公开(公告)号：KR20100087263A

公开(公告)日：2010-08-04

申请号：KR20100006515

申请日：2010-01-25

Applicant: HOYA CORP

Inventor： KAWAMORI MASANORI ,  SANO MICHIAKI

IPC: G03F1/60 ,  G03F1/72 ,  H01L21/027

CPC classification number: G03F1/72 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/70958

Abstract: PURPOSE: A method for modifying a photomask and the photomask which is modified using the same are provided to enable a damaged part to be transparent to pattern transfer wavelengths by making a hardened part have a light transmission rate and a refractive index same as a glass substrate and to prevent diffused reflection on the damaged part. CONSTITUTION: A method for modifying a photomask comprises a step of spreading liquid glass(3) on a damaged part(1a) of the photomask(1) which is manufactured using a glass substrate and a step of hardening the liquid glass. The liquid glass is tetraethyl orthosilicate or a spin on glass material. The liquid glass is hardened using heat or ultraviolet ray(4). The liquid glass is spread on a concave part after forming the concave part by eliminating the damaged part of the photomask.

Abstract translation: 目的：提供一种修改光掩模的方法和使用其进行修改的光掩模，以通过使硬化部件具有与玻璃基板相同的透光率和折射率来使受损部件对图案转移波长透明化 并防止损坏部件上的扩散反射。 构成：修改光掩模的方法包括将液态玻璃（3）放置在使用玻璃基板制造的光掩模（1）的损坏部分（1a）和硬化液体玻璃的步骤。 液体玻璃是原硅酸四乙酯或玻璃材料上的旋涂。 液体玻璃用热或紫外线硬化（4）。 通过消除光掩模的损坏部分，在形成凹部之后，将液体玻璃铺展在凹部上。

公开(公告)号：JP2011081282A

公开(公告)日：2011-04-21

申请号：JP2009234847

申请日：2009-10-09

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： SAKAMOTO YUJI ,  KAWAMORI MASANORI

IPC: G03F1/72 ,  G03F1/82 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for correcting defects of a photomask which stably and reliably corrects various types of defects caused by foreign substances, based on materials, shapes, sizes and adhesive degrees. SOLUTION: The defect correction method for a photomask includes removing a foreign matter defect on a photomask by use of a plurality of probes. That is, a foreign substance defect on a photomask is removed and corrected by preparing a plurality of probes, simultaneously bringing at least two probes into contact with a foreign substance on a photomask surface, holding the foreign substance at least at three different positions, and parting the foreign substance away from the photomask surface. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种校正基于材料，形状，尺寸和粘合度稳定可靠地校正由异物引起的各种类型的缺陷的光掩模的缺陷的方法。 解决方案：光掩模的缺陷校正方法包括通过使用多个探针去除光掩模上的异物缺陷。 也就是说，通过制备多个探针去除并矫正光掩模上的异物缺陷，同时使至少两个探针与光掩模表面上的异物接触，将异物保持在至少三个不同的位置，并且 将外来物质与光掩模表面分开。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010170011A

公开(公告)日：2010-08-05

申请号：JP2009014136

申请日：2009-01-26

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： KAWAMORI MASANORI ,  SANO MICHIAKI

IPC: G03F1/60 ,  G03F1/72

Abstract: PROBLEM TO BE SOLVED: To provide a method of correcting a photomask, in which diffuse reflection in a flaw portion on the backside can be prevented in an exposure process and even a flaw portion can be changed into transparent to the wavelength in a transfer process.
SOLUTION: The method of correcting the photomask includes steps of: applying a liquid glass 3 on a flaw 1a present on the backside of a photomask 1, the liquid glass to become a glass having a light transmittance of ≥70% and a refractive index of at least 1.4 after cured; and curing the liquid glass 3.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种校正光掩模的方法，其中可以在曝光过程中防止在背面上的缺陷部分中的漫反射，并且甚至瑕疵部分可以变为对于 转移过程。 解决方案：修正光掩模的方法包括以下步骤：将液体玻璃3施加在存在于光掩模1背面的缺陷1a上，液晶玻璃成为透光率≥70％的玻璃和 固化后折射率至少为1.4; 并固化液体玻璃3.版权所有（C）2010，JPO＆INPIT