公开(公告)号：DE69301999T2

公开(公告)日：1996-10-10

申请号：DE69301999

申请日：1993-11-22

Applicant: IBM

Inventor： CAMERON JAMES FIELD ,  FRECHET JEAN M J ,  LEUNG MAN-KIT ,  NIESERT CLAUS-PETER ,  MACDONALD SCOTT ARTHUR ,  WILLSON CARLTON GRANT

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: Provided is an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.

公开(公告)号：DE69301999D1

公开(公告)日：1996-05-02

申请号：DE69301999

申请日：1993-11-22

Applicant: IBM

Inventor： CAMERON JAMES FIELD ,  FRECHET JEAN M J ,  LEUNG MAN-KIT ,  NIESERT CLAUS-PETER ,  MACDONALD SCOTT ARTHUR ,  WILLSON CARLTON GRANT

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: Provided is an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.