公开(公告)号：DE3272761D1

公开(公告)日：1986-09-25

申请号：DE3272761

申请日：1982-11-10

Applicant: IBM

Inventor： CHENG YING YING ,  GRANT BARBARA DIANNE ,  PEDERSON LESTER ARLYN ,  WILLSON CARLTON GRANT

IPC: G03F7/26 ,  C08L61/00 ,  C08L61/04 ,  C08L61/06 ,  C08L61/10 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/10

Abstract: A resist sensitive to electron beam (and x-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefinic hydrocarbon and an unsaturated ether.