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    1.
    发明专利
    未知

    公开(公告)号：DE3584501D1

    公开(公告)日：1991-11-28

    申请号：DE3584501

    申请日：1985-10-21

    Applicant: HOECHST AG

    Inventor： MACK GERHARD DR DIPL CHEM ,  MUELLER BIRGIT ,  JUNG GUENTER ,  FRASS WERNER DR DIPL CHEM

    IPC: G03F7/26 ,  G03F7/32

    Abstract: A developer compsn. for developing an exposed negative working reproduction layer on a support comprises (i) water, (ii) at least one organic solvent, (iii) at least one alkaline reacting agent, (iv) at least one complex former, (v) at least one anionic surfactant, (vi) at least one emulsifier, (vii) at least one n-alkanoic acid and/or a salt of this and (viii) at least one buffer agent. Pref. (ii) is e.g. benzyl alcohol, phenoxyethanol, 1-phenylethanol, 2-phenylethanol or propyleneglycolmonomethylene. (viii) is e.g. a carbonate, phosphate, borate, alkali salts of glycine or an amine, esp. diethanolamine or triethanolamine. (v) is pref. an alka-, esp. Na octylsulphate, an alkali salt, pref. the Na salt of dodecylsulphonic acid, alkylphenolethersulphates, alkali-, esp. Na sulphosuccinates, alkyletherphosphates, alkali-, esp. Na oleic acid methyl tauride and condensed naphthalene sulphonates. (vi) is e.g. poly-N-vinyl -N-methylacetamide, water soluble copolymers of N-vinyl-N -methylacetamide, polyvinylalcohol, dextrin, gum arabic or cellulose ethers, esp. carboxymethylcellulose. (iv) is pref. a polyphosphate, esp. metaphosphate, or alkali salts of nitrilotriacetic acid or ethylenediamine tetraacetic acid. (vii) is pref. an n-alkanoic acid or salt with 8-12C, esp. caprylic acid, pelargonic acid, capric acid or lauric acid.

    2.
    发明专利
    未知

    公开(公告)号：DE58901137D1

    公开(公告)日：1992-05-21

    申请号：DE58901137

    申请日：1989-05-09

    Applicant: HOECHST AG

    Inventor： DURST FRANZ DR PROF ,  HAAS RAIMUND DR DIPL ING ,  HULTZSCH GUENTER DR ,  DAMMANN MANFRED DIPL ING ,  MACK GERHARD DR DIPL CHEM ,  INTERTHAL WERNER DR DIPL CHEM ,  STROSZYNSKI JOACHIM DIPL ING ,  LEHMANN PETER DR DIPL CHEM

    IPC: F26B3/02 ,  B05C9/14 ,  B05D3/02 ,  B05D3/04 ,  F26B13/10 ,  F26B21/00 ,  F26B21/12

    Abstract: An apparatus for drying a liquid layer deposited on a carrier material which is moved through a drying zone, which liquid layer contains evaporable solvent components and non-evaporable components, comprises a drying apparatus (1) with a drying channel (2), through which the carrier material band (4) runs in the longitudinal direction, on which band the liquid layer to be dried is deposited. The drying channel has a gas/air permeable channel covering surface (7), through which a gas flow, in particular a heated air flow, flows into the drying channel. The channel covering surface (7) is inclined in relation to the channel bottom surface (3) which runs horizontally. The drying channel (2) is adjoined by a gas exchange chamber (15) which contains a fan (12), the fan outlet (16) of which is directed towards a heat exchanger in a partition wall (10) between the gas exchange chamber (15) and a drying chamber (5) situated above the drying channel (2). The gas exchange chamber (15) contains a choke device (13 and 14 respectively) in its bottom surface (18) and in its upper gas inlet (19) respectively. The drying apparatus (1) further contains an exhausting fan (9) which is arranged above the covering surface of a through-channel (20) and is connected to the through-channel via a suction opening. In the outlet (11) of the exhausting fan (9) there is also a choke device (8). … …

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