公开(公告)号：JPH05216242A

公开(公告)日：1993-08-27

申请号：JP23436692

申请日：1992-09-02

Applicant: IBM

Inventor： NAGESHIYUWAA RAO BANTOU ,  ANIRUKUMARU CHINUPURASADO BATS ,  ASHIYUUINKUMARU CHINUPURASADO ,  JIYOZEFU ARUFUONSU KOTEIRO ,  JIERARUDO UOORUTAA JIYOONZU ,  ROBAATO JIYON OUIN ,  KOSUTASU PAPATOMASU ,  ANAAYA KUMARU BARUDOYA

IPC: G03F7/32 ,  G03F7/42 ,  H05K3/06

Abstract: PURPOSE: To provide a developer and a stripping agent simple, adaptable to environment and for a free radical initiating and addition polymerizing photoresist, a cationic hardened resist and a soldering mask and a Vacrel photoresist. CONSTITUTION: Both of the developer and the stripping agent in all cases contain τ-butylolactone, propylene carbonate and benzyl alcohol and optionally contains a small quantity of methanol, ethanol, isopropyl, propylene glycol monomethyl acetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, methylethyl ketone, acetone and water.