公开(公告)号：ZA9000795B

公开(公告)日：1990-10-31

申请号：ZA9000795

申请日：1990-02-02

Applicant: HOECHST AG

Inventor： KAEMPF GUENTHER ,  GUENTHER KAEMPF ,  SCHEUNEMANN UDE ,  UDE SCHEUNEMANN ,  FELDHUES MICHAEL ,  MICHAEL FELDHUES ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: G03F7/004 ,  C08G61/10 ,  C08G61/12 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  G03F ,  C09D ,  C25B ,  H01L

CPC classification number: G03F7/027 ,  G03F7/032

公开(公告)号：ZA90795B

公开(公告)日：1990-10-31

申请号：ZA90795

申请日：1990-02-02

Applicant: HOECHST AG

Inventor： KAEMPF GUENTHER ,  GUENTHER KAEMPF ,  SCHEUNEMANN UDE ,  UDE SCHEUNEMANN ,  FELDHUES MICHAEL ,  MICHAEL FELDHUES ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: G03F7/004 ,  C08G61/10 ,  C08G61/12 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  G03F ,  C25B ,  H01L ,  C09D

Abstract: Standard polymers which are sensitive to ionising radiation and are used to produce resists cause electrostatic charges on irradiation and, consequently, fields which can be avoided by the resist composition according to the invention. A soluble, electrically conductive oligomer or polymer is added to the polymer. … …