公开(公告)号：BR9605572A

公开(公告)日：1998-08-18

申请号：BR9605572

申请日：1996-11-14

Applicant: HOECHST AG

Inventor： HAAS RAIMUND ,  HULTZSCH GUENTER ,  LEHMANN PETER ,  NEUBAUER RUDOLF ,  ZERTANI RUDOLF ,  ELSAESSER ANDREAS

IPC: G03F7/004 ,  B41N1/14 ,  B41N3/03 ,  G03F7/00 ,  G03F7/022 ,  G03F7/023

Abstract: Disclosed is a positive-working, radiation-sensitive recording material for the production of planographic printing plates, comprising an aluminum support and a radiation-sensitive layer coated thereon, wherein the aluminum support has been grained in nitric acid, then pickled in sulfuric acid, anodized in sulfuric acid, and subsequently hydrophilized with a compound comprising at least one unit with a phosphonic acid or phosphonate group and the radiation-sensitive layer comprises a) a radiation-sensitive ester of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid and a polycondensate having phenolic hydroxy groups, said polycondensate being obtained by reacting a phenolic compound with an aldehyde or ketone, b) a novolak or a polycondensation product obtained by reacting a polyphenol with an aldehyde or ketone, as an alkali-soluble resin, c) a vinyl-type polymer comprising at least one unit having a lateral hydroxyphenyl group, d) a clathrate, e) a low-molecular weight compound which comprises at least one acidic hydrogen atom, and f) silica gel particles having a maximum diameter of 15 mu m. e

公开(公告)号：BR8703201A

公开(公告)日：1988-03-15

申请号：BR8703201

申请日：1987-06-25

Applicant: HOECHST AG

Inventor： ELSAESSER ANDREAS

IPC: G03F7/022 ,  G03C1/72 ,  G03F7/095 ,  G03F7/08 ,  G03F7/26 ,  G03C1/52

Abstract: A radiation-sensitive recording material comprising a support and first and second radiation-sensitive layers is disclosed. The first radiation-sensitive layer comprises a 1,2-quinone diazide as the radiation-sensitive compound and the second radiation-sensitive layer comprises (a) a compound which forms a strong acid under the action of actinic radiation, (b) a compound which has at least one acid-cleavable C-O-C bond and (c) a polymeric binder. The recording material has an improved storage stability as compared with materials which comprise only radiation-sensitive layers based on acid-cleavable compounds.

公开(公告)号：AU704980B2

公开(公告)日：1999-05-13

申请号：AU7178196

申请日：1996-11-15

Applicant: HOECHST AG

Inventor： ELSAESSER ANDREAS ,  HAAS RAIMUND ,  HULTZSCH GUENTER ,  LEHMANN PETER ,  NEUBAUER RUDOLF ,  ZERTANI RUDOLF

IPC: G03F7/004 ,  B41N1/14 ,  B41N3/03 ,  G03F7/00 ,  G03F7/022 ,  G03F7/023

Abstract: Disclosed is a positive-working, radiation-sensitive recording material for the production of planographic printing plates, comprising an aluminum support and a radiation-sensitive layer coated thereon, wherein the aluminum support has been grained in nitric acid, then pickled in sulfuric acid, anodized in sulfuric acid, and subsequently hydrophilized with a compound comprising at least one unit with a phosphonic acid or phosphonate group and the radiation-sensitive layer comprises a) a radiation-sensitive ester of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid and a polycondensate having phenolic hydroxy groups, said polycondensate being obtained by reacting a phenolic compound with an aldehyde or ketone, b) a novolak or a polycondensation product obtained by reacting a polyphenol with an aldehyde or ketone, as an alkali-soluble resin, c) a vinyl-type polymer comprising at least one unit having a lateral hydroxyphenyl group, d) a clathrate, e) a low-molecular weight compound which comprises at least one acidic hydrogen atom, and f) silica gel particles having a maximum diameter of 15 mu m. e

公开(公告)号：BR9503065A

公开(公告)日：1996-06-11

申请号：BR9503065

申请日：1995-07-03

Applicant: HOECHST AG

Inventor： BRENK MICHAEL ,  EICHHORN MATHIAS ,  ELSAESSER ANDREAS

IPC: G03F7/09 ,  B41N3/03 ,  G03F7/00 ,  G03G5/14

Abstract: A mechanically and/or electrochemically roughened, and opt. anodically oxidised, carrier is made of aluminium or its alloys. The carrier carries a hydrophilic layer made from at least one polymer with basic and acidic groups. On the layer is a further hydrophilic layer that contains at least one compound with at least one phosphono group. Also claimed a process for the prodn. of the carrier; and a recording material with a radiation sensitive layer on the carrier.

公开(公告)号：CA2035406A1

公开(公告)日：1991-08-03

申请号：CA2035406

申请日：1991-01-31

Applicant: HOECHST AG

Inventor： ELSAESSER ANDREAS ,  FRASS HANS W ,  MOHR DIETER

IPC: G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

Abstract: A radiation-sensitive mixture, a radiationsensitive recording material produced from the mixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains (1) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and (2) a 1,2-quinone diazide and/or a combination of a compound which forms strong acid when exposed to actinic radiation and a compound containing at least one acidcleavable C-O-C bond. The polymeric binder has a molecular weight of between about 5,000 and 100,000 and a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10, mmol/g of polymer. It has a content of -CH3-nXn units of at least 0.1, preferably about 0.5 to 2, mmol/g of polymer, X being halogen such as chlorine, bromine or iodine and n being 1, 2 or 3. Lithographic plates are produced with the mixture which are thermally postcurable, have a high print run and have good resistance to chemicals. Photoresists having high heat resistance can also be produced with the mixture.

公开(公告)号：BR8905102A

公开(公告)日：1990-05-15

申请号：BR8905102

申请日：1989-10-06

Applicant: HOECHST AG

Inventor： ELSAESSER ANDREAS ,  GASCHLER OTFRIED ,  MOHR DIETER

IPC: G03F7/004 ,  G03F7/022 ,  G03F7/105 ,  H01L21/027 ,  G03C1/52 ,  G03F7/08

公开(公告)号：BR8804797A

公开(公告)日：1989-04-25

申请号：BR8804797

申请日：1988-09-16

Applicant: HOECHST AG

Inventor： EMMELIUS MICHAEL ,  ELSAESSER ANDREAS ,  MOHR DIETER

IPC: G03C1/72 ,  G03F7/023 ,  G03C1/52 ,  G03F7/08

Abstract: The radiation-sensitive composition contains, as essential constituent, a 1,2-quinone diazide which is a polymer with repeating units of the general formula I in which R is a hydrogen or halogen atom, or a cyanide or an alkyl group, R1, R2, and R3 are identical or different and are hydrogen or halogen atoms, or optionally substituted alkyl or alkoxy groups, A are the atoms required to complete a mono- or binuclear carbocyclic or heterocyclic aromatic ring system, D is a radical containing a 1,2-quinone diazide grouping, and n + m is 2 or 3. A copying material can also be prepared from this composition. The material provides lithographic plates with a large print run.

公开(公告)号：ZA969602B

公开(公告)日：1998-05-15

申请号：ZA969602

申请日：1996-11-15

Applicant: HOECHST AG

Inventor： HAAS RAIMUND ,  ELSAESSER ANDREAS ,  HULTZSCH GUENTER ,  LEHMANN PETER ,  NEUBAUER RUDOLF ,  ZERTANI RUDOLF

IPC: B41N1/14 ,  G03F7/004 ,  B41N3/03 ,  G03F7/00 ,  G03F7/022 ,  G03F7/023 ,  G03F

Abstract: Disclosed is a positive-working, radiation-sensitive recording material for the production of planographic printing plates, comprising an aluminum support and a radiation-sensitive layer coated thereon, wherein the aluminum support has been grained in nitric acid, then pickled in sulfuric acid, anodized in sulfuric acid, and subsequently hydrophilized with a compound comprising at least one unit with a phosphonic acid or phosphonate group and the radiation-sensitive layer comprises a) a radiation-sensitive ester of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid and a polycondensate having phenolic hydroxy groups, said polycondensate being obtained by reacting a phenolic compound with an aldehyde or ketone, b) a novolak or a polycondensation product obtained by reacting a polyphenol with an aldehyde or ketone, as an alkali-soluble resin, c) a vinyl-type polymer comprising at least one unit having a lateral hydroxyphenyl group, d) a clathrate, e) a low-molecular weight compound which comprises at least one acidic hydrogen atom, and f) silica gel particles having a maximum diameter of 15 mu m. e

公开(公告)号：BR9600888A

公开(公告)日：1997-12-30

申请号：BR9600888

申请日：1996-03-04

Applicant: HOECHST AG

Inventor： EICHHORN MATHIAS ,  ELSAESSER ANDREAS

IPC: G03F7/022 ,  C08F20/52 ,  C08F20/54 ,  C08F20/60 ,  C08K5/28 ,  C08L33/24 ,  G03F7/023 ,  G03F7/033 ,  G03F7/037 ,  G03F7/039 ,  G03C1/695

Abstract: N-(N,N-Diacyl-iminomethyl)acrylamide polymers (I) have repeating units of formula (A) -Ä-C(R )(R )-C(Cä=Oü-NH-CH2-NT1T )-Ü- (A) where R ,R ,R = H or alkyl; T = -X-Y; T = -C(=O)-Z; X ==C=O or =SO2; Y,Z = (cyclo)alkyl, alkenyl or (het)aryl or Y + Z = a 5-6-membered heterocycle.

公开(公告)号：BR9204371A

公开(公告)日：1993-05-18

申请号：BR9204371

申请日：1992-11-11

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED ,  ELSAESSER ANDREAS ,  BUHR GERHARD ,  BERGMANN KLAUS ,  ZAHN WOLFGANG

IPC: G03F7/00 ,  G03F7/022 ,  H01L21/027 ,  H01L21/30 ,  G03C1/52 ,  G03F7/016

Abstract: The invention relates to a light-sensitive mixture which contains a resin-type binder, which is insoluble in water and soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinone-diazide-sulfonic acid ester, the o-naphthoquinone-diazide-sulfonic acid ester corresponding to the general formula I in which R is hydrogen or an alkyl or aryl radical, R is hydrogen or a 1,2-naphthoquinone-2-diazide-4-, 1,2-naphthoquinone-2-diazide-5- or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical and the number of the identical or different naphthoquinone-diazide-sulfonyl radicals defined as R in the molecule is 1 to 5. The stoichiometric degree of esterification is preferably 40-95%. The invention also relates to a light-sensitive resist material consisting of a layer base and a light-sensitive layer of the mixture described. The resist material prepared with the use of the light-sensitive mixture has a high light sensitivity and a very good resistance to alkaline developers and can be developed with aqueous, weakly alkaline solutions without problems.