公开(公告)号：DE102009030299A1

公开(公告)日：2009-12-31

申请号：DE102009030299

申请日：2009-06-24

Applicant: HOYA CORP

Inventor： OKUBO YASUSHI ,  KASAHARA HISASHI

IPC: G03F1/24 ,  G03F1/38 ,  H01L21/027

Abstract: A photomask manufacturing method includes a defect information storage step of storing defect information of a mask blank, provided with an identification marker on an end face thereof, into an information storage device in correspondence to the identification marker, a placing orientation determination step of determining a placing orientation of the mask blank with respect to an exposure/writing apparatus, and an orientation correction step of performing rotation control of a rotating apparatus so that an orientation of the mask blank coincides with the determined placing orientation.

公开(公告)号：DE102009025011A1

公开(公告)日：2009-12-31

申请号：DE102009025011

申请日：2009-06-16

Applicant: HOYA CORP

Inventor： KASAHARA HISASHI ,  OKUBO YASUSHI

IPC: C03C23/00 ,  G03F1/50 ,  G03F1/60

Abstract: A mask blank glass substrate is for use in manufacturing a mask blank. In the mask blank glass substrate, a marker expressing, by a plurality of pits, information for identifying or managing the mask blank glass substrate is formed on a surface of a region, having no influence on formation of a transfer pattern, of the mask blank glass substrate. Each of the pits forming the marker is a round hole with its edge portion being generally circular and a distance L1 between the edge portions of the adjacent pits is 50 μm or more. The marker is formed, for example, on an end face of the mask blank glass substrate.

公开(公告)号：JP2010002443A

公开(公告)日：2010-01-07

申请号：JP2008158765

申请日：2008-06-18

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： KASAHARA HISASHI ,  OKUBO YASUSHI

IPC: C03C23/00 ,  G03F1/50 ,  G03F1/60

CPC classification number: G03F1/38 ,  G03F1/60

Abstract: PROBLEM TO BE SOLVED: To appropriately form a marker, which is not likely to cause dust, to a glass substrate for a mask blank. SOLUTION: This glass substrate is used for manufacturing a mask blank. The marker 18 indicating the information for identifying or managing the glass substrate on the surface of a region which is not affected when producing a transfer pattern of the glass substrate by a plurality of recessed parts 20. Each of the recessed parts 20 forming the marker 18 includes an approximately circular round hole on the edge, and the distance L1 between the edges of adjoining recessed parts 20 is 50 μm or more. The marker 18 is formed on the end face of the glass substrate for the mask blank, for example. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了适当地形成不容易引起灰尘的标记物到掩模板的玻璃基板。

解决方案：该玻璃基板用于制造掩模板。 标记18，指示当通过多个凹部20生成玻璃基板的转印图案时，在不影响的区域的表面上识别或管理玻璃基板的信息。形成标记18的各凹部20 在边缘上包括大致圆形的圆形孔，相邻的凹部20的边缘之间的距离L1为50μm以上。 标记18例如形成在用于掩模坯料的玻璃基板的端面上。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JPS6216528A

公开(公告)日：1987-01-24

申请号：JP15628785

申请日：1985-07-16

Applicant: HOYA CORP

Inventor： USHIDA MASAO ,  KASAHARA HISASHI

IPC: H01L21/66 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To cut down the manhours needed by a method wherein the resist developing process, which is divided into two processes when an Al pattern is formed, and an etching process is performed in the same process by adhering an Al film on one main surface of a light-transmitting substrate. CONSTITUTION:The substrate 3 with an Al film is manufactured by forming an Al film 2, as a light-transmitting film, on one main surface of a light- transmitting substrate 1 by performing a sputtering method. A positive type photoresist 4 is applied on the Al film 2 of the substrate 3 having an Al film using a spin-coating method, and a positive photoresist 4 is exposed through an exposure mask 5 having a pattern. Then, the positive type photoresist 4 is developed by performing an immersion method using a developing solution exclusively used for the positive type photoresist 4, and after the exposed part of the resist is removed, an Al pattern 8 is formed by etching a resist pattern 7 and the Al film part located under the resist pattern 7. Then, the resist pattern 7 located on the Al pattern 8 is exfoliated using an exfoliating solution, and the substrate 9 with the Al pattern 8 is manufactured.

公开(公告)号：JP2012190044A

公开(公告)日：2012-10-04

申请号：JP2012117218

申请日：2012-05-23

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： KURIKAWA AKINORI ,  KASAHARA HISASHI ,  OKUBO YASUSHI

IPC: G03F1/38 ,  C03C23/00 ,  G03F1/50 ,  G03F1/60

Abstract: PROBLEM TO BE SOLVED: To appropriately form a marker on a mask blanks.SOLUTION: A mask blanks 10 is formed of a glass substrate 12 and a mask pattern thin film 14 formed on the glass substrate 12. The glass substrate 12 is formed on a mirror-like surface by irradiation of laser light, and includes a recessed part 20 used as a marker 18. The recessed part 20 is formed, in the glass substrate 12 on an end face orthogonal to the main surface in which the thin film to be a transfer pattern is formed, on an area trimmed by 1.2 mm from both sides of the main surface and an area within 10 mm from the four corners of the glass substrate 12. The marker 18 represents unique identification information, identification symbol, or management symbol of the mask blanks 10.

Abstract translation: 要解决的问题：适当地在掩模坯料上形成标记。 解决方案：掩模坯料10由玻璃基板12和形成在玻璃基板12上的掩模图案薄膜14形成。玻璃基板12通过照射激光形成在镜面上，并且包括 用作标记18的凹部20.凹部20在与形成有转印图案的薄膜的主表面正交的端面上的玻璃基板12上形成在由1.2 mm，距离玻璃基板12的四个角的距离为10mm以内的区域。标记18表示掩模毛坯10的唯一识别信息，识别符号或管理符号。＆lt; COPYRIGHT（（ C）2013，JPO＆INPIT

公开(公告)号：JP2010008738A

公开(公告)日：2010-01-14

申请号：JP2008168239

申请日：2008-06-27

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： OKUBO YASUSHI ,  KASAHARA HISASHI

IPC: G03F1/24 ,  G03F1/38 ,  H01L21/027

CPC classification number: G03F1/42

Abstract: PROBLEM TO BE SOLVED: To appropriately automating the manufacturing process of a photomask. SOLUTION: A method for manufacturing a photomask is disclosed, including disposing a mask blank 10 on a mounting section of a rotating device, disposing the mask blank 10 on an exposure drawing machine 102 while controlling the direction of the mask blank 10 by the rotating device, and exposing and drawing an image. The method further includes: a defect information storing step of storing defect information in the mask blank having an identification marker 18 provided on an end face 22a, into an information storing device in association with the identification marker 18; a placement direction determining step of determining a placement direction of the mask blank 10 with respect to the exposure drawing machine 102; and a direction correcting step of controlling the rotation of the rotating device so as to control the direction of the mask blank to the determined placement direction. The placement direction determining step includes detecting the identification marker 18 of the mask blank by a detector, inquiring to the information storing device to obtain the defect information, and determining the placement direction based on the drawing information and defect information of the mask pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：适当地自动化光掩模的制造过程。 公开了一种制造光掩模的方法，包括将掩模坯料10设置在旋转装置的安装部分上，将掩模坯料10设置在曝光拉伸机102上，同时通过掩模坯料10的方向控制掩模坯料10的方向 旋转装置，以及曝光和绘制图像。 该方法还包括：缺陷信息存储步骤，将缺陷信息存储在具有设置在端面22a上的识别标记18的掩模坯料中，并与识别标记18相关联地存储到信息存储装置中; 确定掩模坯料10相对于曝光拉伸机102的放置方向的放置方向确定步骤; 以及方向校正步骤，用于控制旋转装置的旋转，以便将掩模坯料的方向控制到所确定的放置方向。 放置方向确定步骤包括通过检测器检测掩模空白的识别标记18，询问信息存储装置以获得缺陷信息，并且基于掩模图案的绘制信息和缺陷信息来确定放置方向。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007086363A

公开(公告)日：2007-04-05

申请号：JP2005274544

申请日：2005-09-21

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： KURIKAWA AKINORI ,  KASAHARA HISASHI

IPC: B65D6/10 ,  B65D81/30 ,  B65D85/86 ,  G03F1/50 ,  G03F1/66 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a mask blank housing case that has both of visibility for checking inside the case and light shielding property suitable for a mask blank having a resist film formed thereon and can maintain stable resist performance for forming a desired mask pattern. SOLUTION: The mask blank housing case is used for housing a mask blank having at least a thin film for forming a transfer pattern on a substrate, wherein at least a part of the case has a light transmitting property in such a content that the housed material is visible from outside the case, and substantially blocks light at a wavelength of 550 nm or shorter. The housing case substantially transmits light at a wavelength of 600 nm or longer. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种掩模坯体壳体，其具有用于检查壳体内部的可视性和适合于其上形成有抗蚀剂膜的掩模坯料的遮光性，并且可以保持稳定的抗蚀剂性能以形成期望的 掩模图案。 解决方案：掩模坯体壳体用于容纳具有至少一薄膜的掩模坯料，以在衬底上形成转印图案，其中至少一部分壳体具有透光性，其含量为 容纳材料从外壳可见，并且基本上阻挡波长为550nm或更短的光。 外壳基本上透过600nm以上的波长的光。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2011170359A

公开(公告)日：2011-09-01

申请号：JP2011037924

申请日：2011-02-24

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： KASAHARA HISASHI ,  OKUBO YASUSHI

IPC: B23K26/00 ,  B23K26/38 ,  C03C15/00 ,  C03C23/00 ,  G03F1/38 ,  G03F1/50

Abstract: PROBLEM TO BE SOLVED: To properly form a marker less liable to cause dust generation on a mask blank glass substrate. SOLUTION: A mask blank glass substrate used in the manufacture of a mask blank is prepared and a marker 18 expressing information for identifying or managing the mask blank glass substrate in a plurality of recesses 20 is formed on the surface of a region of the mask blank glass substrate having no influence on the fabrication of a transfer pattern. The recesses 20 constituting the marker 18 are round pits having substantially circular edges, and the interval L1 between the adjacent recesses 20 is ≥50 μm. The marker 18 is formed, e.g., on an end face of the mask blank glass substrate. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：适当地形成在掩模坯料玻璃基板上不太容易产生灰尘的标记。 ＆lt; P＆gt;解决方案：制备用于制造掩模坯料的掩模坯料玻璃基板，并且在多个凹部20的表面上形成表示用于识别或管理多个凹部20中的掩模坯料玻璃基板的信息的标记18 掩模坯料玻璃基板对转印图案的制造没有影响。 构成标记18的凹部20是具有大致圆形边缘的圆形凹坑，相邻的凹部20之间的间隔L1为≥50μm。 标记18例如形成在掩模坯料玻璃基板的端面上。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011070214A

公开(公告)日：2011-04-07

申请号：JP2010254757

申请日：2010-11-15

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： KURIKAWA AKINORI ,  KASAHARA HISASHI ,  OKUBO YASUSHI

IPC: C03C23/00 ,  G03F1/50 ,  G03F1/60

Abstract: PROBLEM TO BE SOLVED: To form a marker that seldom induces dust on a glass substrate for a mask blank. SOLUTION: A method of manufacturing a mask blank glass substrate 12 includes a marking step where a recess 20 to be used as a marker for identifying or managing the mask blank glass substrate 12 is formed by irradiating a mirror-like surface with a laser beam in an area having no influence on transfer on a surface of the glass substrate 12. The method further includes a step of preparing substrate information about the glass substrate 12, in which the marker is correlated with the substrate information about the glass substrate 12. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：形成很少在掩模板的玻璃基板上引起灰尘的标记。 解决方案：制造掩模坯料玻璃基板12的方法包括标记步骤，其中用作识别或管理掩模坯料玻璃基板12的标记的凹部20是通过将镜面状表面照射 激光束在不影响玻璃基板12的表面上的转印的区域中。该方法还包括准备与玻璃基板12相关的玻璃基板12的基板信息的步骤，其中标记与玻璃基板12的基板信息相关 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2007091296A

公开(公告)日：2007-04-12

申请号：JP2005285293

申请日：2005-09-29

Applicant: Hakuto Co Ltd ,  Hoya Corp ,  Hoya株式会社 ,  伯東株式会社

Inventor： KASAHARA HISASHI ,  KURIKAWA AKINORI ,  KAWASHIMA HIDEAKI

IPC: B65D25/02 ,  B65D51/16 ,  B65D85/86 ,  G03F1/50 ,  G03F1/66

Abstract: PROBLEM TO BE SOLVED: To provide a mask blank storage container which prevents contamination by a foreign matter such as a chemical material accompanying the ingress of exterior air, stores a mask blank, etc. keeping a clean atmosphere and prevents the ingress of exterior light. SOLUTION: This storage container provided with a container main body with an open top and a lid to cover the main body stores inside a mask blank having a resist film. A vent hole is formed in the corner of the lid to let exterior air through, and a filter member 6 is mounted on the vent on the container inner side. When exterior air comes in through the vent, a foreign matter such as a chemical material contained in the air is removed by the member 6. When exterior light comes in from the vent, the filter member 6 prevents the light from coming into the container by shifting the optical path not to be linear in the member 6. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供防止外来物质等异物（伴随外部空气进入的化学物质）的污染的掩模空白存储容器，存储保持清洁的气氛的掩模坯料等，并防止 外部光线 解决方案：该容器主体具有敞开的顶部和覆盖主体的盖子，存储在具有抗蚀剂膜的掩模坯料内部。 在盖的角部形成通气孔，使外部空气通过，过滤构件6安装在容器内侧的排气口上。 当外部空气通过排气口进入时，构件6除去包含在空气中的化学物质的异物。当外部光从通风口进入时，过滤构件6防止光通过 将光路不在线路上移动。6.版权所有（C）2007，JPO＆INPIT