公开(公告)号：KR20100061435A

公开(公告)日：2010-06-07

申请号：KR20100046664

申请日：2010-05-18

Applicant: HOYA CORP

Inventor： SANO MICHIAKI ,  IMURA KAZUHISA ,  MITSUI MASARU

IPC: G03F1/50 ,  G03F1/54 ,  G03F1/76 ,  H01L21/027

CPC classification number: G03F1/54 ,  G03F1/08 ,  G03F1/32 ,  G03F1/50 ,  G03F1/76 ,  H01L21/0276

Abstract: PURPOSE: A gray tone mask blank, a manufacturing method of a gray tone mask using thereof, the gray tone mask, and a pattern transferring method using thereof are provided to obtain an accurate CD of a pattern formed on a mask, and to reduce the change of the pattern. CONSTITUTION: A gray tone mask blank comprises the following: a light-shielding layer(25) pattern formed on a transparent substrate(24); a semi-transparent layer(26) in the front side of the light-shielding layer; and a resist film(27) formed on the semi-transparent layer. The composition of the light-shielding layer changes to the film thickness direction. The surface reflection ratio of the resist film reduces for a laser lithography light with the wavelength of 300~450 nanometers.

Abstract translation: 目的：提供灰色调掩模空白，使用其的灰度调色掩模的制造方法，灰度色调掩模和使用其的图案转印方法，以获得在掩模上形成的图案的精确的CD，并且减少 模式的变化 构成：灰色掩模坯料包括：形成在透明基板（24）上的遮光层（25）图案; 在遮光层的前侧的半透明层（26）; 和形成在半透明层上的抗蚀剂膜（27）。 遮光层的组成变为膜厚方向。 对于波长为300〜450纳米的激光光刻光，抗蚀剂膜的表面反射率降低。

公开(公告)号：KR20100087263A

公开(公告)日：2010-08-04

申请号：KR20100006515

申请日：2010-01-25

Applicant: HOYA CORP

Inventor： KAWAMORI MASANORI ,  SANO MICHIAKI

IPC: G03F1/60 ,  G03F1/72 ,  H01L21/027

CPC classification number: G03F1/72 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/70958

Abstract: PURPOSE: A method for modifying a photomask and the photomask which is modified using the same are provided to enable a damaged part to be transparent to pattern transfer wavelengths by making a hardened part have a light transmission rate and a refractive index same as a glass substrate and to prevent diffused reflection on the damaged part. CONSTITUTION: A method for modifying a photomask comprises a step of spreading liquid glass(3) on a damaged part(1a) of the photomask(1) which is manufactured using a glass substrate and a step of hardening the liquid glass. The liquid glass is tetraethyl orthosilicate or a spin on glass material. The liquid glass is hardened using heat or ultraviolet ray(4). The liquid glass is spread on a concave part after forming the concave part by eliminating the damaged part of the photomask.

Abstract translation: 目的：提供一种修改光掩模的方法和使用其进行修改的光掩模，以通过使硬化部件具有与玻璃基板相同的透光率和折射率来使受损部件对图案转移波长透明化 并防止损坏部件上的扩散反射。 构成：修改光掩模的方法包括将液态玻璃（3）放置在使用玻璃基板制造的光掩模（1）的损坏部分（1a）和硬化液体玻璃的步骤。 液体玻璃是原硅酸四乙酯或玻璃材料上的旋涂。 液体玻璃用热或紫外线硬化（4）。 通过消除光掩模的损坏部分，在形成凹部之后，将液体玻璃铺展在凹部上。

公开(公告)号：JP2010266877A

公开(公告)日：2010-11-25

申请号：JP2010140630

申请日：2010-06-21

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： SANO MICHIAKI

IPC: G02F1/1368 ,  G03F1/54 ,  G03F1/58 ,  G03F1/68 ,  G03F1/80 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a five-gradation photomask that is manufactured with a small number of translucent films and a small number of drawing times.
SOLUTION: The five-gradation photomask includes a mask pattern composed of a light shielding part 12, a translucent part 11, a first translucent part 13A, a second translucent part 13B, and a third translucent part 13C on a transparent substrate 14. The light shielding part 11 is formed of at least a light-shielding film formed on the transparent substrate 14; the translucent part 11 is formed of an exposed part of the transparent substrate 14; and each of the first translucent part 13A, second translucent part 13B and third translucent part 13C is formed of one of a first translucent film 16, a second translucent film 17, which are formed on the transparent substrate 14 and have transmittances to exposure light inherent to the respective films different from each other, and a laminated film of the first translucent film 16 and the second translucent film 17. Two in the first translucent part 13A, second translucent part 13B, and third translucent part 13C are patterns having the same effective transmittance but different line widths from each other.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供用少量半透明膜制造并且少量拉伸时间的五级色光掩模。 解决方案：五层次光掩模包括在透明基板14上由遮光部分12，半透明部分11，第一半透明部分13A，第二半透明部分13B和第三半透明部分13C组成的掩模图案 遮光部11由至少形成在透明基板14上的遮光膜形成， 半透明部分11由透明基板14的暴露部分形成; 并且第一透光部13A，第二透光部13B和第三半透明部13C中的每一个由形成在透明基板14上并且具有固有的曝光光的透射率的第一半透明膜16，第二半透明膜17中的一个形成 与第一透光性膜16和第二透光性膜17的层叠膜相互不同的膜。另外，在第一透光性部13A，第二透光性部13B以及第三半透明部13C中，两者具有相同的效果 透光率，但是彼此不同的线宽。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010079112A

公开(公告)日：2010-04-08

申请号：JP2008249371

申请日：2008-09-28

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： SANO MICHIAKI

IPC: G03F1/76 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a photomask in which pattern defects arising from defects of a photomask blank are preferably reduced.
SOLUTION: The method of manufacturing a photomask determines a drawing position of a transfer pattern so that, in a drawing step, at least a part of the defects existing in a thin film of the photomask blank and/or a surface of a resist film is within an area of the transfer pattern and the defects of the part disappear after etching processing on the basis of defect information of the photomask blank grasped beforehand.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制造光掩模的方法，其中优选地减少由光掩模坯料的缺陷引起的图案缺陷。 解决方案：制造光掩模的方法确定转印图案的绘制位置，使得在拉伸步骤中，存在于光掩模坯料的薄膜中的至少一部分缺陷和/或 抗蚀剂膜在转印图案的区域内，并且基于预先掌握的光掩模坯的缺陷信息，蚀刻处理后部件的缺陷消失。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009294682A

公开(公告)日：2009-12-17

申请号：JP2009218490

申请日：2009-09-24

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： MITSUI MASARU ,  SANO MICHIAKI ,  USHIDA MASAO

IPC: G03F1/50 ,  G03F1/54

Abstract: PROBLEM TO BE SOLVED: To provide a mask blank and a photomask suitable for processes in a large mask for a FPD (flat panel display) (for example, a resist application method, an etching method and a cleaning method). SOLUTION: The mask blank for manufacturing a FPD device includes at least one of a light-shielding film and a semi-translucent film having a function of adjusting the transmission quantity on a light-transmitting substrate. A root mean square roughness Rq on the film surface of the light-shielding film and the semi-translucent film is not more than 2.0 nm. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供适用于FPD（平板显示器）的大掩模（例如，抗蚀剂施加方法，蚀刻方法和清洁方法）中的工艺的掩模毛坯和光掩模。 解决方案：用于制造FPD器件的掩模板包括具有调节透光衬底上的透射量的功能的遮光膜和半透明膜中的至少一种。 遮光膜和半透明膜的膜表面上的均方根粗糙度Rq不大于2.0nm。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009229893A

公开(公告)日：2009-10-08

申请号：JP2008076165

申请日：2008-03-24

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： SANO MICHIAKI ,  IMURA KAZUHISA

IPC: G03F1/00 ,  G03F1/68 ,  G03F1/80

Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a multi-gradation photomask that has small restriction on selection of a material for a light shield film. SOLUTION: In the method of manufacturing the multi-gradation photomask, having the light-shielding film 2 and a translucent film 4 on a transparent substrate 1, since the shape of the translucent film 4 is formed by a lift-off to eliminate an etching stage for the translucent film 4, there is no need for the light-shielding film 2 to have resistance for an etching gas or an etchant of the translucent film 4, so that restrictions regarding the selection of a material for the light-shielding film 2 becomes few. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制造对于遮光膜的材料的选择具有较小限制的多层次光掩模的方法。 解决方案：在透明基板1上具有遮光膜2和半透明膜4的多层次光掩模的制造方法中，由于透光性膜4的形状通过剥离形成 消除半导体膜4的蚀刻阶段，不需要遮光膜2对半导体膜4的蚀刻气体或蚀刻剂具有阻力，因此对于用于发光的材料的选择的限制， 屏蔽膜2变少。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009204934A

公开(公告)日：2009-09-10

申请号：JP2008047670

申请日：2008-02-28

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： SANO MICHIAKI

IPC: G03F1/54 ,  G03F1/58 ,  G03F1/68 ,  G03F1/80

Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method for a five-gradation photomask, manufactured with a reduced film number of translucent film and a reduced drawing frequency. SOLUTION: The manufacturing method has a process for preparing a photomask blank having a first translucent film and a light shield film with etching selectability, in this order, on a transparent substrate, a process for forming a first resist pattern on the light shield film, a process for etching the light shield film, using the first resist pattern as a mask, to carry out the first patterning, a process for removing the first resist pattern and for forming a second resist pattern, a process for etching the first translucent film, using the second resist pattern as a mask, to carry out the second patterning, a process for removing the second resist pattern and for forming the first translucent film and an etching-selectable second translucent film, on the whole substrate face, a process for forming a third resist pattern on the second translucent film, and a process for etching the second translucent film, using the third resist pattern as a mask, to carry out the third patterning. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制造半透明膜的薄膜数量和缩短绘制频率的五级光掩模的制造方法。 解决方案：制造方法具有制备具有第一半透明膜和具有蚀刻选择性的遮光膜的光掩模坯料的方法，依次在透明基板上，在光上形成第一抗蚀剂图案的工艺 屏蔽膜，使用第一抗蚀剂图案作为掩模来蚀刻遮光膜的处理，以进行第一图案化，去除第一抗蚀剂图案和形成第二抗蚀剂图案的工艺，用于蚀刻第一抗蚀剂图案的工艺 使用第二抗蚀剂图案作为掩模的半透明膜，进行第二图案化，在整个基板面上除去第二抗蚀剂图案和形成第一半透明膜和蚀刻可选择的第二半透明膜的工艺， 用于在第二半透明膜上形成第三抗蚀剂图案的工艺，以及使用第三抗蚀剂图案作为掩模来蚀刻第二半透明膜的工艺，以执行第三图案 G。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009020312A

公开(公告)日：2009-01-29

申请号：JP2007182870

申请日：2007-07-12

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： TANAKA JUNICHI ,  SANO MICHIAKI

IPC: G03F1/72 ,  G03F1/74

Abstract: PROBLEM TO BE SOLVED: To provide a method for correcting a defect in a gray tone mask, by which a defect caused in a semi-translucent part can be suitably corrected. SOLUTION: The method for correcting the defect in a gray tone mask 20 having a light-shielding part 21, a translucent part 22 and a semi-translucent part 23 where the transmission amount of exposure light to be used when using the mask can be decreased by a predetermined amount, includes: a step in which the semi-translucent part 23 is formed of a semi-translucent film 26 and a defective region is specified in the semi-translucent part 23; and a step of forming a correction film 27 having a different composition from that of the semi-translucent film in the defective region. In the step of forming a correction film, light transmittance characteristics of the correction film with respect to the exposure light at a predetermined wavelength are preliminarily recognized; and on the basis of the recognized light transmittance characteristics of the correction film, such conditions are applied that the light transmittance of the correction film 27 with respect to the exposure light at the predetermined wavelength is approximately equal to that of the semi-translucent film 26. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于校正灰度调色掩模中的缺陷的方法，由此可以适当地校正半半透明部分中引起的缺陷。 解决方案：用于校正具有遮光部分21，半透明部分22和半透明部分23的灰色调掩模20中的缺陷的方法，其中使用掩模时要使用的曝光光的透射量 可以减少预定量，包括：半透明部分23由半透明膜26形成并且半透明部分23中规定了缺陷区域的步骤; 以及在缺陷区域形成具有与半透明膜的组成不同的组成的校正膜27的步骤。 在形成校正膜的步骤中，预先确认校正膜相对于预定波长的曝光光的透光率特性; 并且基于校正膜的所识别的透光率特性，应用这样的条件：校正膜27相对于预定波长的曝光光的透光率近似等于半透明膜26的透光率 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007271891A

公开(公告)日：2007-10-18

申请号：JP2006097071

申请日：2006-03-31

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： MITSUI MASARU ,  SUGIHARA OSAMU ,  SANO MICHIAKI

IPC: G03F1/50 ,  G03F1/54

Abstract: PROBLEM TO BE SOLVED: To provide a mask blank and a photomask which are suitable for achieving higher quality of a large-sized mask blank and a mask for future FPD. SOLUTION: The mask blank is for manufacturing an FPD device having at least one of a translucent film and a light shielding film having a function of adjusting a transmission quantity on a light-transmissive substrate. The translucent film or light shielding film is made of a metal-silicide-based material containing metal and silicon, and the translucent film made of the metal-silicide-based material or the light shielding film made of the metal-silicide-based material is so formed that an etching rate of wet etching increases along the depth direction of the film of the translucent film or light shielding film. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供适合于实现更大质量的大尺寸掩模坯料和未来FPD的掩模的掩模坯料和光掩模。 解决方案：掩模板用于制造具有调节透光性基板上的透射量的功能的透光性膜和遮光膜中的至少一种的FPD器件。 半透明膜或遮光膜由含有金属和硅的金属硅化物系材料构成，由金属硅化物系材料构成的半透明膜或由金属硅化物系材料形成的遮光膜为 使得湿蚀刻的蚀刻速率沿着半透膜或遮光膜的膜的深度方向增加。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007271696A

公开(公告)日：2007-10-18

申请号：JP2006094066

申请日：2006-03-30

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： MITSUI MASARU ,  SANO MICHIAKI

IPC: C23C14/06 ,  G03F1/50 ,  G03F1/54

Abstract: PROBLEM TO BE SOLVED: To decrease the number of substrates which need to have translucent films peeled as a gray tone mask blank for FPD does not pass inspection when the gray tone mask blank is manufactured. SOLUTION: A method of manufacturing the gray tone mask blank 10 for manufacturing an FPD device includes a preparation stage of preparing a light-transmissive substrate 12, a translucent film formation stage of forming a translucent film 14 of metal silicide on the substrate, a transmissivity adjustment stage of adjusting the transmissivity of the translucent film 14, and a light shield film formation stage of forming a light shield film 16 on the transmissivity-adjusted translucent film 14. In the transmissivity adjustment stage, the transmissivity of the translucent film 14 is measured, and then the transmissivity of the translucent film 14 is adjusted when the difference between the measured transmissivity and previously set transmissivity exceeds a range of variance allowed as a gray tone mask and the measured transmissivity is 75 to 125% of the set transmissivity. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了减少需要具有作为FPD的灰色调色掩模毛坯剥离的半透明膜的基板的数量，当制造灰色蒙版掩模坯料时不通过检查。 解决方案：制造用于制造FPD器件的灰度色调掩模毛坯10的方法包括制备透光基底12的准备阶段，在基底上形成金属硅化物的半透明膜14的半透明成膜阶段 调整透光性膜14的透射率的透射率调整阶段以及在透过率调整好的半透膜14上形成遮光膜16的遮光膜形成工序。在透射率调整阶段，半透膜的透过率 14，然后当测量的透射率和预先设定的透射率之间的差超过允许作为灰度色调掩模的方差范围时，调整透光性膜14的透射率，测定的透射率为设定透射率的75〜125％ 。 版权所有（C）2008，JPO＆INPIT