PHOTOACTIVE COMPOUNDS
    1.
    发明申请
    PHOTOACTIVE COMPOUNDS 审中-公开
    光化合物

    公开(公告)号:WO1996024886A1

    公开(公告)日:1996-08-15

    申请号:PCT/US1996001837

    申请日:1996-02-09

    CPC classification number: G03F7/022

    Abstract: A photosensitizer comprising a trishydroxyphenylethane 80/20 to 50/50 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone 0/100 to 20/80 2,1,5-/2,1,4-diazonaphthoquinone sulfate, and a photoresist composition containing such photosensitizer, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.

    Abstract translation: 一种光敏剂,其包含三羟基苯基乙烷80/20至50/50 2,1,5- / 2,1,4-重氮萘醌磺酸盐和三羟基二苯甲酮0/100至20/80 2,1,5- / 2,1,4 和含有这种光敏剂的光致抗蚀剂组合物,光敏剂存在于光致抗蚀剂组合物中,其量足以使光致抗蚀剂组合物均匀地光敏化; 和水不溶性的碱溶性酚醛清漆树脂,所述酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物的量存在于光致抗蚀剂组合物中。

    PHOTOACTIVE COMPOUNDS
    2.
    发明公开

    公开(公告)号:EP0808480A1

    公开(公告)日:1997-11-26

    申请号:EP96905454.0

    申请日:1996-02-09

    IPC: G03F7

    CPC classification number: G03F7/022

    Abstract: A photosensitizer comprising a trishydroxyphenylethane 80/20 to 50/50 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone 0/100 to 20/80 2,1,5-/2,1,4-diazonaphthoquinone sulfate, and a photoresist composition containing such photosensitizer, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.

    Abstract translation: 包含三羟基苯基乙烷80/20至50/50 2,1,5- / 2,1,4-重氮基萘醌磺酸盐和三羟基二苯甲酮0/100至20/80 2,1,5- / 2,1,4的光敏剂 - 二偶氮萘醌硫酸盐和含有这种光敏剂的光刻胶组合物,光敏剂以足以使光刻胶组合物均匀光敏化的量存在于光刻胶组合物中; 和不溶于水的碱溶性酚醛清漆树脂,酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物的量存在于光致抗蚀剂组合物中。

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