公开(公告)号：ZA9202813B

公开(公告)日：1992-11-25

申请号：ZA9202813

申请日：1992-04-16

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  ROESCHERT HORST ,  HORST ROESCHERT ,  SPIESS WALTER ,  WALTER SPIESS ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: C09K11/00 ,  C07C235/08 ,  C07C271/16 ,  C07C275/04 ,  C07C275/24 ,  C07C275/28 ,  C07C323/10 ,  C07D317/54 ,  C08G69/00 ,  C08G71/00 ,  G01D15/14 ,  G03F7/004 ,  G03F7/039 ,  C07C ,  C07D ,  G03F

CPC classification number: G03F7/039 ,  C07C271/16 ,  C07C275/24 ,  C07D317/54 ,  C08G69/00 ,  C08G71/00 ,  G03F7/0045 ,  Y10S430/106

公开(公告)号：BR9200681A

公开(公告)日：1992-11-10

申请号：BR9200681

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  MERREM HANS-JOACHIM ,  PAWLOWSKI GEORG ,  FUCHS JUERGEN ,  DAMMEL RALPH

IPC: C08F8/30 ,  C08F12/00 ,  C08F12/14 ,  C08F212/14 ,  C08F220/20 ,  G03F7/039 ,  C08F8/14

Abstract: The invention relates to radiation-sensitive polymers, to a mixture essentially containing these radiation-sensitive polymers as binders and to a process for preparing the radiation-sensitive polymeric binder and also to a positive-working radiation-sensitive recording material which is produced using the radiation-sensitive mixture.

公开(公告)号：AU1125392A

公开(公告)日：1992-09-03

申请号：AU1125392

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： MERREM HANS-JOACHIM ,  ROESCHERT HORST ,  PAWLOWSKI GEORGE ,  FUCHS JUERGEN ,  DAMMEL RALPH

IPC: B41M5/26 ,  C08F12/00 ,  C08F212/14 ,  G03F7/023 ,  H01L21/027 ,  G03F7/004

Abstract: The invention relates to radiation-sensitive polymers, to a mixture essentially containing these radiation-sensitive polymers as binders and, furthermore, to a process for preparing the radiation-sensitive polymeric binder and also to a positive-working radiation-sensitive recording material which is produced using the radiation-sensitive mixture.

公开(公告)号：SG71673A1

公开(公告)日：2000-04-18

申请号：SG1996008159

申请日：1992-04-09

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  ROESCHERT HORST ,  SPIESS WALTER ,  DAMMEL RALPH

IPC: C09K11/00 ,  C07C235/00 ,  C07C235/08 ,  C07C271/12 ,  C07C271/14 ,  C07C271/16 ,  C07C275/04 ,  C07C275/06 ,  C07C275/24 ,  C07C275/28 ,  C07C323/10 ,  C07D317/54 ,  C08G69/00 ,  C08G71/00 ,  G01D15/14 ,  G03F7/004 ,  G03F7/039 ,  C08G12/12

Abstract: Compounds having repeating units of the formula I (* CHEMICAL STRUCTURE *) (I) in which R1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH2 groups may be replaced by oxygen or sulfur atoms, R2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, R3 is an alkyl or aryl radical, X is -CO-, -O-CO- or -NH-CO-, and n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.

公开(公告)号：CA2074791A1

公开(公告)日：1993-01-30

申请号：CA2074791

申请日：1992-07-28

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  DAMMEL RALPH ,  ROESCHERT HORST ,  MEIER WINFRIED ,  SPIESS WALTER ,  PRZYBILLA KLAUS-JUERGEN

IPC: G03F7/00 ,  C04B41/50 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027

Abstract: A negative-working radiation-sensitive mixture containing a) a compound which contains at least one -CBr3 group bound to an atom not linked in turn to a hydrogen atom, b) an alkoxymethylated melamine and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions and contains phenolic OH groups, wherein (1) the mixture has an absorption of

公开(公告)号：ZA922813B

公开(公告)日：1992-11-25

申请号：ZA922813

申请日：1992-04-16

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  ROESCHERT HORST ,  HORST ROESCHERT ,  SPIESS WALTER ,  WALTER SPIESS ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: C09K11/00 ,  C07C235/00 ,  C07C235/08 ,  C07C271/12 ,  C07C271/14 ,  C07C271/16 ,  C07C275/04 ,  C07C275/06 ,  C07C275/24 ,  C07C275/28 ,  C07C323/10 ,  C07D317/54 ,  C08G69/00 ,  C08G71/00 ,  G01D15/14 ,  G03F7/004 ,  G03F7/039 ,  C07C ,  C07D ,  G03F

Abstract: Compounds having repeating units of the formula I (* CHEMICAL STRUCTURE *) (I) in which R1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH2 groups may be replaced by oxygen or sulfur atoms, R2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, R3 is an alkyl or aryl radical, X is -CO-, -O-CO- or -NH-CO-, and n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.

公开(公告)号：SG43324A1

公开(公告)日：1997-10-17

申请号：SG1996008359

申请日：1990-08-30

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  MERREM HANS-JOACHIM ,  LINGNAU JUERGEN ,  DAMMEL RALPH ,  ROESCHERT HORST

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/016 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30 ,  G03F

Abstract: A positive-working radiation-sensitive mixture is described which contains, as essential constituents, a) an alpha , alpha -bis(sulphonyl)diazomethane which forms a strong acid on irradiation and has the general formula where R is an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical, b) a compound containing at least one acid-cleavable C-O-C or C-O-Si bond, and c) a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solutions. The radiation-sensitive mixture according to the invention is remarkable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photolysis products on exposure.

公开(公告)号：ZA9201455B

公开(公告)日：1992-11-25

申请号：ZA9201455

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  HORST ROESCHERT ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  DAMMEL RALPH ,  RALPH DAMMEL ,  MERREM HANS-JOACHIM ,  HANS-JOACHIM MERREM ,  FUCHS JUERGEN ,  JUERGEN FUCHS

IPC: B41M5/26 ,  C08F12/00 ,  C08F212/14 ,  G03F7/023 ,  H01L21/027 ,  C08F ,  C08L ,  G03F ,  H01L

CPC classification number: G03F7/023

公开(公告)号：CA2066148A1

公开(公告)日：1992-10-21

申请号：CA2066148

申请日：1992-04-15

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  FUCHS JUERGEN ,  SPIESS WALTER ,  ECKES CHARLOTTE ,  PAWLOWSKI GEORG

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  H01L21/027 ,  G03C1/73 ,  G03F7/038 ,  G03F7/30

Abstract: A positive-working, radiation-sensitive mixture containing a) a compound which generates a strong acid under the action of actinic radiation, b) a compound having at least one C-O-C or C-O-Si bond cleavable by acid and c) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions, wherein the compound (a) is a 1,3,5- or 1,2,4-tri-hydroxybenzene or a 1,2,3-, 1,3,5- or 1,2,4-trihydroxy-benzene substituted on the aromatic ring by a radical R'; or a polymer containing a dihydroxy-phenoxy radical or a polymer containing a trihydxoxy phenylene radical; wherein the hydroxybenzene or hydroxy-containing polymer is partially or fully esterified with sulfonic acids of the formula R-SO3H, is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiationsensitive recording material which has been produced with mixture is suitable for the production of photoresists, electronic components, printing plates, or for chemical milling.

公开(公告)号：CA2066086A1

公开(公告)日：1992-10-21

申请号：CA2066086

申请日：1992-04-15

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  ROESCHERT HORST ,  SPIESS WALTER ,  DAMMEL RALPH

IPC: C09K11/00 ,  C07C235/00 ,  C07C235/08 ,  C07C271/12 ,  C07C271/14 ,  C07C271/16 ,  C07C275/04 ,  C07C275/06 ,  C07C275/24 ,  C07C275/28 ,  C07C323/10 ,  C07D317/54 ,  C08G69/00 ,  C08G71/00 ,  G01D15/14 ,  G03F7/004 ,  G03F7/039 ,  C07C271/26 ,  C08G73/00 ,  C08G75/00 ,  C07F17/02 ,  G03F7/032 ,  C07D333/24 ,  C07C275/32 ,  C07C323/60 ,  C07D317/60 ,  G03C1/73

Abstract: Compounds having repeating units of the formula I (I) in which R1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH2 groups may be replaced by oxygen or sulfur atoms, R2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, R3 is an alkyl or aryl radical, X is -CO-, -O-CO- or -NH-CO-, and n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.