公开(公告)号：DE68927735D1

公开(公告)日：1997-03-13

申请号：DE68927735

申请日：1989-11-21

Applicant: IBM

Inventor： BROWN LAWRENCE M ,  GELORME JEFFREY D ,  KUCZYNSKI JOSEPH P ,  LAWRENCE WILLIAM H

IPC: C08F2/50 ,  C08G59/00 ,  C08G59/18 ,  G03F7/038 ,  G03F7/20 ,  H05K3/00 ,  H05K3/28

Abstract: Cationic curable photoresists are patterned by exposing such to a laser beam in a pattern, followed by developing.

公开(公告)号：DE68917748T2

公开(公告)日：1995-03-30

申请号：DE68917748

申请日：1989-02-02

Applicant: IBM

Inventor： JOHNSON ROBERT W ,  LAWRENCE WILLIAM H ,  LEMON GARY K ,  MAGNUSON ROY H ,  MARKOVICH VOYA R ,  PARSONS RALPH E ,  SAMBUCETTI CARLOS J

IPC: C23C18/18 ,  C23C18/28 ,  C23C18/30 ,  H05K3/00 ,  H05K3/18 ,  H05K3/38 ,  C23C18/16

公开(公告)号：ES2059578T3

公开(公告)日：1994-11-16

申请号：ES89101763

申请日：1989-02-02

Applicant: IBM

Inventor： JOHNSON ROBERT W ,  LAWRENCE WILLIAM H ,  LEMON GARY K ,  MAGNUSON ROY H ,  MARKOVICH VOYA R ,  PARSONS RALPH E ,  SAMBUCETTI CARLOS J

IPC: C23C18/18 ,  C23C18/28 ,  C23C18/30 ,  H05K3/00 ,  H05K3/18 ,  H05K3/38 ,  C23C18/16

公开(公告)号：CA2002425A1

公开(公告)日：1990-05-18

申请号：CA2002425

申请日：1989-11-07

Applicant: IBM ,  UNIV NORTH DAKOTA

Inventor： ANGELO RAYMOND W ,  GELORME JEFFREY D ,  KUCZYNSKI JOSEPH P ,  LAWRENCE WILLIAM H ,  PAPPAS SOCRATES P ,  SIMPSON LOGAN L

IPC: C07C381/12 ,  C08G59/00 ,  C08G59/18 ,  C08G59/68 ,  G03F7/029

Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.

公开(公告)号：CA2002425C

公开(公告)日：1996-01-02

申请号：CA2002425

申请日：1989-11-07

Applicant: IBM ,  UNIV NORTH DAKOTA

Inventor： ANGELO RAYMOND W ,  GELORME JEFFREY D ,  KUCZYNSKI JOSEPH P ,  LAWRENCE WILLIAM H ,  PAPPAS SOCRATES P ,  SIMPSON LOGAN L

IPC: C07C381/12 ,  C08G59/00 ,  C08G59/18 ,  C08G59/68 ,  G03F7/029 ,  C08G59/40 ,  C07F9/92

Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof. The sulfonium salts are useful as photoinitiators and reduce the exposure requirement for photochemically induced cationic polymerization.

公开(公告)号：CA1332885C

公开(公告)日：1994-11-08

申请号：CA581531

申请日：1988-10-27

Applicant: IBM

Inventor： JOHNSON ROBERT W ,  LAWRENCE WILLIAM H ,  LEMON GARY K ,  MAGNUSON ROY H ,  MARKOVICH VOYA R ,  PARSONS RALPH E ,  SAMBUCETTI CARLOS J

IPC: C23C18/18 ,  C23C18/28 ,  C23C18/30 ,  H05K3/00 ,  H05K3/18 ,  H05K3/38 ,  C23C18/16

Abstract: A non-conductive substrate is conditioned for subsequent selective deposition of a metal thereon by providing at least one of the major surfaces of the substrate in roughened form, contacting that surface(s) with a palladium/tin catalyst, activating the catalyst by employing an alkali hydroxide solution, laminating a photosensitive composition to the major surface(s), and exposing the photosensitive composition to actinic light in a predetermined pattern and then developing to provide the predetermined pattern.

公开(公告)号：ES2058436T3

公开(公告)日：1994-11-01

申请号：ES89119568

申请日：1989-10-21

Applicant: IBM

Inventor： ANGELO RAYMOND W ,  GELORME JEFFREY D ,  KUCZYNSKI JOSEPH P ,  LAWRENCE WILLIAM H ,  PAPPAS SOCRATES P ,  SIMPSON LOGAN L

IPC: C07C381/12 ,  C08G59/00 ,  C08G59/18 ,  C08G59/68 ,  G03F7/029

Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.

公开(公告)号：SG134193G

公开(公告)日：1994-03-31

申请号：SG134193

申请日：1993-12-17

Applicant: IBM

Inventor： ANGELO RAYMOND W ,  GELORME JEFFREY D ,  KUCZYNSKI JOSEPH P ,  LAWRENCE WILLIAM H

IPC: C07C381/12 ,  C08G59/68

公开(公告)号：DE68917748D1

公开(公告)日：1994-10-06

申请号：DE68917748

申请日：1989-02-02

Applicant: IBM

Inventor： JOHNSON ROBERT W ,  LAWRENCE WILLIAM H ,  LEMON GARY K ,  MAGNUSON ROY H ,  MARKOVICH VOYA R ,  PARSONS RALPH E ,  SAMBUCETTI CARLOS J

IPC: C23C18/18 ,  C23C18/28 ,  C23C18/30 ,  H05K3/00 ,  H05K3/18 ,  H05K3/38 ,  C23C18/16

公开(公告)号：DE68907559T2

公开(公告)日：1994-02-17

申请号：DE68907559

申请日：1989-10-21

Applicant: IBM

Inventor： ANGELO RAYMOND W ,  GELORME JEFFREY D ,  KUCZYNSKI JOSEPH P ,  LAWRENCE WILLIAM H ,  PAPPAS SOCRATES P ,  SIMPSON LOGAN L

IPC: C07C381/12 ,  C08G59/00 ,  C08G59/18 ,  C08G59/68 ,  G03F7/029

Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.