公开(公告)号：DE59107744D1

公开(公告)日：1996-06-05

申请号：DE59107744

申请日：1991-02-08

Applicant: HOECHST AG

Inventor： ELSAESSER ANDREAS DR DIPL CHEM ,  FRASS HANS WERNER DR DIPL CHEM ,  GASCHLER OTFRIED DIPL ING ,  MOHR DIETER DR DIPL CHEM ,  BUHR GERHARD DR DIPL CHEM

IPC: G03F7/00 ,  G03F7/022 ,  G03F7/023 ,  G03F7/039

Abstract: The invention relates to a normally positive-working radiation-sensitive composition which contains, as essential constituents, a water-insoluble binder which is soluble in aqueous alkaline solutions, a 1,2-quinone diazide and a compound which reduces the developer solubility of the exposed regions by thermal treatment. In this composition at least one urethane of the general formula I is present as the compound which reduces the developer solubility: where R1 is hydrogen or methyl, R2 is hydrogen, alkyl, optionally substituted aryl or an optionally substituted arylaminocarbonyl, R3 is an optionally substituted arylene or arylene-alkylene, Q is hydrogen, -CH4-p, CR5R6, where R5 and R6 may be identical or different and are hydrogen, alkyl or aryl, carbonyl, an oxygen or sulphur atom or sulphonyl, m is 1, 2 or 3, and n is a number >/= 1 and

公开(公告)号：DE59106562D1

公开(公告)日：1995-11-02

申请号：DE59106562

申请日：1991-01-21

Applicant: HOECHST AG

Inventor： ELSAESSER ANDREAS DR DIPL CHEM ,  MOHR DIETER DR DIPL CHEM

IPC: G03F7/004 ,  G03F7/023 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

Abstract: Positive-working radiation-sensitive mixt. consists of a polymeric binder, which is insol. in water but soluble in aq. alkaline solns., and a 1,2-quinone-diazide and/or a combination of a cpd. forming a strong acid where exposed to actinic radiation and a cpd. with hydrolysable C-O-C linkage(s). The binder is a polyer with (poly)hydroxyaralkyl (substd.) acrylate units of formula (I): Y = a (poly)hydroxyaralkyl gp. of formula (II): R1 = H, halogen, CN or alkyl; R2 and R3 independently = H, alkyl or aryl; R4, R5 and R6 independently = H, halogen, alkyl, alkoxy or aryl; X = the atoms needed to complete a mono- or polynuclear carbocyclic aromatic ring system; n = 1, 2 or 3. Pref. Y = 4-hydroxybenzyl, opt. with 1-4C alkyl or halogen substit(s). in the 3- and/or 5-positions; or 2-hydroxybenzyl methacrylate, opt. with a 1-4C alkyl or halogen substit. in the 3-position and/or a 1-4C alkyl, halogen or opt. alkyl-, alkoxy- or halogen-substd. aryl substit. in the 5-position. The binder also contains unit(s) of formula (III): -(-C(R7)(R8)-C(R9)(R10)-)- (III); R7 = H; R8 = H or COOH and R9 = alkyl, alkoxy, alkoxycarbonyl, acyl, acyloxy, aryl, aryloxycarbonyl, HCO, CN, COOH, OH or aminocarbonyl; esp. 1-4C alkyl, 1-8C alkoxy, 2-13C alkoxycarbonyl, 2-18C acyloxy, 6-10C aryl or 7-11C aryloxycarbonyl, in which the aryl gps. may have OH substits.; or R8 + R9 = a carboxylic anhydride gp. or opt. alkyl-substd. imide; R10 = H, halogen or alkyl.

公开(公告)号：DE3877698D1

公开(公告)日：1993-03-04

申请号：DE3877698

申请日：1988-10-29

Applicant: HOECHST AG

Inventor： ELSAESSER ANDREAS DR DIPL CHEM

IPC: G03C1/72 ,  G03F7/023 ,  G03F7/039

Abstract: Radiation-sensitive mixt. is based on a cpd. (I) forming a strong acid when exposed to actinic radiation and a polymer (II) with recurring, acid-hydrolysable acetal or ketal gps. The novelty is that (II) is a reaction prod. of an organic polymer (III) with free OH gps., an organic cpd. (IV) with at least 2 NCO or epoxy gps. and a cpd. (V) with recurring, acid-hydrolysable acetal or ketal gps. and at least one free OH gp.

公开(公告)号：DE59009857D1

公开(公告)日：1995-12-14

申请号：DE59009857

申请日：1990-12-03

Applicant: HOECHST AG

Inventor： GASCHLER OTFRIED DIPL ING ,  ELSAESSER ANDREAS DR DIPL CHEM ,  MOHR DIETER DR DIPL CHEM ,  FRASS WERNER DR DIPL CHEM

IPC: G03F7/004 ,  G03F7/022 ,  G03F7/20 ,  G03F7/38

Abstract: The invention relates to a process for the formation of negative copies in which a photosensitive or radiation-sensitive copying material comprising a layer base and a normally positive-working photosensitive or radiation-sensitive layer deposited thereon is irradiated through an image, treated thermally, irradiated over the entire surface after cooling and then developed with an alkaline developer. The thermal treatment is carried out with water or with an aqueous solution at temperatures in the range from about 50 to 100, preferably 60-90 DEG C, in the course of between about 1 second and 5 minutes, preferably 5 seconds and 1 minute, the whole-surface irradiation is carried out on the still hot copying material and the subsequent development is carried out in the course of between about 10 seconds and 2 minutes, preferably 15 seconds and 1 minute. The process can be carried out in standard frames known from positive processing and used in practice and yields perfect printing templates.

公开(公告)号：DE59106745D1

公开(公告)日：1995-11-30

申请号：DE59106745

申请日：1991-01-24

Applicant: HOECHST AG

Inventor： ELSAESSER ANDREAS DR DIPL CHEM ,  FRASS HANS WERNER DR DIPL CHEM ,  MOHR DIETER DR DIPL CHEM

IPC: G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

Abstract: The invention relates to a radiation-sensitive composition, a radiation-sensitive recording material produced therewith and a process for the production of heat- and chemical-resistant relief records using the recording material. In the normally positive-working radiation-sensitive composition containing, as essential constituents, a) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and b) a 1,2-quinone diazide and/or a combination of 1. A compound which forms strong acid when exposed to actinic radiation and 2. A compound containing at least one acid-cleavable C-O-C bond a polymer is present as polymeric binder which has a molecular weight of between 5000 and 100,000, which has a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10 mmol/g of polymer and a content of -CH3-nXn units of not less than 0.1, preferably about 0.5 to 2 mmol/g of polymer, where X stands for halogen such as chlorine, bromine or iodine and n for 1, 2 or 3. This makes available lithographic printing plates which can be thermally postcured, ensure a high print run and have good chemical resistance. It can also be used to produce photoresists with high thermal stability.

公开(公告)号：DE58909124D1

公开(公告)日：1995-04-27

申请号：DE58909124

申请日：1989-06-09

Applicant: HOECHST AG

Inventor： ELSAESSER ANDREAS DR DIPL CHEM ,  FRASS HANS WERNER DR DIPL CHEM ,  MOHR DIETER DR DIPL CHEM

IPC: G03F7/022 ,  G03F7/004 ,  G03F7/023 ,  G03F7/032 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

Abstract: The invention relates to a positive-working radiation-sensitive mixture and a copying material produced therefrom on a layer support. The mixture contains as essential constituents a 1,2-quinone diazide or a combination of: 1) a compound forming strong acid when exposed to actinic radiation and 2) a compound containing at least one acid-cleavable C-O-C bond, and a binder with repeating units of the general formula I I wherein R1 denotes a hydrogen or halogen atom, or a cyanide or an alkyl group, R2, R3, R4 are identical or different and denote hydrogen, or alkyl or aryl groups, R5, R6 and optionally R7 are identical or different and denote hydrogen or halogen atoms, or alkyl, aryl or alkoxy groups, and X denotes the atoms necessary to complete a mononuclear or polynuclear carbocyclic aromatic ring system, and n is 1, 2 or 3. The mixture according to the invention yields lithographic printing plates with a high print run which can be thermally post-cured and have good resistance to chemicals, also photoresists with high heat resistance.