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公开(公告)号:US3635454A
公开(公告)日:1972-01-18
申请号:US3635454D
申请日:1970-05-07
Applicant: IBM
Inventor: ANGELO RAYMOND W , HOUGHTALEN HOWARD G
CPC classification number: H02G1/1275 , Y10T29/49002 , Y10T29/49995
Abstract: The apparatus and process for the rapid and effective removal of organic insulating material such as Teflon (Trademark of E. I. du Pont de Nemours & Co.) TFE, polytetrafluoroethylene, FEP, fluorinated ethylene-propylene, or the like, from fine or superfine wire by the controlled application of a stream of hot gas. The apparatus includes testing equipment to verify the proper operation of the insulation stripping apparatus.
Abstract translation: 用于从精细或超细线快速有效地去除有机绝缘材料如Teflon(EI du Pont de Nemours&Co.的商标)TFE,聚四氟乙烯,FEP,氟化乙烯 - 丙烯等的装置和方法, 控制应用热气流。 该设备包括测试设备以验证绝缘剥离装置的正常操作。
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公开(公告)号:CA2002425A1
公开(公告)日:1990-05-18
申请号:CA2002425
申请日:1989-11-07
Applicant: IBM , UNIV NORTH DAKOTA
Inventor: ANGELO RAYMOND W , GELORME JEFFREY D , KUCZYNSKI JOSEPH P , LAWRENCE WILLIAM H , PAPPAS SOCRATES P , SIMPSON LOGAN L
IPC: C07C381/12 , C08G59/00 , C08G59/18 , C08G59/68 , G03F7/029
Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
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公开(公告)号:CA1108330A
公开(公告)日:1981-09-01
申请号:CA328103
申请日:1979-05-23
Applicant: IBM
Inventor: ANGELO RAYMOND W , POLIAK RICHARD M , SUSKO JOHN R
Abstract: A protective layer composition, suitable for protecting metal electrodes on components and other microelectronic circuitry, comprises an organic thermoplastic polymeric material, an organic solvent or solvents, and a non-ionic fluorocarbon surfactant as a wetting/leveling/flow control agent. A typical formulation comprises an aromatic polymer which cures to form a polyamide-imide polymer, an organic solvent or a mixture of organic solvents and a non-ionic fluorocarbon surfactant.
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公开(公告)号:DE68907559T2
公开(公告)日:1994-02-17
申请号:DE68907559
申请日:1989-10-21
Applicant: IBM
Inventor: ANGELO RAYMOND W , GELORME JEFFREY D , KUCZYNSKI JOSEPH P , LAWRENCE WILLIAM H , PAPPAS SOCRATES P , SIMPSON LOGAN L
IPC: C07C381/12 , C08G59/00 , C08G59/18 , C08G59/68 , G03F7/029
Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
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公开(公告)号:DE68907559D1
公开(公告)日:1993-08-19
申请号:DE68907559
申请日:1989-10-21
Applicant: IBM
Inventor: ANGELO RAYMOND W , GELORME JEFFREY D , KUCZYNSKI JOSEPH P , LAWRENCE WILLIAM H , PAPPAS SOCRATES P , SIMPSON LOGAN L
IPC: C07C381/12 , C08G59/00 , C08G59/18 , C08G59/68 , G03F7/029
Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
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公开(公告)号:DE2962550D1
公开(公告)日:1982-06-03
申请号:DE2962550
申请日:1979-06-11
Applicant: IBM
Inventor: ANGELO RAYMOND W , POLIAK RICHARD M , SUSKO JOHN R
Abstract: 1. Method of making a seal coating consisting of an aromatic polymer curable into a polyimide, on electronic circuits, characterized in that onto the circuits a coating material with a content of aromatic polymer, an organic solvent therefor, and a non-ionic fluorocarbon surfactant is applied, and cured into a sealing polyimide coating.
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公开(公告)号:CA2002425C
公开(公告)日:1996-01-02
申请号:CA2002425
申请日:1989-11-07
Applicant: IBM , UNIV NORTH DAKOTA
Inventor: ANGELO RAYMOND W , GELORME JEFFREY D , KUCZYNSKI JOSEPH P , LAWRENCE WILLIAM H , PAPPAS SOCRATES P , SIMPSON LOGAN L
Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof. The sulfonium salts are useful as photoinitiators and reduce the exposure requirement for photochemically induced cationic polymerization.
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公开(公告)号:ES2058436T3
公开(公告)日:1994-11-01
申请号:ES89119568
申请日:1989-10-21
Applicant: IBM
Inventor: ANGELO RAYMOND W , GELORME JEFFREY D , KUCZYNSKI JOSEPH P , LAWRENCE WILLIAM H , PAPPAS SOCRATES P , SIMPSON LOGAN L
IPC: C07C381/12 , C08G59/00 , C08G59/18 , C08G59/68 , G03F7/029
Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
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公开(公告)号:SG134193G
公开(公告)日:1994-03-31
申请号:SG134193
申请日:1993-12-17
Applicant: IBM
Inventor: ANGELO RAYMOND W , GELORME JEFFREY D , KUCZYNSKI JOSEPH P , LAWRENCE WILLIAM H
IPC: C07C381/12 , C08G59/68
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公开(公告)号:CA1166130A
公开(公告)日:1984-04-24
申请号:CA386645
申请日:1981-09-25
Applicant: IBM
Inventor: ANGELO RAYMOND W , BAKOS PETER
IPC: C09K13/06 , C23F1/26 , H01L21/308 , H01L21/3213 , C09K13/00
Abstract: .EN980-020 ETCHANT COMPOSITION AND USE THEREOF An aqueous acidic composition suitable for etching containing an acid and polyvinyl alcohol and use thereof.
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