-
1.发明专利
公开(公告)号：AU704980B2
公开(公告)日：1999-05-13
申请号：AU7178196
申请日：1996-11-15
Applicant: HOECHST AG
Inventor： ELSAESSER ANDREAS , HAAS RAIMUND , HULTZSCH GUENTER , LEHMANN PETER , NEUBAUER RUDOLF , ZERTANI RUDOLF
Abstract: Disclosed is a positive-working, radiation-sensitive recording material for the production of planographic printing plates, comprising an aluminum support and a radiation-sensitive layer coated thereon, wherein the aluminum support has been grained in nitric acid, then pickled in sulfuric acid, anodized in sulfuric acid, and subsequently hydrophilized with a compound comprising at least one unit with a phosphonic acid or phosphonate group and the radiation-sensitive layer comprises a) a radiation-sensitive ester of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid and a polycondensate having phenolic hydroxy groups, said polycondensate being obtained by reacting a phenolic compound with an aldehyde or ketone, b) a novolak or a polycondensation product obtained by reacting a polyphenol with an aldehyde or ketone, as an alkali-soluble resin, c) a vinyl-type polymer comprising at least one unit having a lateral hydroxyphenyl group, d) a clathrate, e) a low-molecular weight compound which comprises at least one acidic hydrogen atom, and f) silica gel particles having a maximum diameter of 15 mu m. e
-
公开(公告)号：ZA9003522B
公开(公告)日：1991-02-27
申请号：ZA9003522
申请日：1990-05-09
Applicant: HOECHST AG
Inventor： HULTZSCH GUENTER , GUENTER HULTZSCH , IDSTEIN HERMANN , HERMANN IDSTEIN , NIES REINHARD , REINHARD NIES
-
公开(公告)号：BR9605572A
公开(公告)日：1998-08-18
申请号：BR9605572
申请日：1996-11-14
Applicant: HOECHST AG
Inventor： HAAS RAIMUND , HULTZSCH GUENTER , LEHMANN PETER , NEUBAUER RUDOLF , ZERTANI RUDOLF , ELSAESSER ANDREAS
Abstract: Disclosed is a positive-working, radiation-sensitive recording material for the production of planographic printing plates, comprising an aluminum support and a radiation-sensitive layer coated thereon, wherein the aluminum support has been grained in nitric acid, then pickled in sulfuric acid, anodized in sulfuric acid, and subsequently hydrophilized with a compound comprising at least one unit with a phosphonic acid or phosphonate group and the radiation-sensitive layer comprises a) a radiation-sensitive ester of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid and a polycondensate having phenolic hydroxy groups, said polycondensate being obtained by reacting a phenolic compound with an aldehyde or ketone, b) a novolak or a polycondensation product obtained by reacting a polyphenol with an aldehyde or ketone, as an alkali-soluble resin, c) a vinyl-type polymer comprising at least one unit having a lateral hydroxyphenyl group, d) a clathrate, e) a low-molecular weight compound which comprises at least one acidic hydrogen atom, and f) silica gel particles having a maximum diameter of 15 mu m. e
-
公开(公告)号：CA1336533C
公开(公告)日：1995-08-08
申请号：CA599057
申请日：1989-05-09
Applicant: HOECHST AG
Inventor： DURST FRANZ , HAAS RAIMUND , HULTZSCH GUENTER , DAMMANN MANFRED , MACK GERHARD , INTERTHAL WERNER , STROSZYNSKI JOACHIM , LEHMANN PETER
Abstract: A process for drying a liquid layer which has been applied to a carrier material moving through a drying zone and which contains vaporizable solvent components and non-vaporizable components, wherein a drying gas flows in the longitudinal direction of the carrier material parallel to the liquid layer and is accelerated in the drying zone in the direction of flow, is disclosed. Also disclosed is a device for accomplishing the drying process, comprising a drying channel through which the carrier material bearing the liquid layer runs in the longitudinal direction, and a gas-permeable channel-covering surface, through which the gas stream flows into the drying channel.
-
公开(公告)号：CA2016362A1
公开(公告)日：1990-11-10
申请号：CA2016362
申请日：1990-05-09
Applicant: HOECHST AG
Inventor： HULTZSCH GUENTER , IDSTEIN HERMANN , NIES REINHARD
IPC: B05C9/14 , B05D3/02 , F26B15/12 , F26B25/20 , H05K3/06 , H05K3/22 , H05K3/28 , H05K3/26 , H05K13/02
Abstract: A method and apparatus for drying boards coated on both sides utilizes plural heating sources located within a drying zone and a plurality of conveyor rollers, located below the heating sources, which convey the boards through the drying zone. A coolant flows through the hollow interior of each of the conveyor rollers, thus cooling the outer peripheral surfaces of the rollers and the bottom surfaces of the boards. The conveyor rollers are arranged in parallel with one another and may be either horizontal or arranged in adjacent rows which are adjustably inclined towards one another to accommodate boards of varying sizes. Conveyor rollers located immediately downstream of the drying zone form a short cooling zone in which the boards are rapidly cooled for further handling.
-
Patent Agency Ranking
公开(公告)号：FI892292A0
公开(公告)日：1989-05-11
申请号：FI892292
申请日：1989-05-11
Applicant: HOECHST AG
Inventor： DURST FRANZ , HAAS RAIMUND , HULTZSCH GUENTER , DAMMANN MANFRED , MACK GERHARD , INTERTHAL WERNER , STROSZYNSKI JOACHIM , LEHMANN PETER
Abstract: An apparatus for drying a liquid layer deposited on a carrier material which is moved through a drying zone, which liquid layer contains evaporable solvent components and non-evaporable components, comprises a drying apparatus (1) with a drying channel (2), through which the carrier material band (4) runs in the longitudinal direction, on which band the liquid layer to be dried is deposited. The drying channel has a gas/air permeable channel covering surface (7), through which a gas flow, in particular a heated air flow, flows into the drying channel. The channel covering surface (7) is inclined in relation to the channel bottom surface (3) which runs horizontally. The drying channel (2) is adjoined by a gas exchange chamber (15) which contains a fan (12), the fan outlet (16) of which is directed towards a heat exchanger in a partition wall (10) between the gas exchange chamber (15) and a drying chamber (5) situated above the drying channel (2). The gas exchange chamber (15) contains a choke device (13 and 14 respectively) in its bottom surface (18) and in its upper gas inlet (19) respectively. The drying apparatus (1) further contains an exhausting fan (9) which is arranged above the covering surface of a through-channel (20) and is connected to the through-channel via a suction opening. In the outlet (11) of the exhausting fan (9) there is also a choke device (8). … …
-
公开(公告)号：ZA893554B
公开(公告)日：1989-12-27
申请号：ZA893554
申请日：1989-05-12
Applicant: HOECHST AG
-
公开(公告)号：FI892292A
公开(公告)日：1989-11-14
申请号：FI892292
申请日：1989-05-11
Applicant: HOECHST AG
Inventor： DURST FRANZ , HAAS RAIMUND , HULTZSCH GUENTER , DAMMANN MANFRED , MACK GERHARD , INTERTHAL WERNER , STROSZYNSKI JOACHIM , LEHMANN PETER
Abstract: An apparatus for drying a liquid layer deposited on a carrier material which is moved through a drying zone, which liquid layer contains evaporable solvent components and non-evaporable components, comprises a drying apparatus (1) with a drying channel (2), through which the carrier material band (4) runs in the longitudinal direction, on which band the liquid layer to be dried is deposited. The drying channel has a gas/air permeable channel covering surface (7), through which a gas flow, in particular a heated air flow, flows into the drying channel. The channel covering surface (7) is inclined in relation to the channel bottom surface (3) which runs horizontally. The drying channel (2) is adjoined by a gas exchange chamber (15) which contains a fan (12), the fan outlet (16) of which is directed towards a heat exchanger in a partition wall (10) between the gas exchange chamber (15) and a drying chamber (5) situated above the drying channel (2). The gas exchange chamber (15) contains a choke device (13 and 14 respectively) in its bottom surface (18) and in its upper gas inlet (19) respectively. The drying apparatus (1) further contains an exhausting fan (9) which is arranged above the covering surface of a through-channel (20) and is connected to the through-channel via a suction opening. In the outlet (11) of the exhausting fan (9) there is also a choke device (8). … …
-
9.发明专利
公开(公告)号：ZA9609602B
公开(公告)日：1998-05-15
申请号：ZA9609602
申请日：1996-11-15
Applicant: HOECHST AG
Inventor： ELSAESSER ANDREAS , HAAS RAIMUND , HULTZSCH GUENTER , LEHMANN PETER , NEUBAUER RUDOLF , ZERTANI RUDOLF
CPC classification number: B41N3/038 , G03F7/0226
-
10.发明专利
公开(公告)号：MX9605443A
公开(公告)日：1997-10-31
申请号：MX9605443
申请日：1996-11-07
Applicant: HOECHST AG
Inventor： ELSAESSER ANDREAS , HAAS RAIMUND , HULTZSCH GUENTER , LEHMANN PETER , NEUBAUER RUDOLF , ZERTANI RUDOLF
Abstract: Se describe un material de grabado sensible a la radiacion, que trabaja en positivo, para la produccion de placas de grabado planográfico, que comprende un soporte de aluminio y una capa sensible a la radiacion aplicada sobre él; en donde: el soporte de aluminio ha sido graneado en ácido nítrico, luego desgrasado en ácido sulfurico, anodizado en ácido sulfurico y, subsecuentemente, hidrofilizado con un compuesto que comprende por lo menos una unidad con un ácido fosfonico o un grupo fosfonato; y la capa sensible a la radiacion comprende: a) un éster sensible a la radiacion, de ácido 1,2-naftoquinona-2-diazida-4 o 5-sulfonico y un policondensado que tiene grupos hidroxi fenolicos; obteniéndose dicho policondensado haciendo reaccionar un compuesto fenolico con un aldehído o una cetona; b) una resina novolac o un producto de policondensacion obtenido haciendo reaccionar un polifenol con un aldehído o una cetona, como una resina soluble en álcali; c) un polímero del tipo vinílico, que comprende por lo menos una unidad que tiene un grupo hidroxifenilo lateral; d) un compuesto formador de clatrato; e) un compuesto de bajo peso molecular, que comprende por lo menos un átomo de hidrogeno ácido, y f) partículas de gel de sílice que tienen un diámetro máximo de 15 æm.
-
-
-
-
-
-
-
-
-
Search Results
16
records
(took 0.071 seconds)
