1.
    发明专利
    未知

    公开(公告)号:DE2314422A1

    公开(公告)日:1973-11-29

    申请号:DE2314422

    申请日:1973-03-23

    Applicant: IBM

    Abstract: 1411192 Cadmium selenide INTERNANATIONAL BUSINESS MACHINES CORP 8 March 1973 [8 May 1972] 11275/73 Heading C1A [Also in Division H1] A photodiode comprises an N-type layer of CdSe on a P-type Si substrate. Fig. 1 shows apparatus suitable for vapour-depositing the CdSe layer from separate resistively heated sources of Cd 10 and Se 24. Baffles 14, 16 associated with the boat 12 containing the Cd 10 prevent Cd particles from entering the chamber 2, which is evacuated to a pressure of 10 -7 to 10 -8 mm. of mercury. A rotatable shutter 20 regulates the evaporation of Cd on to the target, which consists of Si substrates 8 inserted in recesses in a holder 6 of boron nitride. The source temperatures are controlled such that the ratio of Se : Cd vapour fluxes at the Si substrates 8 is in the range 10-15 : 1, the substrates 8, from which any oxide film has been removed prior to insertion in the apparatus, being maintained at a temperature of about 250‹ C. during deposition.

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