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公开(公告)号:ZA9201455B
公开(公告)日:1992-11-25
申请号:ZA9201455
申请日:1992-02-27
Applicant: HOECHST AG
Inventor: ROESCHERT HORST , HORST ROESCHERT , PAWLOWSKI GEORG , GEORG PAWLOWSKI , DAMMEL RALPH , RALPH DAMMEL , MERREM HANS-JOACHIM , HANS-JOACHIM MERREM , FUCHS JUERGEN , JUERGEN FUCHS
IPC: B41M5/26 , C08F12/00 , C08F212/14 , G03F7/023 , H01L21/027 , C08F , C08L , G03F , H01L
CPC classification number: G03F7/023
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公开(公告)号:ZA9202813B
公开(公告)日:1992-11-25
申请号:ZA9202813
申请日:1992-04-16
Applicant: HOECHST AG
Inventor: PAWLOWSKI GEORG , GEORG PAWLOWSKI , ROESCHERT HORST , HORST ROESCHERT , SPIESS WALTER , WALTER SPIESS , DAMMEL RALPH , RALPH DAMMEL
IPC: C09K11/00 , C07C235/08 , C07C271/16 , C07C275/04 , C07C275/24 , C07C275/28 , C07C323/10 , C07D317/54 , C08G69/00 , C08G71/00 , G01D15/14 , G03F7/004 , G03F7/039 , C07C , C07D , G03F
CPC classification number: G03F7/039 , C07C271/16 , C07C275/24 , C07D317/54 , C08G69/00 , C08G71/00 , G03F7/0045 , Y10S430/106
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公开(公告)号:ZA921456B
公开(公告)日:1992-11-25
申请号:ZA921456
申请日:1992-02-27
Applicant: HOECHST AG
Inventor: ROESCHERT HORST , HORST ROESCHERT , PAWLOWSKI GEORG , GEORG PAWLOWSKI , DAMMEL RALPH , RALPH DAMMEL , MERREM HANS-JOACHIM , HANS-JOACHIM MERREM , FUCHS JUERGEN , JUERGEN FUCHS
IPC: C08F8/30 , C08F12/00 , C08F12/14 , C08F212/14 , C08F220/20 , G03F7/039 , C08F , C08L , G03F , H01L
Abstract: The invention relates to radiation-sensitive polymers, to a mixture essentially containing these radiation-sensitive polymers as binders and to a process for preparing the radiation-sensitive polymeric binder and also to a positive-working radiation-sensitive recording material which is produced using the radiation-sensitive mixture.
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公开(公告)号:ZA922813B
公开(公告)日:1992-11-25
申请号:ZA922813
申请日:1992-04-16
Applicant: HOECHST AG
Inventor: PAWLOWSKI GEORG , GEORG PAWLOWSKI , ROESCHERT HORST , HORST ROESCHERT , SPIESS WALTER , WALTER SPIESS , DAMMEL RALPH , RALPH DAMMEL
IPC: C09K11/00 , C07C235/00 , C07C235/08 , C07C271/12 , C07C271/14 , C07C271/16 , C07C275/04 , C07C275/06 , C07C275/24 , C07C275/28 , C07C323/10 , C07D317/54 , C08G69/00 , C08G71/00 , G01D15/14 , G03F7/004 , G03F7/039 , C07C , C07D , G03F
Abstract: Compounds having repeating units of the formula I (* CHEMICAL STRUCTURE *) (I) in which R1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH2 groups may be replaced by oxygen or sulfur atoms, R2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, R3 is an alkyl or aryl radical, X is -CO-, -O-CO- or -NH-CO-, and n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.
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公开(公告)号:ZA921455B
公开(公告)日:1992-11-25
申请号:ZA921455
申请日:1992-02-27
Applicant: HOECHST AG
Inventor: ROESCHERT HORST , HORST ROESCHERT , PAWLOWSKI GEORG , GEORG PAWLOWSKI , DAMMEL RALPH , RALPH DAMMEL , MERREM HANS-JOACHIM , HANS-JOACHIM MERREM , FUCHS JUERGEN , JUERGEN FUCHS
IPC: B41M5/26 , C08F12/00 , C08F212/14 , G03F7/023 , H01L21/027 , C08F , C08L , G03F , H01L
Abstract: The invention relates to radiation-sensitive polymers, to a mixture essentially containing these radiation-sensitive polymers as binders and, furthermore, to a process for preparing the radiation-sensitive polymeric binder and also to a positive-working radiation-sensitive recording material which is produced using the radiation-sensitive mixture.
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公开(公告)号:ZA9201456B
公开(公告)日:1992-11-25
申请号:ZA9201456
申请日:1992-02-27
Applicant: HOECHST AG
Inventor: ROESCHERT HORST , HORST ROESCHERT , PAWLOWSKI GEORG , GEORG PAWLOWSKI , DAMMEL RALPH , RALPH DAMMEL , MERREM HANS-JOACHIM , HANS-JOACHIM MERREM , FUCHS JUERGEN , JUERGEN FUCHS
IPC: C08F8/30 , C08F12/00 , C08F12/14 , C08F212/14 , C08F220/20 , G03F7/039 , C08F , C08L , G03F , H01L
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