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公开(公告)号:HK123597A
公开(公告)日:1997-09-12
申请号:HK123597
申请日:1997-06-26
Applicant: HOECHST AG
Inventor: DAMMEL RALPH DR , DOESSEL KARL-FRIEDRICH DR , LINGNAU JUERGEN DR , THEIS JUERGEN DR
IPC: G03F7/004 , G03F7/029 , G03F7/038 , H01L21/027 , H01L21/30
Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.
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公开(公告)号:DE58909782D1
公开(公告)日:1997-04-10
申请号:DE58909782
申请日:1989-06-16
Applicant: HOECHST AG
Inventor: DAMMEL RALPH DR , DOESSEL KARL-FRIEDRICH DR , LINGNAU JUERGEN DR , THEIS JUERGEN DR
IPC: G03F7/004 , G03F7/029 , G03F7/038 , H01L21/027 , H01L21/30
Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.
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公开(公告)号:DK0635523T3
公开(公告)日:1998-10-26
申请号:DK94111031
申请日:1994-07-15
Applicant: HOECHST AG
Inventor: EPPLE ULRICH DR , KUBILLUS UWE DR , BRINDOEPKE GERHARD DR , DOESSEL KARL-FRIEDRICH DR
IPC: C08F4/28 , C08F4/34 , C08F20/10 , C08F20/26 , C08F212/08 , C08F220/04 , C08F220/12 , C08F220/18 , C08F220/26 , C08F220/28 , C08F220/32 , C09D5/00 , C09D5/03 , C09D133/00 , C09D133/02 , C09D133/04 , C09D133/06 , C09D133/14 , C09D175/04
Abstract: Copolymers comprising from 5 to 50 % by weight of one or more glycidyl esters of saturated aliphatic C4-C30-monocarboxylic acids containing a tertiary or quaternary alpha -carbon atom and from 95 to 5 % by weight of at least two olefinically unsaturated, copolymerisable monomers, of which at least one contains at least one carboxyl group. The copolymers are characterised by an OH number of from 50 to 250 mg of KOH/g, a solution viscosity of from 15 to 2000 mPa s (50 % strength solution at 23 DEG C), a mean molecular weight (weight average Mw) of less than 8600 g/mol and a nonuniformity of less than 3.4. The copolymers according to the invention are particularly suitable as binder components for high-solids coating compositions.
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公开(公告)号:AT169644T
公开(公告)日:1998-08-15
申请号:AT94111031
申请日:1994-07-15
Applicant: HOECHST AG
Inventor: EPPLE ULRICH DR , KUBILLUS UWE DR , BRINDOEPKE GERHARD DR , DOESSEL KARL-FRIEDRICH DR
IPC: C08F4/28 , C08F4/34 , C08F20/10 , C08F20/26 , C08F212/08 , C08F220/04 , C08F220/12 , C08F220/18 , C08F220/26 , C08F220/28 , C08F220/32 , C09D5/00 , C09D5/03 , C09D133/00 , C09D133/02 , C09D133/04 , C09D133/06 , C09D133/14 , C09D175/04
Abstract: Copolymers comprising from 5 to 50 % by weight of one or more glycidyl esters of saturated aliphatic C4-C30-monocarboxylic acids containing a tertiary or quaternary alpha -carbon atom and from 95 to 5 % by weight of at least two olefinically unsaturated, copolymerisable monomers, of which at least one contains at least one carboxyl group. The copolymers are characterised by an OH number of from 50 to 250 mg of KOH/g, a solution viscosity of from 15 to 2000 mPa s (50 % strength solution at 23 DEG C), a mean molecular weight (weight average Mw) of less than 8600 g/mol and a nonuniformity of less than 3.4. The copolymers according to the invention are particularly suitable as binder components for high-solids coating compositions.
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公开(公告)号:DE3854858D1
公开(公告)日:1996-02-15
申请号:DE3854858
申请日:1988-09-07
Applicant: HOECHST AG
Inventor: DOESSEL KARL-FRIEDRICH DR , DAMMEL RALPH DR , LINGNAU JUERGEN DR
IPC: G03C1/72 , C07C39/367 , C07C43/225 , C07C43/313 , C07C43/315 , C07C69/16 , C07C69/78 , C07C69/96 , C07F7/18 , G03F7/004 , G03F7/26 , H01L21/027
Abstract: Positive-working radiation-sensitive composition which contains a compound which forms an acid when exposed to high-energy radiation, and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aromatically bound chlorine or bromine and has a pKa of less than 12 or is a derivative of a compound having such a pKa. The claimed composition, in particularly the copying material produced therefrom, has a higher sensitivity and an improved resolution and exhibits, in addition, no image haze after development.
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公开(公告)号:AT176487T
公开(公告)日:1999-02-15
申请号:AT95115526
申请日:1995-10-02
Applicant: HOECHST AG
IPC: C08F220/16 , C08F2/02 , C08F4/04 , C08F4/32 , C08F20/10 , C08F220/18 , C08F220/26 , C08G18/62 , C09D5/02 , C09D5/03 , C09D133/04 , C09D133/06 , C09D135/00 , C09J133/04 , C09J133/06
Abstract: Copolymers (I) of olefinic monomer(s) comprise an isomeric mixt. of esters of isobornyl alcohol with an alpha , beta -unsatd. acid. The isomeric alcohol mixt. contains: (a) not more than 92% isoborneol, (b) at least 3.5% iso-fenchyl alcohol, and (c) at least 1% pseudo-bornyl alcohol. Also claimed are: (i) a process for the prodn. of (I) by bulk polymerisation in the presence of aliphatic azo cpds., diacyl peroxide, alkyl per-esters, alkyl hydroperoxide, dialkyl peroxide or peroxy-di-carbonate as radical initiators; and (ii) a process for the prodn. of water-dilutable polyacrylate dispersions by: (A) dissolution of (I) in a water-dilutable organic solvent, followed by: (B) partial or complete neutralisation, and (C) dilution by adding water or stirring the soln. into water.
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公开(公告)号:DE19654714A1
公开(公告)日:1998-07-02
申请号:DE19654714
申请日:1996-12-30
Applicant: HOECHST AG
Inventor: SCHOESLER ULRICH , DUEBAL HANS-ROLF DR , DOESSEL KARL-FRIEDRICH DR
IPC: G02F1/1337
Abstract: The invention relates to a method for producing water-resistant polymer layers on a substrate. According to said method, an aqueous polymer dispersion not containing salts for raising electric conductivity is applied to the substrate and heated to a temperature of between 80 DEG C and 300 DEG C. The resulting water-resistant layers are orientating layers and the substrate is a substrate for liquid crystal displays.
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公开(公告)号:DE3853040D1
公开(公告)日:1995-03-23
申请号:DE3853040
申请日:1988-09-07
Applicant: HOECHST AG
Inventor: DOESSEL KARL-FRIEDRICH DR
Abstract: A proposed positive-working radiation-sensitive composition contains a compound which forms an acid when exposed to actinic radiation and a compound which is acid-cleavable and is characterised in that the acid-cleavable compound is monomeric and contains an acetal group whose aldehyde or ketone component has a development solubility of 0.1 to 100 g/l and a boiling point of over 150 DEG C. … The claimed composition does not exhibit varying development properties even with varying "holding times" and therefore has a large processing latitude and makes possible a high structural resolution.
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公开(公告)号:AT118625T
公开(公告)日:1995-03-15
申请号:AT88114591
申请日:1988-09-07
Applicant: HOECHST AG
Inventor: DOESSEL KARL-FRIEDRICH DR
Abstract: A proposed positive-working radiation-sensitive composition contains a compound which forms an acid when exposed to actinic radiation and a compound which is acid-cleavable and is characterised in that the acid-cleavable compound is monomeric and contains an acetal group whose aldehyde or ketone component has a development solubility of 0.1 to 100 g/l and a boiling point of over 150 DEG C. … The claimed composition does not exhibit varying development properties even with varying "holding times" and therefore has a large processing latitude and makes possible a high structural resolution.
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公开(公告)号:DE59505025D1
公开(公告)日:1999-03-18
申请号:DE59505025
申请日:1995-10-02
Applicant: HOECHST AG
IPC: C08F220/16 , C08F2/02 , C08F4/04 , C08F4/32 , C08F20/10 , C08F220/18 , C08F220/26 , C08G18/62 , C09D5/02 , C09D5/03 , C09D133/04 , C09D133/06 , C09D135/00 , C09J133/04 , C09J133/06
Abstract: Copolymers (I) of olefinic monomer(s) comprise an isomeric mixt. of esters of isobornyl alcohol with an alpha , beta -unsatd. acid. The isomeric alcohol mixt. contains: (a) not more than 92% isoborneol, (b) at least 3.5% iso-fenchyl alcohol, and (c) at least 1% pseudo-bornyl alcohol. Also claimed are: (i) a process for the prodn. of (I) by bulk polymerisation in the presence of aliphatic azo cpds., diacyl peroxide, alkyl per-esters, alkyl hydroperoxide, dialkyl peroxide or peroxy-di-carbonate as radical initiators; and (ii) a process for the prodn. of water-dilutable polyacrylate dispersions by: (A) dissolution of (I) in a water-dilutable organic solvent, followed by: (B) partial or complete neutralisation, and (C) dilution by adding water or stirring the soln. into water.
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