中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

7 records (took 0.02 seconds)

    2.
    发明专利
    未知

    公开(公告)号：BR9305037A

    公开(公告)日：1994-06-21

    申请号：BR9305037

    申请日：1993-12-13

    Applicant: HOECHST AG

    Inventor： EICHHORN MATHIAS ,  BUHR GERHARD

    IPC: C07C311/51 ,  C07C311/53 ,  C08F20/38 ,  C08F22/38 ,  G03F7/038 ,  G03F7/039 ,  C07C311/16 ,  C07C311/13 ,  C07C311/21 ,  C07C311/24 ,  C07C311/29 ,  C08C288/00

    Abstract: The invention relates to monomers of the formulae R -SO2-N(CO-OR )-R -O-CO-CR = CH2 and R -N(CO-OR )-SO2-R -O-CO-CR = CH2, in which R is a (C1 -C20)alkyl, (C3-C10)cycloalkyl, (C6-C14)aryl or (C7-C20)aralkyl radical, where, in the alkyl-containing radicals, individual methylene groups may be replaced by heteroatoms, R is a (C3-C11)alkyl, (C3-C11)alkenyl or (C7-C11)aralkyl radical, R is an unsubstituted or substituted (C1-C6)alkyl, (C3-C6)cycloalkyl, (C6-C14)aryl or (C7-C20 )aralkyl radical, and R is a hydrogen atom or a methyl group. It furthermore relates to polymers containing at least 5 mol% of units containing side groups of the formula(e) -R -N(CO-OR )-SO2-R (I) and/or -R -SO2-N(CO-OR (II), and to a radiation-sensitive mixture containing a) a compound which forms an acid on exposure to actinic radiation and b) an acid-cleavable compound whose cleavage products have greater solubility in an aqueous-alkaline developer than does the starting compound, where the acid-cleavable compound is a polymer of the said type, and to a recording material having a support (carrier, base) and a radiation-sensitive coating. The mixture according to the invention is particularly suitable for the production of offset printing plates and photoresists.

    3.
    发明专利
    未知

    公开(公告)号：BR9503065A

    公开(公告)日：1996-06-11

    申请号：BR9503065

    申请日：1995-07-03

    Applicant: HOECHST AG

    Inventor： BRENK MICHAEL ,  EICHHORN MATHIAS ,  ELSAESSER ANDREAS

    IPC: G03F7/09 ,  B41N3/03 ,  G03F7/00 ,  G03G5/14

    Abstract: A mechanically and/or electrochemically roughened, and opt. anodically oxidised, carrier is made of aluminium or its alloys. The carrier carries a hydrophilic layer made from at least one polymer with basic and acidic groups. On the layer is a further hydrophilic layer that contains at least one compound with at least one phosphono group. Also claimed a process for the prodn. of the carrier; and a recording material with a radiation sensitive layer on the carrier.

    4.
    发明专利
    未知

    公开(公告)号：BR9501830A

    公开(公告)日：1996-03-05

    申请号：BR9501830

    申请日：1995-04-27

    Applicant: HOECHST AG

    Inventor： EICHHORN MATHIAS ,  BUHR GERHARD

    IPC: G03F7/004 ,  G03F7/00 ,  G03F7/016 ,  G03F7/039 ,  H01L21/027 ,  C08L25/18

    Abstract: A positive-functioning radiation-sensitive mixt. (A) is claimed, contg. (a) a polymeric binder with acid-labile gps., contg. units of formula (I), (II) and (III) and (b) a cpd. which forms a strong acid when irradiated; R OH (I), R -O-CO2OR (II), R -O-CH2-CHR -OH (III): R = opt. substd. Ph attached to a polymer main or side chain; R = 3-11C alkyl or alkenyl, or 7-11C aralkyl; R = H, opt. substd. alkyl or aryl, phthalimidomethyl, or -CH2OR (with R = H, or opt. substd. aliphatic, cycloaliphatic or aromatic gp.). Also claimed is a recording material with a substrate and a radiation-sensitive layer consisting of compsn. (A).

    5.
    发明专利
    未知

    公开(公告)号：BR9505897A

    公开(公告)日：1998-01-06

    申请号：BR9505897

    申请日：1995-12-14

    Applicant: HOECHST AG

    Inventor： EICHHORN MATHIAS ,  BUHR GERHARD

    IPC: C07C69/02 ,  G03F7/004 ,  G03F7/039 ,  G03C1/73

    Abstract: In a radiation-sensitive mixt. based on a cpd. with acid-hydrolysable C-O-C gp(s). and a strong photo-acid, the hydrolysable cpd. is of formula (R -C(=O)-O-CH(R )-O-C(=O)-)nR (I). In (I), R = opt. substd. alkyl; R = H or opt. substd. 1-4C alkyl; R = an n-valent, opt. polymeric aliphatic or aromatic gp.; and n = 1-100.

    7.
    发明专利
    未知

    公开(公告)号：BR9305036A

    公开(公告)日：1994-06-21

    申请号：BR9305036

    申请日：1993-12-13

    Applicant: HOECHST AG

    Inventor： EICHHORN MATHIAS ,  BUHR GERHARD

    IPC: C07C311/16 ,  C07C311/53 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  C07C311/03 ,  C07C311/13 ,  C07C311/21 ,  C07C311/24 ,  C07C311/29 ,  C08K5/44

    Abstract: The invention relates to N,N-disubstituted sulphonamides of the formulae R [-N(CO-OR )-SO2R ]n and R [-SO2-N(CO-OR )-R ]n, in which R - in the case where n = 1 - is a (C1-C20)alkyl, (C3-C10)cycloalkyl, (C6-C14)aryl or (C7-C20)aralkyl radical and - in the case where n > 1 - is the divalent, trivalent or tetravalent radical of a (C1-C20)alkane or (C5-C7)cycloalkane, of an unfused or fused monocyclic or polycyclic (C6-C18)aromatic compound, R is a (C3-C11)alkyl, (C3-C11)alkenyl or (C7-C11)aralkyl radical, R is an unsubstituted or substituted (C1-C6)alkyl, (C3-C6)cycloalkyl, (C6-C14)aryl or (C7-C20 )aralkyl radical. In addition, the invention relates to a positive-working radiation-sensitive mixture containing a) a compound which forms an acid on exposure to actinic radiation, b) an acid-cleavable compound whose cleavage products have greater solubility in an aqueous-alkaline developer than does the starting compound, and c) a polymeric binder which is insoluble in water, but soluble, at least swellable, in aqueous-alkaline solutions, where compound b) is a sulphonamide of the formula I or II. The mixture according to the invention is particularly suitable for the production of offset printing plates and photoresists.

Patent Agency Ranking