公开(公告)号：ZA9001797B

公开(公告)日：1990-11-28

申请号：ZA9001797

申请日：1990-03-08

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027 ,  G03F

CPC classification number: G03F7/0045

公开(公告)号：ZA901796B

公开(公告)日：1990-11-28

申请号：ZA901796

申请日：1990-03-08

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOSCKI GEORG ,  GEORG PAWLOSCKI ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/039 ,  C07C271/28 ,  C07C275/50 ,  C08K5/00 ,  C08L61/00 ,  C08L61/04 ,  G03F7/004 ,  H01L21/027 ,  G03F

Abstract: A radiation-curable mixture is proposed which contains a compound which forms an acid when exposed to high-energy radiation and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa of less than 12 or is a derivative of a compound having such a pKa, which derivative can be converted into the free compound by acid catalysis. The composition claimed, and in particular the recording material prepared therefrom, has a higher sensitivity and an improved resolution, and in addition exhibits no image haze after development.

公开(公告)号：ZA9000795B

公开(公告)日：1990-10-31

申请号：ZA9000795

申请日：1990-02-02

Applicant: HOECHST AG

Inventor： KAEMPF GUENTHER ,  GUENTHER KAEMPF ,  SCHEUNEMANN UDE ,  UDE SCHEUNEMANN ,  FELDHUES MICHAEL ,  MICHAEL FELDHUES ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: G03F7/004 ,  C08G61/10 ,  C08G61/12 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  G03F ,  C09D ,  C25B ,  H01L

CPC classification number: G03F7/027 ,  G03F7/032

公开(公告)号：ZA901797B

公开(公告)日：1990-11-28

申请号：ZA901797

申请日：1990-03-08

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F

Abstract: A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12 or is a derivative of a compound having such a pKa value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

公开(公告)号：ZA8904743B

公开(公告)日：1990-04-25

申请号：ZA8904743

申请日：1989-06-22

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  DOESSEL KARL-FRIEDRICH ,  KARL-FRIEDRICH DOESSEL ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30 ,  G03F ,  G03C

CPC classification number: G03F7/0295 ,  G03F7/0045

公开(公告)号：ZA9001796B

公开(公告)日：1990-11-28

申请号：ZA9001796

申请日：1990-03-08

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOSCKI GEORG ,  GEORG PAWLOSCKI ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/039 ,  C07C271/28 ,  C07C275/50 ,  C08K5/00 ,  C08L61/00 ,  C08L61/04 ,  G03F7/004 ,  H01L21/027 ,  G03F

CPC classification number: G03F7/0045 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/126

公开(公告)号：ZA90795B

公开(公告)日：1990-10-31

申请号：ZA90795

申请日：1990-02-02

Applicant: HOECHST AG

Inventor： KAEMPF GUENTHER ,  GUENTHER KAEMPF ,  SCHEUNEMANN UDE ,  UDE SCHEUNEMANN ,  FELDHUES MICHAEL ,  MICHAEL FELDHUES ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: G03F7/004 ,  C08G61/10 ,  C08G61/12 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  G03F ,  C25B ,  H01L ,  C09D

Abstract: Standard polymers which are sensitive to ionising radiation and are used to produce resists cause electrostatic charges on irradiation and, consequently, fields which can be avoided by the resist composition according to the invention. A soluble, electrically conductive oligomer or polymer is added to the polymer. … …

公开(公告)号：ZA894743B

公开(公告)日：1990-04-25

申请号：ZA894743

申请日：1989-06-22

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  DOESSEL KARL-FRIEDRICH ,  KARL-FRIEDRICH DOESSEL ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30 ,  G03F ,  G03C

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.