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公开(公告)号:AT68892T
公开(公告)日:1991-11-15
申请号:AT85113310
申请日:1985-10-21
Applicant: HOECHST AG
Inventor: MACK GERHARD DR DIPL-CHEM , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER DR DIPL-CHEM
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公开(公告)号:FI854215A0
公开(公告)日:1985-10-28
申请号:FI854215
申请日:1985-10-28
Applicant: HOECHST AG
Inventor: MACK GERHARD , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER
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公开(公告)号:FI854215L
公开(公告)日:1986-05-01
申请号:FI854215
申请日:1985-10-28
Applicant: HOECHST AG
Inventor: MACK GERHARD , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER
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公开(公告)号:DE3584501D1
公开(公告)日:1991-11-28
申请号:DE3584501
申请日:1985-10-21
Applicant: HOECHST AG
Inventor: MACK GERHARD DR DIPL CHEM , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER DR DIPL CHEM
Abstract: A developer compsn. for developing an exposed negative working reproduction layer on a support comprises (i) water, (ii) at least one organic solvent, (iii) at least one alkaline reacting agent, (iv) at least one complex former, (v) at least one anionic surfactant, (vi) at least one emulsifier, (vii) at least one n-alkanoic acid and/or a salt of this and (viii) at least one buffer agent. Pref. (ii) is e.g. benzyl alcohol, phenoxyethanol, 1-phenylethanol, 2-phenylethanol or propyleneglycolmonomethylene. (viii) is e.g. a carbonate, phosphate, borate, alkali salts of glycine or an amine, esp. diethanolamine or triethanolamine. (v) is pref. an alka-, esp. Na octylsulphate, an alkali salt, pref. the Na salt of dodecylsulphonic acid, alkylphenolethersulphates, alkali-, esp. Na sulphosuccinates, alkyletherphosphates, alkali-, esp. Na oleic acid methyl tauride and condensed naphthalene sulphonates. (vi) is e.g. poly-N-vinyl -N-methylacetamide, water soluble copolymers of N-vinyl-N -methylacetamide, polyvinylalcohol, dextrin, gum arabic or cellulose ethers, esp. carboxymethylcellulose. (iv) is pref. a polyphosphate, esp. metaphosphate, or alkali salts of nitrilotriacetic acid or ethylenediamine tetraacetic acid. (vii) is pref. an n-alkanoic acid or salt with 8-12C, esp. caprylic acid, pelargonic acid, capric acid or lauric acid.
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公开(公告)号:AU578982B2
公开(公告)日:1988-11-10
申请号:AU4917685
申请日:1985-10-29
Applicant: HOECHST AG
Inventor: MACK GERHARD , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER
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公开(公告)号:ZA8508130B
公开(公告)日:1986-06-25
申请号:ZA8508130
申请日:1985-10-23
Applicant: HOECHST AG
Inventor: MACK GERHARD , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER
CPC classification number: G03F7/322
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公开(公告)号:FI83457C
公开(公告)日:1991-07-10
申请号:FI854215
申请日:1985-10-28
Applicant: HOECHST AG
Inventor: MACK GERHARD , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER
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公开(公告)号:ZA858130B
公开(公告)日:1986-06-25
申请号:ZA858130
申请日:1985-10-23
Applicant: HOECHST AG
Inventor: MACK GERHARD , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER
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公开(公告)号:AU4917685A
公开(公告)日:1986-05-08
申请号:AU4917685
申请日:1985-10-29
Applicant: HOECHST AG
Inventor: MACK GERHARD , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER
Abstract: A developer for negative-working reproduction layers and process therefor. The developer includes water, an organic solvent, a surface-active agent, an alkaline agent, a complexing agent, a buffer substance, an emulsifier and an n-alkanoic compound. Use of the developer suppresses speck and fibril formation in the developing process, and can be used in reproduction layers which optionally contain a binder.
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公开(公告)号:FI83457B
公开(公告)日:1991-03-28
申请号:FI854215
申请日:1985-10-28
Applicant: HOECHST AG
Inventor: MACK GERHARD , MUELLER BIRGIT , JUNG GUENTER , FRASS WERNER
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