公开(公告)号：JPH0862835A

公开(公告)日：1996-03-08

申请号：JP19029695

申请日：1995-07-26

Applicant: IBM

Inventor： JIEEMUSU TOMASU FUAHEI ,  BURAIAN UEIN HAABUSUTO ,  REO ROORENSU RENEHAN ,  UEIN MAATEIN MOROO ,  GARII TOMASU SUPINITSURO ,  KEBUIN MAIKERU UERUSHIYU ,  ROBAATO RABUIN UTSUDO

IPC: G03F7/004 ,  C08G65/40 ,  C08G67/00 ,  C09D171/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a material suitable for an antireflection film, used in microlithography by far-UV light. SOLUTION: A copolymer of benzophenone and bisphenol A is known to have far-UV absorptivity. Then, the copolymer is useful particularly as the antireflection film in the field applying microlithography. The absorption at 248nm is intensified, when anthracene is introduced into the copolymer. The terminalstopping agent used for the copolymer is widely changeable according to the need of a user and is so selectable as to promote adhesiveness, stability and absorption of different wavelengths.