Flow control and monitoring system
    1.
    发明授权
    Flow control and monitoring system 失效
    流量控制和监测系统

    公开(公告)号:US3746037A

    公开(公告)日:1973-07-17

    申请号:US3746037D

    申请日:1971-10-06

    Applicant: IBM

    Inventor: BOERGER F WHITE W

    CPC classification number: G05D7/005 G05D7/03 Y10T137/7761 Y10T137/7768

    Abstract: The mass flow rate of a fluid is controlled in response to the pressure differential across a restriction in the conduit and in response to the incoming pressure of the fluid. The flow control system includes means to change the fluid flow through the conduit in accordance with desired changes in the mass flow rate through the conduit.

    Abstract translation: 响应于管道中的限制和响应于流体的进入压力的压力差来控制流体的质量流率。 流量控制系统包括根据通过管道的质量流量的期望变化来改变通过导管的流体流动的装置。

    TEMPERATURE SENSOR
    5.
    发明专利

    公开(公告)号:CA930976A

    公开(公告)日:1973-07-31

    申请号:CA62556

    申请日:1969-09-22

    Applicant: IBM

    Abstract: 1,261,994. Induction heating apparatus. INTERNATIONAL BUSINESS MACHINES CORP. 5 Sept., 1969 [26 Sept., 1968], No. 43963/69. Heading H5H. A device 20 for sensing the temperature of a susceptor 14 within a chamber 10 using an RF heating coil 18, comprises an auxiliary susceptor 19 outside the chamber 10, and arranged to receive electromagnetic energy indicative of the power level of the field of the coil 18, and means for sensing the temperature of the susceptor 19, viz. a thermocouple 26, Fig. 2 (not shown), in a tube 23 of device 20. The susceptor 14 carries semi-conductor substrates 15 on which an epitaxial film is deposited at a temperature kept constant by means using the device 20 of the invention. Susceptors 14, 19, are of carbon or graphite. A non-reactive gas, such as nitrogen, is supplied to device 20, or the device is vacuum sealed. The substrates 15 can be continuously moved through the chamber 10. Susceptor 19 may be disposed within the field of an RF coil, having proportional characteristics to coil 18, at a remote location.

    7.
    发明专利
    未知

    公开(公告)号:SE346153B

    公开(公告)日:1972-06-26

    申请号:SE1285369

    申请日:1969-09-18

    Applicant: IBM

    Inventor: BOERGER F WHITE W

    Abstract: 1,262,363. Controlling the amount of liquid vapour in a gas. INTERNATIONAL BUSINESS MACHINES CORP. 2 Sept., 1969 [26 Sept., 1968], No. 43362/69. Heading B1R. In apparatus for controlling the quantity of liquid vapour in a gas, a first stream of a dry gas is supplied by a pipe 12 with a capillary outlet 13 to bubble through liquid 11 in a reservoir 10, maintained at a desired temperature by circulating a liquid through a space 18 of a jacket 17 by a pump 20, to saturate the gas with liquid vapour, the saturated gas being passed to a nozzle 31 through a riser 26 and mixed in an outlet-tube 34 with a second stream of dry gas from a supply tube 35, the flow rates of the gas streams being controlled by valves 16 and 38. The saturated gas and the second gas stream are maintained at a desired temperature by a heating coil 29 and a heat exchanger 22 is provided in the liquid circulation line of the jacket 17. The gas streams are mixed in a constricted portion 33 of the tube 34 which lies in the plane of the end 32 of the nozzle 31. The gas may be oxygen and the liquid water. (For Figure see next column)

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