2.
    发明专利
    未知

    公开(公告)号:DE58909782D1

    公开(公告)日:1997-04-10

    申请号:DE58909782

    申请日:1989-06-16

    Applicant: HOECHST AG

    Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

    7.
    发明专利
    未知

    公开(公告)号:DE19654714A1

    公开(公告)日:1998-07-02

    申请号:DE19654714

    申请日:1996-12-30

    Applicant: HOECHST AG

    Abstract: The invention relates to a method for producing water-resistant polymer layers on a substrate. According to said method, an aqueous polymer dispersion not containing salts for raising electric conductivity is applied to the substrate and heated to a temperature of between 80 DEG C and 300 DEG C. The resulting water-resistant layers are orientating layers and the substrate is a substrate for liquid crystal displays.

    8.
    发明专利
    未知

    公开(公告)号:DE3853040D1

    公开(公告)日:1995-03-23

    申请号:DE3853040

    申请日:1988-09-07

    Applicant: HOECHST AG

    Abstract: A proposed positive-working radiation-sensitive composition contains a compound which forms an acid when exposed to actinic radiation and a compound which is acid-cleavable and is characterised in that the acid-cleavable compound is monomeric and contains an acetal group whose aldehyde or ketone component has a development solubility of 0.1 to 100 g/l and a boiling point of over 150 DEG C. … The claimed composition does not exhibit varying development properties even with varying "holding times" and therefore has a large processing latitude and makes possible a high structural resolution.

    9.
    发明专利
    未知

    公开(公告)号:AT118625T

    公开(公告)日:1995-03-15

    申请号:AT88114591

    申请日:1988-09-07

    Applicant: HOECHST AG

    Abstract: A proposed positive-working radiation-sensitive composition contains a compound which forms an acid when exposed to actinic radiation and a compound which is acid-cleavable and is characterised in that the acid-cleavable compound is monomeric and contains an acetal group whose aldehyde or ketone component has a development solubility of 0.1 to 100 g/l and a boiling point of over 150 DEG C. … The claimed composition does not exhibit varying development properties even with varying "holding times" and therefore has a large processing latitude and makes possible a high structural resolution.

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