公开(公告)号：JPH118248A

公开(公告)日：1999-01-12

申请号：JP14913698

申请日：1998-05-29

Applicant: IBM

Inventor： CATHERINA E BAVICH ,  ALESSANDRO CESARE CALLEGARI ,  JULIEN FONTAINE ,  ALFRED GRILL ,  CHRISTOPHER YANES ,  BISHUNUBAHAAI VITTARUBAHAAI PA

IPC: H01L21/3205 ,  C23C16/26 ,  C23C16/30 ,  G03F7/09 ,  H01L21/027 ,  H01L21/311 ,  H01L21/312

Abstract: PROBLEM TO BE SOLVED: To eliminate the reflection of the boundary surface between a resist and an ARC and to drastically improve CD control by making an adjustment for conforming to the optical characteristics of a substrate, and make it useful as a bottom antireflection coating. SOLUTION: A plasma reinforced chemical vapor phase adhesion device 8, used for adhering an amorphous carbon film, includes a reaction chamber 10 and has a throttle valve 11 for isolating the reaction chamber 10 from a vacuum pump. A cathode 19 is electrically connected to an adjustable high-frequency power supply 14, and the impedance between the cathode 19 and the high-frequency power supply 14 is matched by a matching box 13. An amorphous carbon film coating changes the optical constant of the film by changing the process parameters, thus minimizing a reflection factor on the boundary surface between the resist and the substrate and reducing a swing ratio.