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公开(公告)号：DE68927735D1
公开(公告)日：1997-03-13
申请号：DE68927735
申请日：1989-11-21
Applicant: IBM
Inventor： BROWN LAWRENCE M , GELORME JEFFREY D , KUCZYNSKI JOSEPH P , LAWRENCE WILLIAM H
Abstract: Cationic curable photoresists are patterned by exposing such to a laser beam in a pattern, followed by developing.
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