公开(公告)号：JPH10177721A

公开(公告)日：1998-06-30

申请号：JP31361897

申请日：1997-11-14

Applicant: IBM

Inventor： BRADY MICHAEL J ,  BRAREN BODIL E ,  GAMBINO RICHARD J ,  GRILL ALFRED ,  PATEL VISHNUBHAI V

IPC: B41M5/26 ,  G11B7/00 ,  G11B7/0045 ,  G11B7/0055 ,  G11B7/24 ,  G11B7/243 ,  G11B7/258 ,  G11B7/30

Abstract: PROBLEM TO BE SOLVED: To obtain an optical memory medium based on completely novel memory principle and to obtain an optical memory device using this medium by recording data corresponding to characteristics of an amorphous solid selected from a group of materials each having refractive index and reflectance. SOLUTION: The amorphous solid is selected from a group of diamond-like carbon, silicon carbide, boron carbide, boron nitride, amorphous silicon and amorphous germanium, and the solid contains hydrogen by up to 50 atm% with covalent bonds. A specified region of the amorphous solid having a first refractive index and having atoms with covalent bonds is heated with laser light to change the refractive index in the heated area to a second refractive index. Thus, two states can be produced to correspond the memory of data without dissolving or crystallizing the amorphous solid. The density of the solid is changed by heating, which accompanies changes in the refractive index and reflectance.

公开(公告)号：DE68919328D1

公开(公告)日：1994-12-15

申请号：DE68919328

申请日：1989-07-07

Applicant: IBM

Inventor： BRAREN BODIL E ,  SRINIVASAN RANGASWAMY

IPC: A61B17/00 ,  A61B18/20 ,  A61B18/26 ,  A61C3/02 ,  A61N5/06 ,  B23K26/00 ,  B23K26/06 ,  B23K26/40 ,  H01L21/301 ,  H01L21/302 ,  H01S3/00 ,  A61B17/36

Abstract: A method and apparatus are described which enhance the ablative effect of a UV laser (10). The ablative effect of a pulsed UV laser (10) is enhanced using a second, longer wavelength pulsed laser (20). Each pulse of the first laser (10) is followed by or combined with a pulse from the second laser (20). The etch depth per pulse is controlled by varying the time between pulses from the first (10) and second (20) lasers. The maximum etch depth per pulse occurs at a time separation which is a function of the substrate (50) being etched. The first laser (10) wavelength is selected to be within the absorption spectrum of the unexcited surface molecules of the substrate (50), while the wavelength of the second laser (20) is selected to be within the absorption spectrum of the surface molecules excited by the incident radiation of the first laser (10).

公开(公告)号：DE69222824D1

公开(公告)日：1997-11-27

申请号：DE69222824

申请日：1992-08-19

Applicant: IBM

Inventor： AFZALI-ARDAKANI ALI ,  BRAREN BODIL E ,  DAIJAVAD SHAHROKH ,  HODGSON RODNEY T ,  MOLIS STEVEN E ,  VIEHBECK ALFRED

IPC: C08K3/04 ,  C08K9/02 ,  H05K1/03 ,  H05K3/10 ,  C08L79/08

公开(公告)号：DE68919328T2

公开(公告)日：1995-05-24

申请号：DE68919328

申请日：1989-07-07

Applicant: IBM

Inventor： BRAREN BODIL E ,  SRINIVASAN RANGASWAMY

IPC: A61B17/00 ,  A61B18/20 ,  A61B18/26 ,  A61C3/02 ,  A61N5/06 ,  B23K26/00 ,  B23K26/06 ,  B23K26/40 ,  H01L21/301 ,  H01L21/302 ,  H01S3/00 ,  A61B17/36

Abstract: A method and apparatus are described which enhance the ablative effect of a UV laser (10). The ablative effect of a pulsed UV laser (10) is enhanced using a second, longer wavelength pulsed laser (20). Each pulse of the first laser (10) is followed by or combined with a pulse from the second laser (20). The etch depth per pulse is controlled by varying the time between pulses from the first (10) and second (20) lasers. The maximum etch depth per pulse occurs at a time separation which is a function of the substrate (50) being etched. The first laser (10) wavelength is selected to be within the absorption spectrum of the unexcited surface molecules of the substrate (50), while the wavelength of the second laser (20) is selected to be within the absorption spectrum of the surface molecules excited by the incident radiation of the first laser (10).