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公开(公告)号:DE3072031D1
公开(公告)日:1987-10-22
申请号:DE3072031
申请日:1980-06-03
Applicant: IBM
Inventor: CARPENTER CHARLES , FUGARDI JOSEPH F , GREGOR LAWRENCE V , GROSEWALD PETER SAMUEL , REEBER MORTON D
IPC: B23K35/00 , H01L21/60 , H01L23/532 , H01L23/48
Abstract: A ball limiting metallurgy pad structure for a semiconductor device solder bond interconnection comprising: a conductive layer that is adherent to the semiconductor device passivating layer, a relatively thick layer of a material having a high thermal conductivity, a barrier layer that protects the high conductivity layer by physically preventing any interaction or alloying with the subsequent layers, and a layer of a material that is solder wettable.
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公开(公告)号:IT1148836B
公开(公告)日:1986-12-03
申请号:IT2250980
申请日:1980-06-03
Applicant: IBM
Inventor: CARPENTER CHARLES , FUGARDI JOSEPH F , GREGOR LAWRENCE V , GROSEWALD SAMUEL PETER , REBBER MORTON D
IPC: B23K35/00 , H01L21/60 , H01L23/532 , H01L
Abstract: A ball limiting metallurgy pad structure for a semiconductor device solder bond interconnection comprising: a conductive layer that is adherent to the semiconductor device passivating layer, a relatively thick layer of a material having a high thermal conductivity, a barrier layer that protects the high conductivity layer by physically preventing any interaction or alloying with the subsequent layers, and a layer of a material that is solder wettable.
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公开(公告)号:CA1139008A
公开(公告)日:1983-01-04
申请号:CA349744
申请日:1980-04-14
Applicant: IBM
Inventor: CARPENTER CHARLES , FUGARDI JOSEPH F , GREGOR LAWRENCE V , GROSEWALD PETER S , REEBER MORTON D
IPC: B23K35/00 , H01L21/60 , H01L23/532 , H05K1/11
Abstract: METHOD OF FORMING AN IMPROVED SOLDER INTERCONNECTION BETWEEN A SEMICONDUCTOR DEVICE AND A SUPPORTING SUBSTRATE A ball limiting metallurgy pad structure for a semiconductor device solder bond interconnection comprises a conductive layer that is adherent to the semiconductor device passivating layer, a relatively thick layer of a material that has a high thermal conductivity, a barrier layer that protects the high conductivity layer by physically preventing it from interacting or alloying with any subsequent layers, and a layer of a material that is solder wettable.
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