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公开(公告)号：DE3662317D1
公开(公告)日：1989-04-13
申请号：DE3662317
申请日：1986-03-14
Applicant: IBM
Inventor： CLECAK NICHOLAS JEFFRIES , GRANT BARBARA DIANNE , MILLER ROBERT DENNIS , TOMPKINS TERRY CADY , WILLSON CARLTON GRANT
IPC: C08L101/00 , C08K5/00 , C08K5/53 , C08L33/00 , C08L33/02 , C08L61/10 , G03C1/72 , G03C5/16 , G03F7/016 , G03F7/038 , G03F7/039 , G03F7/20 , H01L21/027 , G03F7/10
Abstract: A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
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公开(公告)号：DE3278826D1
公开(公告)日：1988-09-01
申请号：DE3278826
申请日：1982-12-10
Applicant: IBM
Inventor： GRANT BARBARA DIANNE , HILDEN MAGDALENA MARIA , JONES CAROL RUTH , SINCERBOX GLENN TAVERNIA
Abstract: A method for making high diffraction efficiency holograms from dichromated gelatin material including the steps of curing the material for a specified time under controlled temperature and humidity conditions, placing a dye spot on the cured material, measuring the extent of diffusion of the dye spot after a predetermined time, replacing the material into the curing conditions, repeating the method until dye spot diffusion of a predetermined size occurs, and using the material to make holograms.
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Patent Agency Ranking
公开(公告)号：DE3272761D1
公开(公告)日：1986-09-25
申请号：DE3272761
申请日：1982-11-10
Applicant: IBM
IPC: G03F7/26 , C08L61/00 , C08L61/04 , C08L61/06 , C08L61/10 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/10
Abstract: A resist sensitive to electron beam (and x-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefinic hydrocarbon and an unsaturated ether.
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公开(公告)号：DE2960177D1
公开(公告)日：1981-04-09
申请号：DE2960177
申请日：1979-02-23
Applicant: IBM
Inventor： CLECAK NICHOLAS JEFFRIES , GRANT BARBARA DIANNE , JAFFE ANNETTE BRONKESH , KELLER GARY SCOTT
Abstract: This invention relates to a composition for use as a reactive medium in a reversible electrochromic display device. The reactive medium is placed between two electrically conductive electrodes of the device, at least one of the electrodes being transparent, the composition includes an anhydrous solvent and an oxidant/reductant pair in which the reductant is an electron acceptor, and the oxidant is a substituted fluorene compound.
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公开(公告)号：DE3165051D1
公开(公告)日：1984-08-30
申请号：DE3165051
申请日：1981-07-06
Applicant: IBM
Inventor： GENDLER PAUL LEWIS , GRANT BARBARA DIANNE , SNYDER CLINTON DAVID
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公开(公告)号：DE3063170D1
公开(公告)日：1983-06-16
申请号：DE3063170
申请日：1980-10-15
Applicant: IBM
IPC: G03C1/72 , C08K5/1575 , C08L61/00 , C08L61/04 , C08L61/06 , G03C1/00 , G03F7/004 , G03F7/016 , G03F7/022 , G03F7/038 , G03F7/26 , H01L21/26 , G03F7/02 , G03F7/08 , G03C1/68
Abstract: The invention relates to a lithographic resist composition for use in a method of forming a film (17) on a substrate (11) comprising the steps of providing a deposition mask (10) of the resist composition on the substrate (11), exposing a selected portion of the mask to ultra-violet rays, dissolving the exposed portion with aqueous alkali to form an aperture (15) with negative slope or overhang, depositing on said substrate (11) through the aperture (15) said film (17) and removing the deposition mask (10). The resist composition comprises a phenolic-aldehyde resin, a photosensitizer and Meldrum's diazo, or Meldrum's acid or suitable analogs thereof as a profile modifying agent. The profile modifying agents useful in the present invention have the formula: wherein R1 is C1 to C20 alkyl or aryl, R2 is H, C1 to C20 alkyl or aryl, or together R1 and R2 are cycloalkyl, A is N or H.
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公开(公告)号：DE3062249D1
公开(公告)日：1983-04-14
申请号：DE3062249
申请日：1980-03-20
Applicant: IBM
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