of a dicarboxylic acid of the formula COOH-Y-COOH. The polyamides obtained can be used in order to prepare highly ordered monomolecular LB films on a support. For this purpose, the polyamide is dissolved in a volatile organic solvent which is immiscible with water and the solution is spread on the water/air interface. After evaporation of the solvent the layer is compressed and transferred to a solid support by the LB technique. The film is very stable and can be used to prepare optical waveguide systems, filters for optical purposes or protective layers.

    2.
    发明专利
    未知

    公开(公告)号：ES2058979T3

    公开(公告)日：1994-11-01

    申请号：ES91106662

    申请日：1991-04-25

    Applicant: HOECHST AG

    Inventor： BRUCK MARTIN ,  VAAHS TILO DR ,  PEUCKERT MARCELLUS DR ,  SCHEUNEMANN UDE DR ,  STEHLIN THOMAS DR ,  THEIS JURGEN DR

    IPC: C04B35/589 ,  C03C13/04 ,  C04B35/584 ,  C04B41/50 ,  C04B41/87 ,  D01F9/10 ,  D06M11/00 ,  D06M11/60 ,  D06M101/00 ,  G02B1/00

    Abstract: Method of making optical materials from silicon nitride by pyrolysis of polymeric silazanes by pressing, before the pyrolysis, the pulverulent polymeric silazanes to give mouldings or first dissolving the polymeric silazanes in an organic solvent, drawing fibres from this solution and pyrolysing said fibres after evaporation of the solvent or by melting of polymeric silazanes, casting, injection-moulding or extruding this melt to give mouldings and subsequent pyrolysis. During or after the pyrolysis, an oxidic layer is produced in an oxygen-containing atmosphere on the silicon nitride moulding. The pyrolysis can be carried out at 800-1000 DEG C in an atmosphere containing ammonia or containing ammonia/inert gas mixtures.

    4.
    发明专利
    未知

    公开(公告)号：DE3833440A1

    公开(公告)日：1990-04-05

    申请号：DE3833440

    申请日：1988-10-01

    Applicant: HOECHST AG

    Inventor： PRASS WERNER DR ,  SCHEUNEMANN UDE DR

    IPC: B05D1/20 ,  B32B27/00 ,  C08G18/32 ,  C08G18/38 ,  C08G18/73 ,  C08G18/76 ,  C08G75/18 ,  C08J5/18

    Abstract: A polyurea of the general formula where X and Y are. independently of one another, a divalent radical whose chain contains in each case at least two carbon atoms, and A and B are, independently of one another, H or (C1-C26)alkyl, and n is an integer greater than 4, which polyurea contains at least one (C6-C26) alkyl group per repeating unit, is prepared by reacting the diamine NHA-X-NHB with roughly the equimolar amount of a diisocyanate OCN-Y-NCO. The polyurea is suitable for preparing ordered monomolecular LB films on a base (film-substrate-system). For this purpose it is dissolved in a volatile organic solvent which is not miscible with water, the solution is spread at the water/air interface, and the layer formed is compressed after the solvent has evaporated and it is transferred to a solid layer base by the Langmuir-Blodgett technique.

    6.
    发明专利
    未知

    公开(公告)号：DE4416330A1

    公开(公告)日：1995-11-16

    申请号：DE4416330

    申请日：1994-05-09

    Applicant: HOECHST AG

    Inventor： SCHEUNEMANN UDE DR ,  ALTHOFF OLAF DR ,  HICKEL WERNER DR ,  APPEL GUNTHER ,  BAUER JACQUELINE ,  GEIS GERHARD

    IPC: B01D69/12 ,  B01D71/70 ,  B32B5/18 ,  C08J3/24 ,  C08J5/18 ,  C08L83/02 ,  C08L83/04 ,  B01D67/00 ,  B01D61/36 ,  B01D53/22

    Abstract: The prodn. of composite membranes comprises spreading a soln. of a polymer (I) in a volatile solvent on water. Allowing the solvent to evaporate, crosslinking the polymer and transferring the film obtd. to a supporting membrane. Also claimed is a composite membrane with polymer layer(s) on a porous base membrane, obtd. by this process. (I) is a polysiloxane which is pref. crosslinked via OH gps. on the polymer, with the aid of a bi-, tri- or tetra-functional silane with hydrolysable SiO- gps. as crosslinker (II), pref. triacetoxy-methyl-silane (TACMS), in the presence of a catalyst, pref. a tin salt. Alternatively, (I) may be a polymer contg. olefinic double bonds, which is crosslinked by irradiation. Pref. polymer layer is a protective layer of polysiloxane, crosslinked via OH gps. to a structure contg. units of formula Si(O-)4, R-Si(O-)3 or RR Si(O-)2 (with R, R = alkyl, phenyl or vinyl), or a silicone which is crosslinked by irradiation.

    7.
    发明专利
    未知

    公开(公告)号：DE59102315D1

    公开(公告)日：1994-09-01

    申请号：DE59102315

    申请日：1991-04-25

    Applicant: HOECHST AG

    Inventor： BRUECK MARTIN ,  VAAHS TILO DR ,  PEUCKERT MARCELLUS DR ,  SCHEUNEMANN UDE DR ,  STEHLIN THOMAS DR ,  THEIS JUERGEN DR

    IPC: C04B35/589 ,  C03C13/04 ,  C04B35/584 ,  C04B41/50 ,  C04B41/87 ,  D01F9/10 ,  D06M11/00 ,  D06M11/60 ,  D06M101/00 ,  G02B1/00

    Abstract: Method of making optical materials from silicon nitride by pyrolysis of polymeric silazanes by pressing, before the pyrolysis, the pulverulent polymeric silazanes to give mouldings or first dissolving the polymeric silazanes in an organic solvent, drawing fibres from this solution and pyrolysing said fibres after evaporation of the solvent or by melting of polymeric silazanes, casting, injection-moulding or extruding this melt to give mouldings and subsequent pyrolysis. During or after the pyrolysis, an oxidic layer is produced in an oxygen-containing atmosphere on the silicon nitride moulding. The pyrolysis can be carried out at 800-1000 DEG C in an atmosphere containing ammonia or containing ammonia/inert gas mixtures.

    8.
    发明专利
    未知

    公开(公告)号：DE4013306A1

    公开(公告)日：1991-10-31

    申请号：DE4013306

    申请日：1990-04-26

    Applicant: HOECHST AG

    Inventor： BRUECK MARTIN ,  VAAHS TILO DR ,  PEUCKERT MARCELLUS DR ,  SCHEUNEMANN UDE DR ,  STEHLIN THOMAS DR ,  THEIS JUERGEN DR

    IPC: C04B35/589 ,  C03C13/04 ,  C04B35/584 ,  C04B41/50 ,  C04B41/87 ,  D01F9/10 ,  D06M11/00 ,  D06M11/60 ,  D06M101/00 ,  G02B1/00

    Abstract: Method of making optical materials from silicon nitride by pyrolysis of polymeric silazanes by pressing, before the pyrolysis, the pulverulent polymeric silazanes to give mouldings or first dissolving the polymeric silazanes in an organic solvent, drawing fibres from this solution and pyrolysing said fibres after evaporation of the solvent or by melting of polymeric silazanes, casting, injection-moulding or extruding this melt to give mouldings and subsequent pyrolysis. During or after the pyrolysis, an oxidic layer is produced in an oxygen-containing atmosphere on the silicon nitride moulding. The pyrolysis can be carried out at 800-1000 DEG C in an atmosphere containing ammonia or containing ammonia/inert gas mixtures.

    9.
    发明专利
    未知

    公开(公告)号：DE3843194A1

    公开(公告)日：1990-07-12

    申请号：DE3843194

    申请日：1988-12-22

    Applicant: HOECHST AG

    Inventor： LUPO DONALD DR ,  PRASS WERNER DR ,  SCHEUNEMANN UDE DR

    IPC: B05D1/20 ,  B32B27/30 ,  C07C233/05 ,  C07C233/80 ,  C08F20/34 ,  C08F20/36 ,  C08F20/52 ,  C08F20/60 ,  C08J5/18

    Abstract: Amphiphilic monomers with mixed-chain structures of the formula in which Y denotes -O- or -NH- X denotes a group of the formula -(CH2)n- or -(CH2-O-CH2)n- l denotes an integer from 0 to 10, n denotes an integer from 1 to 10, R1 denotes hydrogen, methyl, chlorine, cyano, fluorine or bromine, R2 denotes C1-C24-alkyl or C1-C24-fluoroalkyl and R3 denotes C8-C24-alkyl or C8-C24-fluoralkyl, with the proviso that the groups R2 and R3 contain a different number of carbon atoms. The monomers are polymerized on their own or together with other comonomers. The polymers obtained are suitable for the preparation of ultra-thin layers on a suitable layer support.

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